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    • 2. 发明授权
    • Electrical contact arrangement for a coating process
    • 涂层工艺的电接触布置
    • US08535501B2
    • 2013-09-17
    • US13015626
    • 2011-01-28
    • Benjamin KabagambeJames W. McCamyDonald W. Boyd
    • Benjamin KabagambeJames W. McCamyDonald W. Boyd
    • C25D13/12
    • C25D13/22C25D13/12F16B2/10
    • A protective coating is applied to the electrically conductive surface of a reflective coating of a solar mirror by biasing a conductive member having a layer of a malleable electrically conductive material, e.g. a paste, against a portion of the conductive surface while moving an electrodepositable coating composition over the conductive surface. The moving of the electrodepositable coating composition over the conductive surface includes moving the solar mirror through a flow curtain of the electrodepositable coating composition and submerging the solar mirror in a pool of the electrodepositable coating composition. The use of the layer of a malleable electrically conductive material between the conductive member and the conductive surface compensates for irregularities in the conductive surface being contacted during the coating process thereby reducing the current density at the electrical contact area.
    • 通过偏置具有可延展导电材料层的导电构件(例如,导电构件),将保护涂层施加到太阳能反射镜的反射涂层的导电表面。 在导电表面上移动可电沉积涂料组合物时,将其粘贴到导电表面的一部分上。 可电沉积涂料组合物在导电表面上的移动包括通过可电沉积涂料组合物的流动幕移动太阳镜,并将太阳镜浸没在可电沉积涂料组合物的池中。 在导电构件和导电表面之间使用可延展的导电材料层补偿了在涂覆过程期间接触的导电表面中的不规则性,从而降低了电接触区域处的电流密度。
    • 4. 发明授权
    • Method for continuous control of composition and doping of pulsed laser
deposited films
    • 脉冲激光沉积膜的组成和掺杂的连续控制方法
    • US5386798A
    • 1995-02-07
    • US132528
    • 1993-10-06
    • Douglas H. LowndesJames W. McCamy
    • Douglas H. LowndesJames W. McCamy
    • C23C14/00C23C14/06C03B31/20
    • C23C14/0617C23C14/0021Y10S148/064Y10S438/925
    • A method for growing a deposit upon a substrate of semiconductor material involves the utilization of pulsed laser deposition techniques within a low-pressure gas environment. The substrate and a target of a first material are positioned within a deposition chamber and a low-pressure gas atmosphere is developed within the chamber. The substrate is then heated, and the target is irradiated, so that atoms of the target material are ablated from the remainder of the target, while atoms of the gas simultaneously are adsorbed on the substrate/film surface. The ablated atoms build up upon the substrate, together with the adsorbed gas atoms to form the thin-film deposit on the substrate. By controlling the pressure of the gas of the chamber atmosphere, the composition of the formed deposit can be controlled, and films of continuously variable composition or doping can be grown from a single target of fixed composition.
    • 用于在半导体材料的衬底上生长沉积物的方法涉及在低压气体环境中利用脉冲激光沉积技术。 衬底和第一材料的靶材位于沉积室内,并且室内形成低压气体气氛。 然后加热基板,照射目标物,使目标材料的原子从目标物的其余部分烧蚀,同时气体的原子同时吸附在基片/薄膜表面上。 烧蚀的原子与吸附的气体原子一起堆积在衬底上,以在衬底上形成薄膜沉积物。 通过控制室气体的气体压力,可以控制形成的沉积物的组成,并且可以从固定组合物的单个目标生长连续可变组成或掺杂的膜。
    • 10. 发明授权
    • Non-orthogonal coater geometry for improved coatings on a substrate
    • 用于改善衬底上涂层的非正交涂布机几何形状
    • US08557328B2
    • 2013-10-15
    • US12572317
    • 2009-10-02
    • James W. McCamyJohn F. Sopko
    • James W. McCamyJohn F. Sopko
    • C23C16/448C23C16/40
    • C23C16/4401C23C16/4412C23C16/45502C23C16/45563C23C16/45578C23C16/45587C23C16/54
    • A coating apparatus includes non-orthogonal coater geometry to improve coatings on a glass ribbon, and to improve yields of such coatings. The apparatus includes a first arrangement to move the ribbon along a first imaginary straight line through a coating zone provided in a glass forming chamber. The coater has a coating nozzle and an exhaust slot, each have a longitudinal axis. The coating nozzle directs coating vapors toward the coating zone, and the exhaust slot removes vapors from the coating zone. A second arrangement mounts the coater in spaced relation to the path with the coating nozzle and the exhaust slot facing the coating zone. A second imaginary straight line is normal to the longitudinal axis of the coating nozzle, and the first imaginary line and the second imaginary line subtend an angle in the range of greater than zero degrees to 90 degrees.
    • 涂覆设备包括非正交涂布机几何形状以改善玻璃带上的涂层,并提高这种涂层的产量。 该装置包括第一装置,用于沿着第一假想直线穿过设置在玻璃形成室中的涂布区域移动色带。 涂布机具有涂覆喷嘴和排气槽,每个具有纵向轴线。 涂层喷嘴将涂层蒸气引导到涂层区域,排气槽从涂层区域去除蒸汽。 第二布置将涂布机以与涂布喷嘴和排气槽相对的涂布区域的路径间隔开来安置。 第二假想直线垂直于涂覆喷嘴的纵向轴线,并且第一假想线和第二假想线对准大于零度至90度范围内的角度。