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    • 3. 发明申请
    • REFERENCE VOLTAGE GENERATING APPARATUS AND METHOD
    • 参考电压发生装置和方法
    • US20120161744A1
    • 2012-06-28
    • US13413392
    • 2012-03-06
    • Hyoung-Rae KimHyo-Sun Kim
    • Hyoung-Rae KimHyo-Sun Kim
    • G05F3/02
    • G05F3/24Y10S323/907
    • A method and apparatus for generating a low reference voltage having low power consumption characteristics is provided. A reference voltage generating apparatus includes a constant current source circuit which generates a reference current. A load circuit is connected to the constant current source circuit and generates a voltage which is proportional to the reference current. A current branch circuit removes a portion of temperature-invariant current components included in the reference current from a connection terminal of the constant current source circuit and the load circuit to a ground terminal through a current branch which is different from a current branch of the load circuit.
    • 提供一种用于产生具有低功耗特性的低参考电压的方法和装置。 参考电压产生装置包括产生参考电流的恒流源电路。 负载电路连接到恒流源电路,并产生与参考电流成比例的电压。 电流分支电路通过与负载的当前分支不同的电流分支将包括在恒定电流源电路和负载电路的参考电流中的一部分温度不变电流分量去除到接地端子 电路。
    • 4. 发明申请
    • METHOD OF FORMING A PATTERN USING A PHOTORESIST COMPOSITION FOR IMMERSION LITHOGRAPHY
    • 使用光刻胶组合物形成图案的方法
    • US20090176177A1
    • 2009-07-09
    • US12329189
    • 2008-12-05
    • Seok HanYoung-Hoon KimHyo-Sun Kim
    • Seok HanYoung-Hoon KimHyo-Sun Kim
    • G03F7/20
    • G03F7/0397G03F7/0392G03F7/2041Y10S430/111
    • A photoresist composition for immersion lithography and a method of forming a photoresist pattern using the photoresist composition are disclosed. The photoresist composition includes a photosensitive polymer including a cycloaliphatic group blocked with at least two cyclic acetal groups as a side chain, a photoacid generator and an organic solvent. The hydrophobic photoresist composition may be changed into the hydrophilic photoresist composition by an exposure process. Thus, before the exposure process, the photoresist composition may be insoluble in a liquid for the immersion lithography. After the exposure process, an exposure portion of a photoresist film formed using the photoresist composition may be effectively dissolved in a developing solution to form a uniform photoresist pattern.
    • 公开了一种用于浸没式光刻的光致抗蚀剂组合物和使用光致抗蚀剂组合物形成光致抗蚀剂图案的方法。 光致抗蚀剂组合物包括光敏聚合物,其包含用作为侧链的至少两个环状缩醛基封闭的脂环族基团,光酸产生剂和有机溶剂。 疏水性光致抗蚀剂组合物可通过曝光方法改变为亲水性光致抗蚀剂组合物。 因此,在曝光处理之前,光致抗蚀剂组合物可能不溶于用于浸渍光刻的液体。 在曝光处理之后,使用光致抗蚀剂组合物形成的光致抗蚀剂膜的曝光部分可以有效地溶解在显影液中以形成均匀的光致抗蚀剂图案。
    • 5. 发明申请
    • Artificial nail capable of preventing damage of French-nail decoration
    • 人造指甲能防止法甲指甲装饰的破坏
    • US20070277841A1
    • 2007-12-06
    • US11474610
    • 2006-06-26
    • Hyo Sun Kim
    • Hyo Sun Kim
    • A45D29/00
    • A45D31/00
    • An artificial nail is disclosed, which can increase the adhesive force between a French-nail manicure and the artificial nail and prevent a French-nail decoration from being damaged. The artificial nail includes an upper surface having a rough portion, a French-nail decoration formed on the rough upper surface, an adhesive layer having a strong adhesive force interposed between a French-nail manicure and the upper surface having the French-nail decoration. Also, the artificial nail set includes a tree having plurality of branches branching off from both sides of the tree and a plurality of artificial nails, each of which is detachably coupled to each end portion of the branches and has the above-described construction. The French-nail decoration formed on the artificial nail has a prolonged lifetime because it is prevented from being peeled off, worn or damaged (abraded).
