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1. 发明授权

US07903530B2 Optical system for spatially controlling light polarization and method for manufacturing the same 有权
标题翻译：用于空间控制光偏振的光学系统及其制造方法
公开(公告)号：US07903530B2
公开(公告)日：2011-03-08
申请号：US11194458
申请日：2005-08-02
申请人： Ho-Chul Kim
发明人： Ho-Chul Kim
IPC分类号： G11B7/00
CPC分类号： G03F7/70158 , G03F7/70125 , G03F7/70566
摘要： An optical system for spatially controlling light polarization, and method for manufacturing the same, includes a light source for generating a light beam of a designated wavelength, a beam shaper for splitting the light beam generated from the light source into a plurality of partial beams, and a polarization controller controlling the polarization states of the partial beams. The polarization controller may be formed on the beam shaper or separate from the beam shaper.
摘要翻译：用于空间控制光偏振的光学系统及其制造方法包括用于产生指定波长的光束的光源，用于将从光源产生的光束分成多个局部光束的光束整形器，以及控制部分光束的偏振状态的偏振控制器。偏振控制器可以形成在光束整形器上或与光束整形器分离。

2. 发明授权

US07855037B2 Photomask having a test pattern that includes separate features for different printed critical dimensions to correlate magnitude and direction of defocus 有权
标题翻译：光掩模具有测试图案，其包括用于不同印刷关键尺寸的单独特征，以使散焦的大小和方向相关联
公开(公告)号：US07855037B2
公开(公告)日：2010-12-21
申请号：US12629115
申请日：2009-12-02
申请人： Ho-Chul Kim
发明人： Ho-Chul Kim
IPC分类号： G03F1/06 , G03F1/14
CPC分类号： G03F9/7026 , G03F1/44
摘要： A photomask having a test pattern is provided for detecting focus variation in a lithographic process. A photomask having a test pattern is adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction of defocus from a best focus position of an exposure tool during the lithographic process.
摘要翻译：提供具有测试图案的光掩模，用于检测光刻工艺中的焦点变化。具有测试图案的光掩模适于打印具有可被测量和分析的关键尺寸的测试特征，以确定在光刻工艺期间曝光工具的最佳聚焦位置的散焦的大小和方向。

3. 发明申请

US20060234137A1 Photomask structures providing improved photolithographic process windows and methods of manufacturing same 审中-公开
标题翻译：提供改进的光刻工艺窗口的光掩模结构及其制造方法
公开(公告)号：US20060234137A1
公开(公告)日：2006-10-19
申请号：US11325081
申请日：2006-01-03
申请人： Ho-Chul Kim
发明人： Ho-Chul Kim
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/36 , G03F1/26 , G03F1/32
摘要： Photolithographic methods for semiconductor manufacturing are provided wherein photomask structures are designed to provide increased lithographic process windows for printing sub-wavelength features. In one aspect, a photomask includes a mask substrate transparent to exposure light of a given wavelength, and a mask pattern formed on a surface of the substrate. The mask pattern comprises a printable element defined by a first and second critical edge, wherein the printable element includes an inner, non-printing feature formed between the first and second critical edges. The inner, non-printing feature is adapted to enhance image contrast at the first and second critical edges of the printable element for the given wavelength of exposure light during a photolithographic process. The non-printing feature comprises a space feature that exposes a region of the mask substrate aligned to the printable element between the first and second critical edges, and a trench feature that is formed in the mask substrate and aligned to the space feature.
摘要翻译：提供了用于半导体制造的光刻方法，其中光掩模结构被设计为提供用于印刷亚波长特征的增加的光刻工艺窗口。一方面，光掩模包括对给定波长的曝光光透明的掩模基板和形成在基板表面上的掩模图案。掩模图案包括由第一和第二临界边缘限定的可印刷元件，其中可印刷元件包括形成在第一和第二临界边缘之间的内部非打印特征。内部非打印功能适于在光刻工艺期间增强曝光光的给定波长的可印刷元件的第一和第二临界边缘处的图像对比度。非打印特征包括将掩模基板的与第一和第二临界边缘之间的可印刷元件对准的区域暴露的空间特征以及形成在掩模基板中并与空间特征对准的沟槽特征。

4. 发明申请

US20060028957A1 Optical system for spatially controlling light polarization and method for manufacturing the same 有权
标题翻译：用于空间控制光偏振的光学系统及其制造方法
公开(公告)号：US20060028957A1
公开(公告)日：2006-02-09
申请号：US11194458
申请日：2005-08-02
申请人： Ho-Chul Kim
发明人： Ho-Chul Kim
IPC分类号： G11B7/00
CPC分类号： G03F7/70158 , G03F7/70125 , G03F7/70566
摘要： An optical system for spatially controlling light polarization, and method for manufacturing the same, includes a light source for generating a light beam of a designated wavelength, a beam shaper for splitting the light beam generated from the light source into a plurality of partial beams, and a polarization controller controlling the polarization states of the partial beams. The polarization controller may be formed on the beam shaper or separate from the beam shaper.
摘要翻译：用于空间控制光偏振的光学系统及其制造方法包括用于产生指定波长的光束的光源，用于将从光源产生的光束分成多个局部光束的光束整形器，以及控制部分光束的偏振状态的偏振控制器。偏振控制器可以形成在光束整形器上或与光束整形器分离。

