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    • 2. 发明申请
    • High-Voltage Mosfets Having Current Diversion Region in Substrate Near Fieldplate
    • 高压滤波器在底板附近有电流导流区域
    • US20130093010A1
    • 2013-04-18
    • US13271342
    • 2011-10-12
    • Yun-Pei HuangYi-Feng ChangJam-Wem Lee
    • Yun-Pei HuangYi-Feng ChangJam-Wem Lee
    • H01L29/78
    • H01L29/0653H01L29/063H01L29/0696H01L29/1095H01L29/402H01L29/42368H01L29/7816
    • To limit or prevent current crowding, various HV-MOSFET embodiments include a current diversion region disposed near a drain region of an HV-MOSFET and near an upper surface of the semiconductor substrate. In some embodiments, the current diversion region is disposed near a field plate of the HV-MOSFET, wherein the field plate can also help to reduce or “smooth” electric fields near the drain to help limit current crowding. In some embodiments, the current diversion region is a p-doped, n-doped, or intrinsic region that is at a floating voltage potential. This current diversion region can push current deeper into the substrate of the HV-MOSFET (relative to conventional HV-MOSFETs), thereby reducing current crowding during ESD events. By reducing current crowding, the current diversion region makes the HV-MOSFETs disclosed herein more impervious to ESD events and, therefore, more reliable in real-world applications.
    • 为了限制或防止电流拥挤,各种HV-MOSFET实施例包括设置在HV-MOSFET的漏极区附近并且在半导体衬底的上表面附近的电流分流区域。 在一些实施例中,电流引流区域设置在HV-MOSFET的场板附近,其中场板还可以帮助减少或“平滑”漏极附近的电场,以帮助限制电流拥挤。 在一些实施例中,电流分流区域是处于浮置电压电位的p掺杂,n掺杂或本征区域。 该电流分流区可以将电流深度推入HV-MOSFET的衬底(相对于传统HV-MOSFET),从而减少ESD事件期间的电流拥挤。 通过减少电流拥挤,电流分流区域使得本文公开的HV-MOSFET更加不可避免地存在ESD事件,因此在现实世界的应用中更可靠。
    • 3. 发明授权
    • ESD protection for FinFETs
    • FinFET的ESD保护
    • US08331068B2
    • 2012-12-11
    • US12610960
    • 2009-11-02
    • Jam-Wem LeeAndy Lo
    • Jam-Wem LeeAndy Lo
    • H02H3/22H02H3/20H02H9/04
    • H02H9/04H01L27/0251H01L27/0924H01L29/785
    • An embodiment is a semiconductor device comprising a receiver circuit comprising fin field effect transistors (FinFETs), a transceiver circuit comprising FinFETs, and a transmit bus electrically coupling the receiver circuit and the transceiver circuit, wherein the receiver circuit and the transceiver circuit each further comprises an electrostatic discharge protection circuit comprising planar transistors electrically coupled to the transmit bus. Other embodiments may further comprise a power clamp electrically coupling a first power bus and a first ground bus, a power clamp electrically coupling a second power bus and a second ground bus, or at least two diodes electrically cross-coupling the first ground bus and the second ground bus. Also, the planar transistors of the transceiver circuit and the receiver circuit may each comprise a planar PMOS transistor and a planar NMOS transistor.
    • 一个实施例是一种半导体器件,包括一个包括鳍状场效应晶体管(FinFET)的接收器电路,一个包括FinFET的收发器电路,以及一个电耦合接收器电路和收发器电路的发送总线,其中接收器电路和收发器电路每个还包括 静电放电保护电路包括电耦合到发送总线的平面晶体管。 其他实施例还可以包括电耦合第一电力总线和第一接地总线的功率钳,电耦合第二电力总线和第二接地总线的功率钳,或者电耦合第一接地总线和 第二地面巴士。 此外,收发器电路和接收器电路的平面晶体管可以各自包括平面PMOS晶体管和平面NMOS晶体管。
    • 4. 发明授权
    • Circuit and method for power clamp triggered dual SCR ESD protection
    • 用于电源钳位的电路和方法触发双SCR ESD保护
    • US08049250B2
    • 2011-11-01
    • US12258946
    • 2008-10-27
    • Ming-Hsiang SongJam-Wem Lee
    • Ming-Hsiang SongJam-Wem Lee
    • H01L29/66
    • H01L29/7436H01L27/0262
    • Circuit and method for RC power clamp triggered dual SCR ESD protection. In an integrated circuit, a protected pad is coupled to an upper SCR circuit and a lower SCR circuit; and both are coupled to the RC power clamp circuit, which is coupled between the positive voltage supply and the ground voltage supply. A structure for ESD protection is disclosed having a first well of a first conductivity type adjacent to a second well of a second conductivity type, the boundary forming a p-n junction, and a pad contact diffusion region in each well electrically coupled to a pad terminal; additional diffusions are provided proximate to and electrically isolated from the pad contact diffusion regions, the diffusion regions and first and second wells form two SCR devices. These SCR devices are triggered, during an ESD event, by current injected into the respective wells by an RC power clamp circuit.
