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1. 发明申请

US20050257396A1 Wafer dryer and method for drying a wafer 失效
标题翻译：晶圆烘干机和干燥晶片的方法
公开(公告)号：US20050257396A1
公开(公告)日：2005-11-24
申请号：US11075872
申请日：2005-03-09
申请人： Gary Ferrell , Jagjit Ratra
发明人： Gary Ferrell , Jagjit Ratra
IPC分类号： F26B3/00 , H01L21/00
CPC分类号： H01L21/67034
摘要： A wafer dryer and method featuring a nebulizer which emits a pressurized drying liquid stream that converges with an opposed pressurized non-reactive carrier gas stream to produce a drying liquid fog. The pressurized non-reactive gas spray device is disposed partially within a tub and partially within a wafer bath vessel housing a wafer to be dried. The tub has a vent port for allowing the drying liquid fog to pass into the wafer bath vessel to adhere to exposed wafer surfaces and displace remaining liquid on wafer surfaces, thus drying the wafer. The tub may further include a drain for draining drying liquid not converted into the fog or which has condensed. The vent also may include means for retaining larger drying liquid fog particles which allows smaller drying liquid fog particles to pass into the wafer bath vessel.
摘要翻译：一种晶片干燥器和方法，其特征在于雾化器发射加压的干燥液体流，其与相对的加压非反应性载气流收敛以产生干燥液体雾。加压的非反应性气体喷射装置部分地设置在桶内，部分地设置在容纳要干燥的晶片的晶片槽容器内。桶具有用于允许干燥液雾进入晶片浴容器的通气口，以粘附到暴露的晶片表面，并将剩余的液体置于晶片表面上，从而干燥晶片。浴缸还可以包括用于排出未转化为雾或已冷凝的干燥液体的排水口。排气口还可以包括用于保持更大的干燥液雾颗粒的装置，其允许较小的干燥液雾颗粒进入晶片浴容器。

2. 发明申请

US20070245591A1 Methods for drying objects using aerosols 审中-公开
标题翻译：使用气溶胶干燥物体的方法
公开(公告)号：US20070245591A1
公开(公告)日：2007-10-25
申请号：US11408562
申请日：2006-04-22
申请人： Timothy Gens , Jagjit Ratra
发明人： Timothy Gens , Jagjit Ratra
IPC分类号： F26B3/00 , A61K9/12
CPC分类号： H01L21/67034 , H01L21/02052
摘要： The invention provides devices and methods of drying an object with a passive aerosol is created with no expenditure of energy from a drying liquid and delivered to the exposed surface of an object. The passive aerosol is created by rapidly decreasing the pressure of a carrier gas stream and entraining the drying liquid into the pressure means to create a venturi flow mixture of the carrier gas stream and the drying liquid. A primary baffle is positioned in the path of the venturi flow mixture so that the venturi flow mixture strikes against the primary baffle to create the passive aerosol. The passive aerosol can be used to create a drying layer through which the object is passed. The aerosol can also be used to apply directly to an exposed surface of an object to be dried
摘要翻译：本发明提供了用无源气溶胶干燥物体的装置和方法，其不产生来自干燥液体的能量消耗并被输送到物体的暴露表面。被动气溶胶通过快速降低载气流的压力并将干燥液体夹带到压力装置中来产生载气流和干燥液的文氏管流混合物。主挡板位于文丘里流混合物的路径中，使得文丘里流混合物撞击主挡板以产生被动气溶胶。被动气溶胶可用于产生物体通过的干燥层。气溶胶也可以直接施加到待干燥物体的暴露表面

3. 发明申请

US20060290235A1 Uniform cavitation for particle removal 失效
标题翻译：用于颗粒去除的均匀空化
公开(公告)号：US20060290235A1
公开(公告)日：2006-12-28
申请号：US10559894
申请日：2004-06-03
申请人： Gary Ferrell , John Schipper , Jagjit Ratra
发明人： Gary Ferrell , John Schipper , Jagjit Ratra
IPC分类号： H01L41/02
CPC分类号： H01L21/67057 , B08B3/12
摘要： Systems and methods for promoting a substantially uniform cavitation field. With system (100) including a diaphragm (109) dividing a container (103), a second energy pulse corresponding to a first energy pulse arising from collapse of a cavity C is produced and is used to determine whether to adjust a corresponding transducer 121-k. In system (16), a cavity creating unit (11), including an assembly of transducers 15-i, is moveable from a test liquid to a particle removal (PR) liquid after transducer testing. In another system, a sensor plate (170) having an array of sensors 171-j provides a virtual wafer. A substantially uniform field of cavitation may be maintained by a cavity enhancement liquid, or adjustment of transducer energy. Mechanisms of holding an object produce substantially uniform cavitation. Opposed transducers in a container having monotonically decreasing and/or increasing cavitation density produce substantially uniform cavitation density.
摘要翻译：用于促进基本均匀的空化场的系统和方法。对于包括分隔容器（103）的隔膜（109）的系统（100），产生对应于由空腔C的塌陷引起的第一能量脉冲的第二能量脉冲，并且用于确定是否调整相应的换能器121- k。在系统（16）中，包括换能器15 -i的组件的空腔产生单元（11）在换能器测试之后可从测试液体移动到颗粒去除（PR）液体。在另一系统中，具有传感器171-j阵列的传感器板（170）提供虚拟晶片。可以通过空腔增强液体或换能器能量的调节来维持基本均匀的空化场。保持物体的机理产生基本均匀的气蚀。具有单调减小和/或增加的空化密度的容器中的对置换能器产生基本均匀的空化密度。

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