5. 发明授权

US06900887B2 Method and system for measuring stray light 有权
标题翻译：杂散光测量方法和系统
公开(公告)号：US06900887B2
公开(公告)日：2005-05-31
申请号：US10921164
申请日：2004-08-19
申请人： Ho-chul Kim
发明人： Ho-chul Kim
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01J1/42
CPC分类号： G03F9/7088 , G03F7/7085 , G03F7/70941
摘要： A method and system for measuring stray light for use in an exposure apparatus uses an image sensor to be disposed at a wafer level in the exposure apparatus. The stray light is measured by preparing a reference pattern and a measuring pattern on a reticle. The reference pattern includes a light shielding region having first open regions for transmitting light to a center of an active region of the image sensor. The measuring pattern includes a light shielding region having second open regions for transmitting light to a periphery of the active region. A first intensity of light reaching the active region after being filtered by the reference pattern and a second intensity of light reaching the image sensor after being filtered by the measuring pattern are measured. The intensity of the stray light is evaluated by a difference between the first and second light intensities.
摘要翻译：用于测量用于曝光设备的杂散光的方法和系统使用在曝光设备中设置在晶片级的图像传感器。通过在掩模版上准备参考图案和测量图案来测量杂散光。参考图案包括具有用于将光透射到图像传感器的有源区域的中心的第一开口区域的遮光区域。测量图案包括具有第二开放区域的遮光区域，用于将光透射到有源区域的周围。测量在被基准图案滤波后到达有源区域的第一光强度，以及在通过测量图案滤波后到达图像传感器的第二光强度。通过第一和第二光强度之间的差来评估杂散光的强度。

6. 发明授权

US08594409B2 Automation method for computerized tomography image analysis using automated calculation of evaluation index of degree of thoracic deformation based on automatic initialization, and record medium and apparatus 有权
标题翻译：自动化计算自动化计算机断层摄影图像分析自动计算胸部变形度评估指标自动初始化，记录介质和仪器
公开(公告)号：US08594409B2
公开(公告)日：2013-11-26
申请号：US13519722
申请日：2012-02-09
申请人： Sung Min Kim , Ho Chul Kim
发明人： Sung Min Kim , Ho Chul Kim
IPC分类号： G06K9/00
CPC分类号： A61B6/032 , A61B6/505 , A61B6/5217 , G06T7/0012 , G06T7/12 , G06T7/149 , G06T7/62 , G06T7/68 , G06T2207/30012 , G06T2207/30061
摘要： An automation method for CT image analysis for quantitatively analyzing the degree of thoracic deformation, and a record medium and apparatus are disclosed.
摘要翻译：公开了一种用于定量分析胸部变形程度的CT图像分析的自动化方法，以及记录介质和装置。

7. 发明授权

US08296082B2 System for testing performance of array ultrasound transducer 有权
标题翻译：阵列超声波传感器性能测试系统
公开(公告)号：US08296082B2
公开(公告)日：2012-10-23
申请号：US12525899
申请日：2007-03-09
申请人： Yong-tae Kim , Moon-jae Jho , Sung-soo Jung , Ho-chul Kim , Yong-hyeon Yun
发明人： Yong-tae Kim , Moon-jae Jho , Sung-soo Jung , Ho-chul Kim , Yong-hyeon Yun
IPC分类号： G01B7/287 , G01B17/04 , G01F3/24 , G01F3/30
CPC分类号： G01S7/5205
摘要： A performance inspection system for an array ultrasound transducer includes: a driver for selectively applying an electric signal to all or some parts of constituent channels of the array ultrasound transducer; an acoustic power measurement unit for measuring an ultrasound acoustic power emitted from individual channels receiving the same voltage from the driver; a radiation conductance conversion unit for measuring a voltage signal applied to each channel although the driver applies different voltages to the individual channels, and converting the measured voltage into an ultrasound acoustic power acquired when the same voltage is applied to the channels; and a channel uniformity estimation unit for estimating uniformity of the acoustic power value acquired by the radiation conductance conversion unit or uniformity of acoustic power values of the individual channels measured under the same voltage.
摘要翻译：阵列超声波换能器的性能检查系统包括：用于选择性地将电信号施加到阵列超声换能器的构成通道的全部或部分的驱动器; 声功率测量单元，用于测量从驾驶员接收相同电压的各个通道发出的超声波声功率; 辐射电导转换单元，用于测量施加到每个通道的电压信号，尽管驱动器对各个通道施加不同的电压，并且将测量的电压转换成当将相同的电压施加到通道时获取的超声波功率; 以及信道均匀性估计单元，用于估计由辐射电导转换单元获取的声功率值的均匀性或在相同电压下测量的各个通道的声功率值的均匀性。

