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1. 发明授权

US08604451B2 Target supply apparatus 有权
标题翻译：目标供应装置
公开(公告)号：US08604451B2
公开(公告)日：2013-12-10
申请号：US12642308
申请日：2009-12-18
申请人： Takayuki Yabu , Masaki Nakano , Hitoshi Nagano , Takanobu Ishihara
发明人： Takayuki Yabu , Masaki Nakano , Hitoshi Nagano , Takanobu Ishihara
IPC分类号： H05G2/00 , G01J3/10 , A61N5/06
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： A target supply apparatus controls a gas pressure inside a tank storing a liquid target material to be outputted from a nozzle by a pressure of gas supplied from a gas supply having a pressure regulator. The target supply apparatus comprises a gas passage introducing gas supplied from the gas supply into the tank, and a high-precision pressure regulator arranged on the gas passage and regulating a pressure of gas flowing the gas passage. The high-precision pressure regulator is able to regulate pressure with accuracy higher than the pressure regulator.
摘要翻译：目标供给装置通过从具有压力调节器的气体供给源提供的气体的压力来控制储存从喷嘴输出的液体目标材料的罐内的气体压力。目标供给装置包括从气体供给到罐中的气体导入气体的通道，以及配置在气体通路上的高精度的压力调节器，调节气体流路的气体的压力。高精度压力调节器能够以高于压力调节器的精度来调节压力。

2. 发明申请

US20110226745A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：极致超紫外光发生系统
公开(公告)号：US20110226745A1
公开(公告)日：2011-09-22
申请号：US13048454
申请日：2011-03-15
申请人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
发明人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC分类号： B23K26/04
CPC分类号： G03F7/70033 , G03F7/70891 , G03F7/70916 , G03F7/70925 , G21K1/06 , G21K2201/064 , G21K2201/067 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
摘要翻译：极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外线发生系统可以包括：室入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个光学元件以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

3. 发明授权

US08872142B2 Extreme ultraviolet light generation apparatus 有权
标题翻译：极紫外光发生装置
公开(公告)号：US08872142B2
公开(公告)日：2014-10-28
申请号：US13474100
申请日：2012-05-17
申请人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
发明人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC分类号： G21K5/00 , G21K5/02 , H05G2/00 , G03F7/20
CPC分类号： H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
摘要： An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
摘要翻译：一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

4. 发明申请

US20140203194A1 SYSTEM AND METHOD FOR GENERATING EXTREME ULTRA VIOLET LIGHT 审中-公开
标题翻译：用于产生超级紫外线灯的系统和方法
公开(公告)号：US20140203194A1
公开(公告)日：2014-07-24
申请号：US14241023
申请日：2012-09-05
申请人： Hitoshi Nagano , Yasunori Wada , Tatsuya Yanagida , Osamu Wakabayashi
发明人： Hitoshi Nagano , Yasunori Wada , Tatsuya Yanagida , Osamu Wakabayashi
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , G03F7/70025 , G03F7/70033 , G03F7/70041 , G21K1/062 , H01L21/0275 , H01S3/005 , H01S3/10038 , H01S3/1075 , H01S3/115 , H01S3/1305 , H01S3/1643 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S5/4087 , H05G2/005
摘要： A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.
摘要翻译：一种用于产生极紫外光的系统，其中室内的目标材料被照射成等离子体的激光束，包括被配置为输出第一激光束的第一激光装置，被配置为输出基座的第二激光装置和第二激光束，以及连接到第一和第二激光装置并被配置为使第一激光束首先输出的控制器，控制器在第一激光束之后输出，并且第二激光束的能量高于在基座之后输出的基座。

5. 发明申请

US20100213272A1 TARGET SUPPLY APPARATUS 有权
标题翻译：目标供应装置
公开(公告)号：US20100213272A1
公开(公告)日：2010-08-26
申请号：US12642308
申请日：2009-12-18
申请人： Takayuki YABU , Masaki Nakano , Hitoshi Nagano , Takanobu Ishihara
发明人： Takayuki YABU , Masaki Nakano , Hitoshi Nagano , Takanobu Ishihara
IPC分类号： B05B1/08
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： A target supply apparatus controls a gas pressure inside a tank storing a liquid target material to be outputted from a nozzle by a pressure of gas supplied from a gas supply having a pressure regulator. The target supply apparatus comprises a gas passage introducing gas supplied from the gas supply into the tank, and a high-precision pressure regulator arranged on the gas passage and regulating a pressure of gas flowing the gas passage. The high-precision pressure regulator is able to regulate pressure with accuracy higher than the pressure regulator.
摘要翻译：目标供给装置通过从具有压力调节器的气体供给源提供的气体的压力来控制储存从喷嘴输出的液体目标材料的罐内的气体压力。目标供给装置包括从气体供给到罐中的气体导入气体的通道，以及配置在气体通路上的高精度的压力调节器，调节气体流路的气体的压力。高精度压力调节器能够以高于压力调节器的精度来调节压力。

6. 发明申请

US20120223257A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
标题翻译：极光紫外线发光装置
公开(公告)号：US20120223257A1
公开(公告)日：2012-09-06
申请号：US13474100
申请日：2012-05-17
申请人： Shinji NAGAI , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
发明人： Shinji NAGAI , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC分类号： G21K5/04
CPC分类号： H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
摘要： An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
摘要翻译：一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

7. 发明授权

US08624208B2 Extreme ultraviolet light generation system 有权
标题翻译：极紫外光发生系统
公开(公告)号：US08624208B2
公开(公告)日：2014-01-07
申请号：US13048454
申请日：2011-03-15
申请人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
发明人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC分类号： G21K5/00
CPC分类号： G03F7/70033 , G03F7/70891 , G03F7/70916 , G03F7/70925 , G21K1/06 , G21K2201/064 , G21K2201/067 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
摘要翻译：极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外光发生系统可包括：室入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个光学元件以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

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