    • RC电源钳位电路和方法触发双SCR ESD保护。 在集成电路中,受保护的焊盘耦合到上部SCR电路和下部SCR电路; 并且两者耦合到耦合在正电压源和接地电压源之间的RC功率钳位电路。 公开了一种用于ESD保护的结构,其具有与第二导电类型的第二阱相邻的第一导电类型的第一阱,形成p-n结的边界以及电耦合到焊盘端子的每个阱中的焊盘接触扩散区; 在焊盘接触扩散区域附近提供附加的扩散,并且与焊接接触扩散区域电隔离,扩散区域和第一和第二阱形成两个SCR器件。 这些SCR器件在ESD事件期间被RC功率钳位电路注入到各个阱中的电流被触发。
    • 5. 发明申请
    • ESD Protection for FinFETs
    • FinFET的ESD保护
    • US20100296213A1
    • 2010-11-25
    • US12610960
    • 2009-11-02
    • Jam-Wem LeeAndy Lo
    • Jam-Wem LeeAndy Lo
    • H02H9/00H01L21/00H02H3/22H01L27/02
    • H02H9/04H01L27/0251H01L27/0924H01L29/785
    • An embodiment is a semiconductor device comprising a receiver circuit comprising fin field effect transistors (FinFETs), a transceiver circuit comprising FinFETs, and a transmit bus electrically coupling the receiver circuit and the transceiver circuit, wherein the receiver circuit and the transceiver circuit each further comprises an electrostatic discharge protection circuit comprising planar transistors electrically coupled to the transmit bus. Other embodiments may further comprise a power clamp electrically coupling a first power bus and a first ground bus, a power clamp electrically coupling a second power bus and a second ground bus, or at least two diodes electrically cross-coupling the first ground bus and the second ground bus. Also, the planar transistors of the transceiver circuit and the receiver circuit may each comprise a planar PMOS transistor and a planar NMOS transistor.
    • 一个实施例是一种半导体器件,包括一个包括鳍状场效应晶体管(FinFET)的接收器电路,一个包括FinFET的收发器电路,以及一个电耦合接收器电路和收发器电路的发送总线,其中接收器电路和收发器电路各自还包括 静电放电保护电路包括电耦合到发送总线的平面晶体管。 其他实施例还可以包括电耦合第一电力总线和第一接地总线的功率钳,电耦合第二电力总线和第二接地总线的功率钳,或者电耦合第一接地总线和 第二地面巴士。 此外,收发器电路和接收器电路的平面晶体管可以各自包括平面PMOS晶体管和平面NMOS晶体管。
    • 6. 发明申请
    • Circuit and Method for Power Clamp Triggered Dual SCR ESD Protection
    • 电源钳位触发双SCR ESD保护的电路和方法
    • US20100103570A1
    • 2010-04-29
    • US12258946
    • 2008-10-27
    • Ming-Hsiang SongJam-Wem Lee
    • Ming-Hsiang SongJam-Wem Lee
    • H02H9/00H01L29/74
    • H01L29/7436H01L27/0262
    • Circuit and method for RC power clamp triggered dual SCR ESD protection. In an integrated circuit, a protected pad is coupled to an upper SCR circuit and a lower SCR circuit; and both are coupled to the RC power clamp circuit, which is coupled between the positive voltage supply and the ground voltage supply. A structure for ESD protection is disclosed having a first well of a first conductivity type adjacent to a second well of a second conductivity type, the boundary forming a p-n junction, and a pad contact diffusion region in each well electrically coupled to a pad terminal; additional diffusions are provided proximate to and electrically isolated from the pad contact diffusion regions, the diffusion regions and first and second wells form two SCR devices. These SCR devices are triggered, during an ESD event, by current injected into the respective wells by an RC power clamp circuit.
    • RC电源钳位电路和方法触发双SCR ESD保护。 在集成电路中,受保护的焊盘耦合到上部SCR电路和下部SCR电路; 并且两者耦合到耦合在正电压源和接地电压源之间的RC功率钳位电路。 公开了一种用于ESD保护的结构,其具有与第二导电类型的第二阱相邻的第一导电类型的第一阱,形成p-n结的边界以及电耦合到焊盘端子的每个阱中的焊盘接触扩散区; 在焊盘接触扩散区域附近提供附加的扩散,并且与焊接接触扩散区域电隔离,扩散区域和第一和第二阱形成两个SCR器件。 这些SCR器件在ESD事件期间被RC功率钳位电路注入到各个阱中的电流被触发。
    • 10. 发明授权
    • High-trigger current SCR
    • 高触发电流SCR
    • US08841696B2
    • 2014-09-23
    • US13459283
    • 2012-04-30
    • Jam-Wem LeeYi-Feng Chang
    • Jam-Wem LeeYi-Feng Chang
    • H01L23/36
    • H01L29/7436H01L27/0262
    • An SCR includes a first doped region of a first type having a first doping concentration. A first well of the first type and a first well of a second type are disposed in upper areas of the first doped region of the first type such that the first well of the second type is laterally spaced from the first well of the first type by a non-zero distance. A second doped region of the first type has a second doping concentration that is greater than the first doping concentration and is disposed in the first well of the second type to form an anode of the SCR. A first doped region of the second type is disposed in the first well of the first type and forms a cathode of the SCR.
    • SCR包括具有第一掺杂浓度的第一类型的第一掺杂区域。 第一类型的第一阱和第二类型的第一阱被布置在第一类型的第一掺杂区域的上部区域中,使得第二类型的第一阱与第一类型的第一阱横向间隔开, 非零距离。 第一类型的第二掺杂区域具有大于第一掺杂浓度的第二掺杂浓度,并且设置在第二类型的第一阱中以形成SCR的阳极。 第二类型的第一掺杂区域设置在第一类型的第一阱中并形成SCR的阴极。