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1. 发明授权

US06659850B2 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece 有权
公开(公告)号：US06659850B2
公开(公告)日：2003-12-09
申请号：US10120600
申请日：2002-04-11
申请人： Nikolay N. Korovin , Stephen C. Schultz , John D. Herb , James L. Farmer
发明人： Nikolay N. Korovin , Stephen C. Schultz , John D. Herb , James L. Farmer
IPC分类号： B24B2900
CPC分类号： B24B37/30 , B24B37/32 , B24B49/16
摘要： An apparatus for planarizing a work piece includes an easily assembled work carrier. The carrier includes a carrier insert having a work piece bladder clamped to a carrier backing plate with a plurality of clamps to form a plurality of web plenums. The outer edge of the bladder is supported by a rib that is coupled to a carrier plenum. By adjusting the pressure in the carrier plenum, the pressure exerted on the edge of a work piece during a planarization operation can be adjusted. The carrier also includes a floating wear ring that surrounds the work piece bladder and a work piece mounted on that bladder. By adjusting the force exerted by the wear ring on a polishing pad, independently of the pressure exerted by the rib at the edge of the bladder, the material removal rate near the edge of the work piece can be controlled.

2. 发明授权

US07140956B1 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece 有权
公开(公告)号：US07140956B1
公开(公告)日：2006-11-28
申请号：US11324038
申请日：2005-12-29
申请人： Nikolay N. Korovin , Stephen C. Schultz , John D. Herb , James L. Farmer
发明人： Nikolay N. Korovin , Stephen C. Schultz , John D. Herb , James L. Farmer
IPC分类号： B24B20/00
CPC分类号： B24B37/30 , B24B41/061
摘要： An apparatus for planarizing a work piece includes an easily assembled work carrier. The carrier includes a carrier insert having a work piece bladder clamped to a carrier backing plate with a plurality of clamps to form a plurality of web plenums. The outer edge of the bladder is supported by a rib that is coupled to a carrier plenum. By adjusting the pressure in the carrier plenum, the pressure exerted on the edge of a work piece during a planarization operation can be adjusted. The carrier also includes a floating wear ring that surrounds the work piece bladder and a work piece mounted on that bladder. By adjusting the force exerted by the wear ring on a polishing pad, independently of the pressure exerted by the rib at the edge of the bladder, the material removal rate near the edge of the work piece can be controlled.

3. 发明授权

US06752442B2 Workpiece handling end-effector and a method for processing workpieces using a workpiece handling end-effector 失效
标题翻译：工件处理端部执行器和使用工件处理端部执行器处理工件的方法
公开(公告)号：US06752442B2
公开(公告)日：2004-06-22
申请号：US10040996
申请日：2001-11-09
申请人： Randy McNurlin , Mark Maggio , Michael Smigel , Ann Wilkey , James L. Farmer , Shawn Robertson
发明人： Randy McNurlin , Mark Maggio , Michael Smigel , Ann Wilkey , James L. Farmer , Shawn Robertson
IPC分类号： B66C110
CPC分类号： B24B37/345 , H01L21/68707 , Y10S414/141
摘要： A two sided wafer handling end-effector provides for the efficient loading and unloading of wafers into and out of a wafer processing apparatus. Each side of the end-effector includes spaced apart rotatable catch mechanisms between which a wafer is firmly grasped. When the end-effector is positioned beneath the wafer processing apparatus, the catch mechanisms are rotated to an open position and a lifting surface on the catch mechanisms lifts the wafer into the wafer processing apparatus. When the catch mechanisms are in the open position, the wafer is centered on the end-effector by rotatable rocker assemblies that contact the edge of the wafer. As the end-effector is raised into contact with the processing apparatus, the rocker assemblies rotate to a lowered position in the end-effector while arcuate surfaces on the assemblies maintain contact with the wafer edge.
摘要翻译：双面晶片处理端部执行器提供晶片加工和卸载晶片处理装置的有效装载和卸载。末端执行器的每一侧包括间隔开的可旋转的捕获机构，在其之间牢固地抓住晶片。当末端执行器位于晶片处理装置下方时，捕捉机构被旋转到打开位置，并且捕获机构上的提升表面将晶片提升到晶片处理装置中。当捕捉机构处于打开位置时，通过接触晶片边缘的可旋转的摇臂组件，晶片以端部执行器为中心。当末端执行器升高成与处理装置接触时，摇臂组件在端部执行器中旋转到降低的位置，同时组件上的弧形表面保持与晶片边缘的接触。

