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1. 发明申请

US20070158218A1 Disc box structure 审中-公开
标题翻译：盘盒结构
公开(公告)号：US20070158218A1
公开(公告)日：2007-07-12
申请号：US11330161
申请日：2006-01-12
申请人： Hsun-Cheng Chan , Chin-Chi Chang , Ming-Chien Lo , Hui-Chi Huang
发明人： Hsun-Cheng Chan , Chin-Chi Chang , Ming-Chien Lo , Hui-Chi Huang
IPC分类号： B65D85/30
CPC分类号： G11B33/0427
摘要： A disc box structure according to the present invention includes a shell and an auxiliary support. The shell has a base, and a stand protruding upwardly from the base for accommodating a disc. The auxiliary support includes a pivot connected to the base, a lateral arm arranged to a side of the pivot, a pressing portion disposed over the lateral arm, and a stand connected to an opposite side of the pivot. Therefore, the pressing portion is pressed down to release the disc in order to lift the auxiliary support upwards, so that the disc is raised for easy removal.
摘要翻译：根据本发明的盘盒结构包括壳体和辅助支撑件。壳体具有基部和从基部向上突出以容纳盘的支架。辅助支撑件包括连接到基座的枢轴，布置在枢轴侧面的横向臂，设置在横向臂上的按压部分和连接到枢轴相对侧的支架。因此，按压部分以释放盘，以便向上提升辅助支架，使得盘升高以便于移除。

2. 发明授权

US09333619B2 Adaptive endpoint method for pad life effect on chemical mechanical polishing 有权
标题翻译：化学机械抛光的垫寿命效应的自适应终点法
公开(公告)号：US09333619B2
公开(公告)日：2016-05-10
申请号：US13758658
申请日：2013-02-04
申请人： Chu-An Lee , Hui-Chi Huang , Peng-Chung Jangjian
发明人： Chu-An Lee , Hui-Chi Huang , Peng-Chung Jangjian
IPC分类号： H01L21/465 , B24B37/20 , B24B37/013 , B24B49/12 , H01J37/32 , H01L21/66 , H01L21/321
CPC分类号： B24B37/20 , B24B37/013 , B24B37/205 , B24B49/12 , G05B2219/49085 , H01J37/32963 , H01L21/3212 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： The present disclosure provides a chemical mechanical polishing (CMP) system. The CMP system includes a pad designed for wafer polishing, a motor driver coupled with the pad and designed to drive the pad during the wafer polishing, and a controller coupled with the motor driver and designed to control the motor driver. The CMP system further includes an in-situ rate monitor designed to collect polishing data from a wafer on the pad, determine CMP endpoint based on a life stage of the pad, and provide the CMP endpoint to the controller.
摘要翻译：本公开提供了一种化学机械抛光（CMP）系统。 CMP系统包括设计用于晶片抛光的焊盘，与焊盘耦合并设计成在晶片抛光期间驱动焊盘的电动机驱动器，以及与电动机驱动器耦合并设计成控制电动机驱动器的控制器。 CMP系统还包括原位速率监测器，其设计用于收集来自焊盘上的晶片的抛光数据，基于焊盘的寿命阶段确定CMP端点，并将CMP端点提供给控制器。

3. 发明授权

US08367429B2 Adaptive endpoint method for pad life effect on chemical mechanical polishing 有权
标题翻译：化学机械抛光的垫寿命效应的自适应终点法
公开(公告)号：US08367429B2
公开(公告)日：2013-02-05
申请号：US13045289
申请日：2011-03-10
申请人： Chu-An Lee , Hui-Chi Huang , Peng-Chung Jangjian
发明人： Chu-An Lee , Hui-Chi Huang , Peng-Chung Jangjian
IPC分类号： H01L21/66 , H01L21/306
CPC分类号： B24B37/20 , B24B37/013 , B24B37/205 , B24B49/12 , G05B2219/49085 , H01J37/32963 , H01L21/3212 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： The present disclosure provides a semiconductor manufacturing method. The method includes defining a plurality of time regions of pad life for a polishing pad in a chemical mechanical polishing (CMP) system; assigning a ladder coefficient to the polishing pad according to the plurality of time regions of pad life; defining a plurality of endpoint windows to the plurality of time regions, respectively, according to pad life effect; applying a CMP process to a wafer positioned on the polishing pad; determining a time region of a polishing signal of the wafer based on the ladder coefficient; associating one of the endpoint windows to the polishing signal according to the time region; and ending the CMP process at an endpoint determined by the endpoint window.
摘要翻译：本发明提供一种半导体制造方法。该方法包括在化学机械抛光（CMP）系统中为抛光垫定义多个焊盘寿命的时间区域; 根据焊盘寿命的多个时间区域向抛光垫分配梯形系数; 根据垫寿命效应分别将多个端点窗口定义到多个时间区域; 将CMP处理施加到位于抛光垫上的晶片; 基于梯形系数确定晶片的抛光信号的时间区域; 根据时间区域将端点窗口之一与抛光信号相关联; 并在由端点窗口确定的端点处结束CMP进程。

