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    • 1. 发明授权
    • Method for remote asynchronous replication of volumes and apparatus therefor
    • 远程异步复制卷及其设备的方法
    • US09569321B2
    • 2017-02-14
    • US12691826
    • 2010-01-22
    • Michael Gordon SchnappChing-Hua Fang
    • Michael Gordon SchnappChing-Hua Fang
    • G06F11/20
    • G06F11/2066G06F3/0619G06F3/064G06F3/065G06F3/0665G06F3/067G06F11/2069G06F11/2074
    • A method for remote asynchronous volume replication and apparatus therefore are disclosed. Asynchronous replication is applied to deal with data changes on the source volume on the local site incurred by Host IO requests. In coordination with the “point-in-time differential backup” technology, the data is subjected to be backuped to Source BAS on the local site (backup-on-write operation) only when the original data being written into the block of the source volume is different from the data of the corresponding block of the destination volume on the remote site. As a result, once a new data is written into the source volume completely, the host will be responded that its Host IO request is completed. Therefore, the data necessarily transmitted to the destination volume on the remote site can be minimized, and the problem of remote data transmission limited by network bandwidth can be prevented effectively, thereby keeping the operation performance of the storage system at a better level.
    • 因此,公开了用于远程异步卷复制的方法和装置。 应用异步复制来处理主机IO请求引起的本地站点上的源卷上的数据更改。 与“时间差异备份”技术配合,只有当原始数据写入源的块时,数据才会被备份到本地站点上的源BAS(备份写操作) 卷与远程站点上目标卷的相应块的数据不同。 因此,一旦将新数据完全写入源卷,主机将响应其主机IO请求完成。 因此,能够将发送到远程站点的目的地卷的数据最小化,能够有效地防止由网络带宽限制的远程数据传输的问题,从而保持存储系统的操作性能更好。
    • 2. 发明授权
    • Prediction of impact on post-repair yield resulting from manufacturing process modification
    • 预测制造过程修改产生的修复后产量的影响
    • US08037379B1
    • 2011-10-11
    • US11469353
    • 2006-08-31
    • Hua FangJohn Chen
    • Hua FangJohn Chen
    • G11C29/44G11C29/50
    • G11C29/56G11C29/56008G11C2029/0403
    • A method for predicting an impact on post-repair yield resulting from manufacturing process modification is described. The method includes receiving bit data representing locations of defective memory cells for a plurality of memory devices. The bit data is modified by removing a selected failure pattern type according to a modification scheme to generate modified bit data. Repairs are simulated on hypothetical memory devices corresponding to the modified bit data, generating a result indicating whether the hypothetical memory device is good or bad. A post-repair yield is then identified and a report is generated indicating the post-repair yield, the post-repair yield representing a number of the plurality of memory devices that would be functional after repair had the plurality of memory devices been manufactured without the selected failure pattern. A method to identify a process providing the best economic benefit is also described.
    • 描述了一种用于预测由制造过程修改产生的对修复后产量的影响的方法。 该方法包括接收表示多个存储器件的不良存储器单元的位置的位数据。 通过根据修改方案去除所选择的故障模式类型来修改比特数据,以生成修改的比特数据。 在对应于修改的位数据的假想存储器件上模拟修复,产生指示假想存储器件是好还是坏的结果。 然后识别修复后的产量,并且产生指示修复后产量的报告,修复后产量表示在修理之后可以起作用的多个存储器件的数量,在多个存储器件中没有 选择故障模式。 还描述了一种识别提供最佳经济效益的方法。
    • 5. 发明申请
    • METHOD AND APPARATUS FOR REUSING COMPONENTS OF A COMPONENT-BASED SOFTWARE SYSTEM
    • 用于重新构建基于组件的软件系统组件的方法和装置
    • US20080295109A1
    • 2008-11-27
    • US12115890
    • 2008-05-06
    • He Yuan HuangShih-Gong LiHua Fang TanWei ZhaoJun Zhu
    • He Yuan HuangShih-Gong LiHua Fang TanWei ZhaoJun Zhu
    • G06F9/46G06F9/50
    • G06F9/547G06F9/541
    • The present invention provides a component reuse method for reusing at least first component that is selected from a first software system to a second software system. The method comprises the steps of: analyzing the first software system, determining dependencies of the at least one first component of the first software system and acquiring relevant interface information; generating surrogates based on the dependencies and the interface information, which will be deployed in the first operating environment and in the second operating environment respectively, wherein the surrogates allow the second software system to invoke service provided by the at least one first component in the first operating environment and allow the at least one first component to invoke relevant service provided in the second software system.
