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    • 4. 发明申请
    • Aperture adapters for laser-based coating removal end-effector
    • 用于激光基涂层去除端部执行器的孔适配器
    • US20090008827A1
    • 2009-01-08
    • US12217435
    • 2008-07-03
    • Mitchell R. WoolJames W. Thomas
    • Mitchell R. WoolJames W. Thomas
    • B29C35/08
    • B44D3/16B23K26/0096B23K26/364
    • A coating removal device, comprising a head component and a body component, removes a coating from a surface. The head component has a means for detachably engaging a removable aperture adapter and for enabling an operator to change and use another aperture adapter for a different application of the device. Aperture adapters are configured for specified deflections of laser beams. In some embodiments, the device is coupled to a waste collection shroud, which achieves 100% collection of waste products without surface contact by establishing a suction flow normal to and in a direction toward a centerline of the device, despite presence of a purge flow that is ejected along with laser beams from the aperture adapter. In other embodiments, the device has a camera for enabling the operator to view an ablation processing region on a display when the device is in operation within a confined space.
    • 包括头部部件和主体部件的涂层去除装置从表面去除涂层。 头部件具有用于可拆卸地接合可拆卸孔径适配器并且用于使操作者能够改变并使用用于该设备的不同应用的另一孔适配器的装置。 光圈适配器配置为激光束的指定偏转。 在一些实施例中,该装置连接到废物收集罩,废物收集罩通过建立与装置的中心线垂直的方向和朝向装置的中心线的方向而实现100%的废物收集而没有表面接触,尽管存在吹扫流 与孔径适配器的激光束一起喷射。 在其他实施例中,该设备具有照相机,用于当设备在密闭空间内操作时,使得操作者能够在显示器上观看消融处理区域。
    • 6. 发明授权
    • Liquid auto-level apparatus and method
    • 液体自动装置及方法
    • US5700401A
    • 1997-12-23
    • US577560
    • 1995-12-22
    • Richard S. WeinbergJames W. Thomas
    • Richard S. WeinbergJames W. Thomas
    • F17C13/02G05D9/12H01L21/00B67D5/08B01D47/00
    • H01L21/67057F17C13/021G05D9/12F17C2205/0326F17C2205/0335F17C2205/0338F17C2221/014F17C2223/0123F17C2227/0135F17C2250/032F17C2250/0408F17C2250/043F17C2250/061F17C2250/075F17C2250/077F17C2260/022F17C2270/0518
    • An HMDS tank for use in an integrated circuit fabrication process includes a tank configured to hold HMDS having an first inlet port configured to receive a carrier gas below an HMDS surface level, an outlet port configured to release said carrier gas saturated with HMDS above the HMDS surface level, and a second inlet port configured to receive HMDS. A sensor is positioned in the tank at a predetermined HMDS level and configured to generate a sensor signal when the HMDS surface level falls below the predetermined HMDS level. A processor is coupled to the sensor and configured to generate a fill signal in response to the sensor signal to initiate introduction of HMDS into the tank through the second inlet port. In another embodiment, the HMDS tank further includes a second sensor positioned in the tank at a low HMDS level. The processor is also coupled to the second sensor and configured to generate an alarm signal in response to the second sensor signal to warn an operator of a low HMDS level in the tank. The alarm signal can instruct the integrated circuit fabrication process to halt until corrective action is taken. An advantage of the invention includes a substantially constant HMDS level that in turn provides a substantially constant concentration of HMDS in the carrier gas which is delivered to the integrated circuit fabrication process. Additional advantages include increased integrated circuit fabrication up-time, reduced contamination and improved efficiency and continuity of the integrated circuit fabrication process.
    • 一种用于集成电路制造工艺的HMDS储罐包括一个槽,其构造成保持具有构造成接收低于HMDS表面水平的载气的第一入口端口的HMDS,配置成将HMDS饱和的载气释放到HMDS上方的出口端口 表面水平和被配置为接收HMDS的第二入口端口。 传感器以预定的HMDS水平位于罐中,并且被配置为当HMDS表面水平降到预定HMDS水平以下时产生传感器信号。 处理器耦合到传感器并且被配置为响应于传感器信号产生填充信号,以启动通过第二入口将HMDS引入到罐中。 在另一个实施例中,HMDS罐还包括位于罐中的低HMDS水平的第二传感器。 处理器还耦合到第二传感器并且被配置为响应于第二传感器信号而产生报警信号,以向操作者警告罐中的低HMDS水平。 报警信号可以指示集成电路制造过程停止,直到采取纠正措施。 本发明的优点包括基本上恒定的HMDS水平,其进而提供输送到集成电路制造过程的载气中基本上恒定的HMDS浓度。 其他优点包括增加集成电路制造的正常运行时间,降低污染,提高集成电路制造过程的效率和连续性。