4. 发明申请

US20110215011A1 RETAINING STRUCTURE, DISK RETAINING STRUCTURE AND DISK STORAGE STRUCTURE WITH DOUBLE-FACE CARRIER FUNCTION 审中-公开
标题翻译：保持结构，磁盘保持结构和具有双面载波功能的磁盘存储结构
公开(公告)号：US20110215011A1
公开(公告)日：2011-09-08
申请号：US12717137
申请日：2010-03-04
申请人： CHIN-CHI CHANG , HSUN-CHENG CHAN , HUI-CHI HUANG
发明人： CHIN-CHI CHANG , HSUN-CHENG CHAN , HUI-CHI HUANG
IPC分类号： B65D85/57
摘要： A retaining structure with double-face carrier function includes a carrier unit, an elastic unit and a retaining unit. The carrier unit has a carrier body and a through hole passing through the carrier body. The elastic unit has a plurality of elastic arms extended from an inner surface of the through hole. The retaining unit has a plurality of retaining elements passing through the through hole. Each retaining element has a retaining portion connected to at least two of the elastic arms and extended above and under the through hole, a pressing portion extended inwards from one end of the retaining portion and at least one protrusion portion disposed on an outer surface of the retaining portion and adjacent to the pressing portion. The pressing portions above the through hole are arranged alternately and the pressing portions under the through hole are arranged alternately.
摘要翻译：具有双面载体功能的保持结构包括载体单元，弹性单元和保持单元。载体单元具有载体主体和穿过载体主体的通孔。弹性单元具有从通孔的内表面延伸的多个弹性臂。保持单元具有穿过通孔的多个保持元件。每个保持元件具有连接到至少两个弹性臂并且在通孔的上方和下方延伸的保持部分，从保持部分的一端向内延伸的按压部分和设置在保持部分的外表面上的至少一个突出部分保持部分并且靠近按压部分。通孔上方的按压部交替地配置，贯通孔下方的按压部交替配置。

5. 发明授权

US08969922B2 Field effect transistors and method of forming the same 有权
标题翻译：场效应晶体管及其形成方法
公开(公告)号：US08969922B2
公开(公告)日：2015-03-03
申请号：US13368960
申请日：2012-02-08
申请人： Chia-Chu Liu , Kuei Shun Chen , Mu-Chi Chiang , Yao-Kwang Wu , Bi-Fen Wu , Huan-Just Lin , Hsiao-Tzu Lu , Hui-Chi Huang
发明人： Chia-Chu Liu , Kuei Shun Chen , Mu-Chi Chiang , Yao-Kwang Wu , Bi-Fen Wu , Huan-Just Lin , Hsiao-Tzu Lu , Hui-Chi Huang
IPC分类号： H01L27/118 , H01L29/66
CPC分类号： H01L21/76897 , H01L21/76895 , H01L21/823475 , H01L21/823871
摘要： A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a semiconductor substrate including a first device disposed in a first device region, the first device including a first gate structure, first gate spacers formed on the sidewalls of the first gate structure, and first source and drain features and a second device disposed in a second device region, the second device including a second gate structure, second gate spacers formed on the sidewalls of the second gate structure, and second source and drain features. The semiconductor device further includes a contact etch stop layer (CESL) disposed on the first and second gate spacers and interconnect structures disposed on the first and second source and drain features. The interconnect structures are in electrical contact with the first and second source and drain features and in contact with the CESL.
摘要翻译：公开了一种用于制造半导体器件的半导体器件和方法。示例性的半导体器件包括半导体衬底，其包括设置在第一器件区域中的第一器件，所述第一器件包括第一栅极结构，形成在第一栅极结构的侧壁上的第一栅极间隔物，以及第一源极和漏极特征，设置在第二器件区域中，第二器件包括第二栅极结构，形成在第二栅极结构的侧壁上的第二栅极间隔区以及第二源极和漏极特征。半导体器件还包括设置在第一和第二栅极间隔物上的接触蚀刻停止层（CESL）和布置在第一和第二源极和漏极特征上的互连结构。互连结构与第一和第二源极和漏极特征电接触并与CESL接触。