    • 本发明提供了一种用于将从第一软件系统选择的至少第一组件重用到第二软件系统的组件重用方法。 该方法包括以下步骤:分析第一软件系统,确定第一软件系统的至少一个第一组件的依赖性并获取相关接口信息; 基于将在第一操作环境和第二操作环境中部署的依赖性和接口信息生成代理,其中代理允许第二软件系统调用由第一操作环境中的至少一个第一组件提供的服务 并且允许所述至少一个第一组件调用在所述第二软件系统中提供的相关服务。
    • 6. 发明申请
    • Image scanner
    • 图像扫描仪
    • US20070064280A1
    • 2007-03-22
    • US11505664
    • 2006-08-16
    • Po-Hua FangYin-Chun Huang
    • Po-Hua FangYin-Chun Huang
    • H04N1/04
    • H04N1/103H04N1/1017H04N1/1039H04N1/1065H04N2201/0418H04N2201/0422
    • The present invention is to provide an image scanner, for scanning a reflection document or a transmission document. The image scanner comprises a shell, a document window glass, a transmission document carrier, and an optical chassis. The shell has a groove on its upper surface. The document window glass is capable of connecting with the groove, for scanning the reflection document. The transmission document carrier is capable of connecting with the groove, for scanning the transmission document. The optical chassis is provided at a proper location, for retrieving the images of the reflection document and the transmission document and converting them to an electronic signal. Wherein, by placing the document window glass or transmission document carrier into the groove, the image scanner is capable of scanning the reflection document or transmission document, respectively.
    • 本发明提供一种用于扫描反射文件或传输文件的图像扫描器。 图像扫描器包括外壳,文件窗玻璃,传输文件载体和光学底盘。 外壳在其上表面有一个凹槽。 文档窗玻璃能够与凹槽连接,用于扫描反射文件。 传输文件载体能够与凹槽连接,用于扫描传输文件。 光学底盘设置在适当的位置,用于检索反射文件和传输文档的图像并将其转换为电子信号。 其中,通过将文档窗玻璃或传输文档载体放置在凹槽中,图像扫描器能够分别扫描反射文档或传输文档。
    • 8. 发明授权
    • Method for forming minimum area structures for sub-micron CMOS ESD
protection in integrated circuit structures without extra implant and
mask steps, and articles formed thereby
    • 用于在集成电路结构中形成亚微米CMOS ESD保护的最小面积结构的方法,而不需要额外的注入和掩模步骤,以及由此形成的制品
    • US5728612A
    • 1998-03-17
    • US684022
    • 1996-07-19
    • Hua-Fang WeiMichael Colwell
    • Hua-Fang WeiMichael Colwell
    • H01L27/02H01L21/8238
    • H01L27/0251H01L27/0259
    • A method and resulting structure is disclosed for extending or enlarging the effective volumes of one or more source, drain, and/or emitter regions of integrated circuit structures such as an SCR structure and/or an MOS structure designed to protect an integrated circuit structure from damage due to electrostatic discharge (ESD). The additional effective volume allows the SCR and/or MOS protection devices to handle additional energy from an electrostatic discharge applied, for example, to I/O contacts electrically connected to the SCR protection structure. The additional effective volume is obtained, without additional doping or masking steps, by forming individual deep doped regions or wells, beneath one or more heavily doped source, drain, and emitter regions, at the same time and to the same depth and doping concentration as conventional main P wells and/or N wells which are simultaneously formed in the substrate, whereby no additional masks and implanting steps are needed.
    • 公开了用于扩展或扩大诸如SCR结构和/或MOS结构的集成电路结构的一个或多个源极,漏极和/或发射极区域的有效体积的方法和结果,该MOS结构被设计为保护集成电路结构免受 由于静电放电造成的损坏(ESD)。 额外的有效容积允许SCR和/或MOS保护装置处理来自施加的静电放电的附加能量,例如电连接到SCR保护结构的I / O触点。 通过在一个或多个重掺杂的源极,漏极和发射极区域的下面形成单独的深掺杂区域或阱,获得额外的有效体积,而不需要额外的掺杂或掩蔽步骤,并且具有相同的深度和掺杂浓度 常规的主P阱和/或N阱同时形成在衬底中,由此不需要额外的掩模和注入步骤。