    • 公开了一种人造指甲,其可以增加法甲指甲修指甲与人造指甲之间的粘合力,并防止法术指甲装饰被损坏。 人造指甲包括具有粗糙部分的上表面,形成在粗糙上表面上的法式指甲装饰,具有强力粘合力的粘合剂层,插入法国指甲修指甲和具有法式指甲装饰的上表面之间。 此外,人造指甲套装包括具有从树的两侧分支出的多个分枝的树和多个人造指甲,每个人造指针可拆卸地联接到分支的每个端部并具有上述结构。 人造指甲上形成的法式指甲装饰具有延长的寿命,因为它被防止被剥离,磨损或损坏(磨损)。
    • 6. 发明授权
    • Gate driver without pre-charging capacitor in gate driving circuit
    • 栅极驱动器,不需要在栅极驱动电路中对电容器进行预充电
    • US08553027B2
    • 2013-10-08
    • US12488803
    • 2009-06-22
    • Hyoung-Rae KimHyo-Sun KimYoon-Kyung ChoiJae-Youl Lee
    • Hyoung-Rae KimHyo-Sun KimYoon-Kyung ChoiJae-Youl Lee
    • G06F3/038
    • G09G3/3677G09G2300/0426G09G2310/0248G09G2310/0291
    • A display panel driving apparatus and a method of driving the same are provided, and, in particular, a gate driver and a method of driving the gate driver. The gate driver includes a decoder that decodes gate line selection data and that generates a gate line selection signal. A gate driving circuit generates a gate driving signal in a pre-charging phase and a driving phase in response to the gate line selection signal and a pre-charging control signal that controls an off-state of non-selected gate lines. In a time period of the driving phase in which a gate line is not selected, a node that has been in a floating state is held to a target voltage level in response to a hold control signal. The hold control signal is generated based upon a timing relationship between the gate line selection signal and the pre-charging control signal.
    • 提供了显示面板驱动装置及其驱动方法,特别是栅极驱动器和驱动栅极驱动器的方法。 栅极驱动器包括解码栅极线选择数据并产生栅极线选择信号的解码器。 栅极驱动电路响应于栅极线选择信号而产生预充电阶段和驱动相位中的栅极驱动信号,以及控制非选择栅极线的截止状态的预充电控制信号。 在没有选择栅极线的驱动阶段的时间段中,响应于保持控制信号将处于浮置状态的节点保持到目标电压电平。 保持控制信号基于栅极线选择信号和预充电控制信号之间的定时关系而产生。
    • 8. 发明授权
    • Method of forming a pattern using a photoresist composition for immersion lithography
    • 使用用于浸渍光刻的光致抗蚀剂组合物形成图案的方法
    • US07968275B2
    • 2011-06-28
    • US12329189
    • 2008-12-05
    • Seok HanYoung-Hoon KimHyo-Sun Kim
    • Seok HanYoung-Hoon KimHyo-Sun Kim
    • G03F7/20G03F7/30G03F7/38G03F7/039
    • G03F7/0397G03F7/0392G03F7/2041Y10S430/111
    • A photoresist composition for immersion lithography and a method of forming a photoresist pattern using the photoresist composition are disclosed. The photoresist composition includes a photosensitive polymer including a cycloaliphatic group blocked with at least two cyclic acetal groups as a side chain, a photoacid generator and an organic solvent. The hydrophobic photoresist composition may be changed into the hydrophilic photoresist composition by an exposure process. Thus, before the exposure process, the photoresist composition may be insoluble in a liquid for the immersion lithography. After the exposure process, an exposure portion of a photoresist film formed using the photoresist composition may be effectively dissolved in a developing solution to form a uniform photoresist pattern.
    • 公开了一种用于浸没式光刻的光致抗蚀剂组合物和使用光致抗蚀剂组合物形成光致抗蚀剂图案的方法。 光致抗蚀剂组合物包括光敏聚合物,其包含用作为侧链的至少两个环状缩醛基封端的脂环族基团,光酸产生剂和有机溶剂。 疏水性光致抗蚀剂组合物可通过曝光方法改变为亲水性光致抗蚀剂组合物。 因此,在曝光处理之前,光致抗蚀剂组合物可能不溶于用于浸渍光刻的液体。 在曝光处理之后,使用光致抗蚀剂组合物形成的光致抗蚀剂膜的曝光部分可以有效地溶解在显影液中以形成均匀的光致抗蚀剂图案。
    • 9. 发明申请
    • REFERENCE VOLTAGE GENERATING APPARATUS AND METHOD
    • 参考电压发生装置和方法
    • US20090302824A1
    • 2009-12-10
    • US12478338
    • 2009-06-04
    • Hyoung-Rae KimHyo-Sun Kim
    • Hyoung-Rae KimHyo-Sun Kim
    • G05F3/24
    • G05F3/24Y10S323/907
    • A method and apparatus for generating a low reference voltage having low power consumption characteristics is provided. A reference voltage generating apparatus includes a constant current source circuit which generates a reference current. A load circuit is connected to the constant current source circuit and generates a voltage which is proportional to the reference current. A current branch circuit removes a portion of temperature-invariant current components included in the reference current from a connection terminal of the constant current source circuit and the load circuit to a ground terminal through a current branch which is different from a current branch of the load circuit.
    • 提供一种用于产生具有低功耗特性的低参考电压的方法和装置。 参考电压产生装置包括产生参考电流的恒流源电路。 负载电路连接到恒流源电路,并产生与参考电流成比例的电压。 电流分支电路通过与负载的当前分支不同的电流分支将包括在恒定电流源电路和负载电路的参考电流中的一部分温度不变电流分量去除到接地端子 电路。