4. 发明授权

US06213720B1 High strength composite reinforced turbomachinery disk 有权
标题翻译：高强度复合增强涡轮机械盘
公开(公告)号：US06213720B1
公开(公告)日：2001-04-10
申请号：US09330708
申请日：1999-06-11
申请人： James L. Farmer
发明人： James L. Farmer
IPC分类号： B63H126
CPC分类号： F01D21/045 , F01D5/021 , F01D5/06 , Y02T50/672
摘要： A turbomachinery disk is provided that has a rim portion, an intermediate portion, and a hub portion. Annular flanges extend axially on both direction from the hub portion. Disposed concentrically about these flanges is a ring of reinforced composite fibers. The ring of composite fibers is of sufficient mass that some of the hoop stress in the hub portion will be transferred to the ring. As a result the mass of the disk is less than the mass of a conventional disk without the composite ring.
摘要翻译：提供了一种具有轮缘部分，中间部分和轮毂部分的涡轮机械盘。环状凸缘从毂部沿两个方向轴向延伸。围绕这些法兰同心地设置有一个增强复合纤维环。复合纤维环具有足够的质量，轮毂部分中的一些环向应力将被转移到环上。结果，盘的质量小于没有复合环的常规盘的质量。

5. 发明授权

US5314307A Gas turbine test airfoil 失效
公开(公告)号：US5314307A
公开(公告)日：1994-05-24
申请号：US993151
申请日：1992-12-18
申请人： James L. Farmer
发明人： James L. Farmer
IPC分类号： F01D5/30 , F01D21/04
CPC分类号： F01D21/045 , F01D5/3007
摘要： A turbine or compressor blade designed for deliberate, controlled failure in a gas turbine engine during testing of the engines, includes a lower-strength tubular insert in an axial through bore in the root portion of the blade, which insert fails at preselected conditions to induce blade failure.

6. 发明授权

US3630451A Fluidic controlled sprinkler 失效
标题翻译：流体控制喷雾器
公开(公告)号：US3630451A
公开(公告)日：1971-12-28
申请号：US3630451D
申请日：1969-08-13
申请人： JAMES L FARMER
发明人： FARMER JAMES L
IPC分类号： B05B3/16
CPC分类号： B05B3/044
摘要： A fluid sprinkler or the like which includes a spray bar device with means for oscillating the spray bar which means includes an impeller attached to the bar with a fluidic control circuit arranged to direct fluid to alternate sides of the impeller and thereby control the motion of the spray bar. An inlet is provided for attaching the device to a garden hose or the like and a portion of the inlet fluid is utilized to control the impeller and the spray bar oscillation with the remainder of the inlet fluid passing directly into the controlled spray bar.

7. 发明授权

US06390905B1 Workpiece carrier with adjustable pressure zones and barriers 有权
标题翻译：工件载体具有可调的压力区和屏障
公开(公告)号：US06390905B1
公开(公告)日：2002-05-21
申请号：US09540476
申请日：2000-03-31
申请人： Nikolay N. Korovin , Stephen C. Schultz , John D. Herb , James L. Farmer
发明人： Nikolay N. Korovin , Stephen C. Schultz , John D. Herb , James L. Farmer
IPC分类号： B24B2900
CPC分类号： B24B37/30 , B24B37/32 , B24B49/16
摘要： An apparatus and method are disclosed for planarizing a wafer in a carrier with adjustable pressure zones and adjustable barriers between zones. The carrier has an independently controlled central zone and concentric surrounding zones for distributing the pressure on the backside of a wafer while the wafer is being pressed against an abrasive surface in a chemical-mechanical polishing tool. The pressure zones may be created by mounting an elastic web diaphragm to a carrier housing that has a plurality of recesses. A corresponding plurality of elastic ring shaped ribs may extend from the web diaphragm opposite the recesses. The plurality of ring shaped ribs thereby defines a central zone surrounded by one or more concentric surrounding zones. The zones and barriers may be individually pressurized by utilizing corresponding fluid communication paths during the planarization process. A method for practicing the present invention starts by selecting a carrier with adjustable pressure zones that correspond to the number and locations of the bulges and troughs on the wafer. Zones that correspond to high regions receive greater pressure than zones that correspond to low regions on the wafer. The pressure on the barriers between zones may be optimized to prevent leakage between zones or to smooth the pressure distribution between neighboring zones on the back surface of the wafer.
摘要翻译：公开了一种用于在载体中平坦化晶片的装置和方法，其具有可调节的压力区域和区域之间的可调节的屏障。载体具有独立控制的中心区域和同心的周围区域，用于在晶片在化学机械抛光工具中被压靠在磨料表面上时分配晶片背面的压力。可以通过将弹性腹板隔膜安装到具有多个凹部的托架壳体上来产生压力区域。相应的多个弹性环形肋可以从腹板隔膜相对于凹部延伸。因此，多个环形肋限定了由一个或多个同心周围区域包围的中心区域。通过在平坦化过程中利用相应的流体连通路径可以单独加压区域和障碍物。一种用于实施本发明的方法开始于选择具有可调压力区域的载体，其对应于晶片上的凸起和凹槽的数量和位置。对应于高区域的区域比对应于晶片上的低区域的区域承受更大的压力。可以优化区域之间的屏障上的压力，以防止区域之间的泄漏或者平滑晶片背表面上的相邻区域之间的压力分布。