6. 发明申请

US20130200461A1 Semiconductor Device and Method of Forming the Same 有权
标题翻译：半导体器件及其形成方法
公开(公告)号：US20130200461A1
公开(公告)日：2013-08-08
申请号：US13368960
申请日：2012-02-08
申请人： Chia-Chu Liu , Kuei Shun Chen , Mu-Chi Chiang , Yao-Kwang Wu , Bi-Fen Wu , Huan-Just Lin , Hsiao-Tzu Lu , Hui-Chi Huang
发明人： Chia-Chu Liu , Kuei Shun Chen , Mu-Chi Chiang , Yao-Kwang Wu , Bi-Fen Wu , Huan-Just Lin , Hsiao-Tzu Lu , Hui-Chi Huang
IPC分类号： H01L27/092 , H01L21/768
CPC分类号： H01L21/76897 , H01L21/76895 , H01L21/823475 , H01L21/823871
摘要： A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a semiconductor substrate including a first device disposed in a first device region, the first device including a first gate structure, first gate spacers formed on the sidewalls of the first gate structure, and first source and drain features and a second device disposed in a second device region, the second device including a second gate structure, second gate spacers formed on the sidewalls of the second gate structure, and second source and drain features. The semiconductor device further includes a contact etch stop layer (CESL) disposed on the first and second gate spacers and interconnect structures disposed on the first and second source and drain features. The interconnect structures are in electrical contact with the first and second source and drain features and in contact with the CESL.
摘要翻译：公开了一种用于制造半导体器件的半导体器件和方法。示例性的半导体器件包括半导体衬底，其包括设置在第一器件区域中的第一器件，所述第一器件包括第一栅极结构，形成在第一栅极结构的侧壁上的第一栅极间隔物，以及第一源极和漏极特征，设置在第二器件区域中，第二器件包括第二栅极结构，形成在第二栅极结构的侧壁上的第二栅极间隔区以及第二源极和漏极特征。半导体器件还包括设置在第一和第二栅极间隔物上的接触蚀刻停止层（CESL）和布置在第一和第二源极和漏极特征上的互连结构。互连结构与第一和第二源极和漏极特征电接触并与CESL接触。

7. 发明申请

US20120231555A1 ADAPTIVE ENDPOINT METHOD FOR PAD LIFE EFFECT ON CHEMICAL MECHANICAL POLISHING 有权
标题翻译：用于生物力学抛光效果的自适应终点方法
公开(公告)号：US20120231555A1
公开(公告)日：2012-09-13
申请号：US13045289
申请日：2011-03-10
申请人： Chu-An Lee , Hui-Chi Huang , Peng-Chung Jangjian
发明人： Chu-An Lee , Hui-Chi Huang , Peng-Chung Jangjian
IPC分类号： H01L21/66 , H01L21/306 , B24B49/00
CPC分类号： B24B37/20 , B24B37/013 , B24B37/205 , B24B49/12 , G05B2219/49085 , H01J37/32963 , H01L21/3212 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： The present disclosure provides a semiconductor manufacturing method. The method includes defining a plurality of time regions of pad life for a polishing pad in a chemical mechanical polishing (CMP) system; assigning a ladder coefficient to the polishing pad according to the plurality of time regions of pad life; defining a plurality of endpoint windows to the plurality of time regions, respectively, according to pad life effect; applying a CMP process to a wafer positioned on the polishing pad; determining a time region of a polishing signal of the wafer based on the ladder coefficient; associating one of the endpoint windows to the polishing signal according to the time region; and ending the CMP process at an endpoint determined by the endpoint window.
摘要翻译：本发明提供一种半导体制造方法。该方法包括在化学机械抛光（CMP）系统中为抛光垫定义多个焊盘寿命的时间区域; 根据焊盘寿命的多个时间区域向抛光垫分配梯形系数; 根据垫寿命效应分别将多个端点窗口定义到多个时间区域; 将CMP处理施加到位于抛光垫上的晶片; 基于梯形系数确定晶片的抛光信号的时间区域; 根据时间区域将端点窗口之一与抛光信号相关联; 并在由端点窗口确定的端点处结束CMP进程。

8. 发明申请

US20080017534A1 Multiple optical disc storage case with anti-theft mechanism 审中-公开
标题翻译：多重光盘存储盒具有防盗机制
公开(公告)号：US20080017534A1
公开(公告)日：2008-01-24
申请号：US11488844
申请日：2006-07-19
申请人： Ming-Chien Lo , Chin-Chi Chang , Hsun-Cheng Chan , Hui-Chi Huang
发明人： Ming-Chien Lo , Chin-Chi Chang , Hsun-Cheng Chan , Hui-Chi Huang
IPC分类号： B65D85/57 , B65D85/02 , B65D85/30
CPC分类号： G11B33/045
摘要： A multiple optical disc storage case includes a upper cover, a lower supporting plate, an outer fastener, and a plurality of inner hooks. The upper cover is hollow, and the lower supporting plate is used to assemble with the upper cover. The outer fastener is positioned at one of the upper cover and a lower supporting plate, and has at least one outer hook, at least one stop block and a plurality of resilient block. The outer hooks and the stop blocks are positioned at one side of the outer fastener, and the resilient blocks are equally separated and positioned at the other side of the outer fastener. The outer fastener also has a plurality of inner hooks positioned at the other of the upper case and the lower supporting plate so that the inner hooks are hooked up with the outer hooks.
摘要翻译：多个光盘存储盒包括上盖，下支撑板，外紧固件和多个内钩。上盖是中空的，下支撑板用于与上盖组装。外紧固件定位在上盖和下支撑板中的一个上，并且具有至少一个外钩，至少一个止动块和多个弹性块。外钩和止动块位于外紧固件的一侧，并且弹性块被均匀地分开并定位在外紧固件的另一侧。外部紧固件还具有多个位于上壳体和下支撑板中的另一个的内钩，使得内钩与外钩钩挂。

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