8. 发明申请

US20100313628A1 SYSTEM FOR TESTING PERFORMANCE OF ARRAY ULTRASOUND TRANSDUCER 有权
标题翻译：用于测试阵列超声波传感器性能的系统
公开(公告)号：US20100313628A1
公开(公告)日：2010-12-16
申请号：US12525899
申请日：2007-03-09
申请人： Yong-tae Kim , Moon-jae Jho , Sung-soo Jung , Ho-chul Kim , Yong-hyeon Yun
发明人： Yong-tae Kim , Moon-jae Jho , Sung-soo Jung , Ho-chul Kim , Yong-hyeon Yun
IPC分类号： G01N29/30
CPC分类号： G01S7/5205
摘要： A performance inspection system for an array ultrasound transducer includes: a driver for selectively applying an electric signal to all or some parts of constituent channels of the array ultrasound transducer; an acoustic power measurement unit for measuring an ultrasound acoustic power emitted from individual channels receiving the same voltage from the driver; a radiation conductance conversion unit for measuring a voltage signal applied to each channel although the driver applies different voltages to the individual channels, and converting the measured voltage into an ultrasound acoustic power acquired when the same voltage is applied to the channels; and a channel uniformity estimation unit for estimating uniformity of the acoustic power value acquired by the radiation conductance conversion unit or uniformity of acoustic power values of the individual channels measured under the same voltage.
摘要翻译：阵列超声波换能器的性能检查系统包括：用于选择性地将电信号施加到阵列超声换能器的构成通道的全部或部分的驱动器; 声功率测量单元，用于测量从驾驶员接收相同电压的各个通道发出的超声波声功率; 辐射电导转换单元，用于测量施加到每个通道的电压信号，尽管驱动器对各个通道施加不同的电压，并且将测量的电压转换成当将相同的电压施加到通道时获取的超声波功率; 以及信道均匀性估计单元，用于估计由辐射电导转换单元获取的声功率值的均匀性或在相同电压下测量的各个通道的声功率值的均匀性。

9. 发明申请

US20080268353A1 STENCIL MASK HAVING MAIN AND AUXILIARY STRUT AND METHOD OF FORMING THE SAME 失效
标题翻译：具有主要和辅助条纹的横断面及其形成方法
公开(公告)号：US20080268353A1
公开(公告)日：2008-10-30
申请号：US12114946
申请日：2008-05-05
申请人： In-Sung KIM , Ho-Chul Kim
发明人： In-Sung KIM , Ho-Chul Kim
IPC分类号： G03F1/00
CPC分类号： G03F1/20 , Y10S430/143
摘要： A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an aperture through which particle beams can permeate and non-pattern areas interposed between the pattern areas. A main strut supports the membrane areas and is formed on the border area of the membrane forming thin layer. An auxiliary strut is formed in the non-pattern areas inside the membrane pattern area such that the auxiliary strut divides the membrane areas into plural divided membrane areas. The auxiliary strut supports the divided membrane areas.
摘要翻译：模板掩模包括具有膜区域的膜形成薄层和限制膜区域的边界区域。膜区域具有多个图案区域，其包括孔径，颗粒束可穿过该孔，并且插入在图案区域之间的非图案区域。主支柱支撑膜区域并形成在膜形成薄层的边界区域上。在膜图案区域内的非图案区域中形成辅助支柱，使得辅助支柱将膜区域分成多个分隔的膜区域。辅助支柱支撑分隔膜区域。

10. 发明授权

US07384711B2 Stencil mask having main and auxiliary strut and method of forming the same 失效
标题翻译：具有主支柱和辅助支柱的模板掩模及其形成方法
公开(公告)号：US07384711B2
公开(公告)日：2008-06-10
申请号：US10827513
申请日：2004-04-19
申请人： In-Sung Kim , Ho-Chul Kim
发明人： In-Sung Kim , Ho-Chul Kim
IPC分类号： G03F9/00
CPC分类号： G03F1/20 , Y10S430/143
摘要： A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an aperture through which particle beams can permeate and non-pattern areas interposed between the pattern areas. A main strut supports the membrane areas and is formed on the border area of the membrane forming thin layer. An auxiliary strut is formed in the non-pattern areas inside the membrane pattern area such that the auxiliary strut divides the membrane areas into plural divided membrane areas. The auxiliary strut supports the divided membrane areas.
摘要翻译：模板掩模包括具有膜区域的膜形成薄层和限制膜区域的边界区域。膜区域具有多个图案区域，其包括孔径，颗粒束可穿过该孔，并且插入在图案区域之间的非图案区域。主支柱支撑膜区域并形成在膜形成薄层的边界区域上。在膜图案区域内的非图案区域中形成辅助支柱，使得辅助支柱将膜区域分成多个分隔的膜区域。辅助支柱支撑分隔膜区域。

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