8. 发明授权

US07025664B2 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece 有权
公开(公告)号：US07025664B2
公开(公告)日：2006-04-11
申请号：US10830412
申请日：2004-04-21
申请人： Nikolay N. Korovin , Stephen C. Schultz , John D. Herb , James L. Farmer
发明人： Nikolay N. Korovin , Stephen C. Schultz , John D. Herb , James L. Farmer
IPC分类号： B24B29/00
CPC分类号： B24B37/30 , B24B37/32 , B24B49/16
摘要： An apparatus for planarizing a work piece includes an easily assembled work carrier. The carrier includes a carrier insert having a work piece bladder clamped to a carrier backing plate with a plurality of clamps to form a plurality of web plenums. The outer edge of the bladder is supported by a rib that is coupled to a carrier plenum. By adjusting the pressure in the carrier plenum, the pressure exerted on the edge of a work piece during a planarization operation can be adjusted. The carrier also includes a floating wear ring that surrounds the work piece bladder and a work piece mounted on that bladder. By adjusting the force exerted by the wear ring on a polishing pad, independently of the pressure exerted by the rib at the edge of the bladder, the material removal rate near the edge of the work piece can be controlled.

9. 发明授权

US07014541B2 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece 有权
公开(公告)号：US07014541B2
公开(公告)日：2006-03-21
申请号：US10672017
申请日：2003-09-26
申请人： Nikolay N. Korovin , Stephen C. Schultz , John D. Herb , James L. Farmer
发明人： Nikolay N. Korovin , Stephen C. Schultz , John D. Herb , James L. Farmer
IPC分类号： B24B1/00
CPC分类号： B24B37/30 , B24B37/32 , B24B49/16
摘要： An apparatus for planarizing a work piece includes an easily assembled work carrier. The carrier includes a carrier insert having a work piece bladder clamped to a carrier backing plate with a plurality of clamps to form a plurality of web plenums. The outer edge of the bladder is supported by a rib that is coupled to a carrier plenum. By adjusting the pressure in the carrier plenum, the pressure exerted on the edge of a work piece during a planarization operation can be adjusted. The carrier also includes a floating wear ring that surrounds the work piece bladder and a work piece mounted on that bladder. By adjusting the force exerted by the wear ring on a polishing pad, independently of the pressure exerted by the rib at the edge of the bladder, the material removal rate near the edge of the work piece can be controlled.

10. 发明授权

US06979034B2 Workpiece handling end-effector and a method for processing workpieces using a workpiece handling end-effector 失效
标题翻译：工件处理端部执行器和使用工件处理端部执行器处理工件的方法
公开(公告)号：US06979034B2
公开(公告)日：2005-12-27
申请号：US10801404
申请日：2004-03-12
申请人： Randy McNurlin , Mark Maggio , Michael Smigel , Ann Wilkey , James L. Farmer , Shawn Robertson
发明人： Randy McNurlin , Mark Maggio , Michael Smigel , Ann Wilkey , James L. Farmer , Shawn Robertson
IPC分类号： B24B37/34 , H01L21/687 , B66C1/10 , B25J15/08
CPC分类号： B24B37/345 , H01L21/68707 , Y10S414/141
摘要： A two sided wafer handling end-effector provides for the efficient loading and unloading of wafers into and out of a wafer processing apparatus. Each side of the end-effector includes spaced apart rotatable catch mechanisms between which a wafer is firmly grasped. When the end-effector is positioned beneath the wafer processing apparatus the catch mechanisms are rotated to an open position and a lifting surface on the catch mechanisms lifts the wafer into the wafer processing apparatus. When the catch mechanisms are in the open position the wafer is centered on the end-effector by rotatable rocker assemblies that contact the edge of the wafer. As the end-effector is raised into contact with the processing apparatus, the rocker assemblies rotate to a lowered position in the end-effector while arcuate surfaces on the assemblies maintain contact with the wafer edge.
摘要翻译：双面晶片处理端部执行器提供晶片加工和卸载晶片处理装置的有效装载和卸载。末端执行器的每一侧包括间隔开的可旋转的捕获机构，在其之间牢固地抓住晶片。当末端执行器定位在晶片处理装置下方时，捕捉机构旋转到打开位置，并且捕获机构上的提升表面将晶片提升到晶片处理装置中。当捕获机构处于打开位置时，通过接触晶片边缘的可旋转的摇臂组件，晶片以端部执行器为中心。当末端执行器升高成与处理装置接触时，摇臂组件在端部执行器中旋转到降低的位置，同时组件上的弧形表面保持与晶片边缘的接触。

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