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    • 1. 发明授权
    • Printing apparatus and printing method
    • 印刷装置和印刷方法
    • US08585198B2
    • 2013-11-19
    • US12857642
    • 2010-08-17
    • Hiroyuki OnishiToyohiko Mitsuzawa
    • Hiroyuki OnishiToyohiko Mitsuzawa
    • B41J2/01B41J29/38B41J2/155
    • B41J11/002
    • A printing apparatus includes: a first nozzle which ejects a first ink used to print an image on a medium and cured by irradiation of light; a pre-curing light source which emits a pre-curing light to dots formed as the first ink ejected from the first nozzle is landed onto the medium; a second nozzle which ejects a second ink used to coat a surface of the medium and cured by irradiation of light onto the medium after being irradiated by the light from the pre-curing light source; and a main-curing light source which emits a main-curing light to the medium, wherein the irradiation energy of the light emitted to a unit area of the medium from the pre-curing light source is changed according to whether the second ink is ejected from the second nozzle.
    • 打印装置包括:第一喷嘴,其喷射用于在介质上打印图像并通过照射光固化的第一墨; 将预固化光发射到从第一喷嘴喷出的第一墨水形成的点的预固化光源落在介质上; 第二喷嘴,其喷射用于涂覆介质表面的第二油墨,并且在被来自预固化光源的光照射之后通过照射光照射到介质上而固化; 以及将主固化光发射到介质的主固化光源,其中从预固化光源发射到介质的单位区域的光的照射能量根据第二墨水是否被喷射而改变 从第二个喷嘴。
    • 4. 发明申请
    • Apparatus and method for detecting defect existing in pattern on object
    • 用于检测物体上图案中存在的缺陷的装置和方法
    • US20060133660A1
    • 2006-06-22
    • US11289708
    • 2005-11-30
    • Hiroshi OgiHiroyuki OnishiYasushi SasaYuichiro Hikida
    • Hiroshi OgiHiroyuki OnishiYasushi SasaYuichiro Hikida
    • G06K9/00
    • G06T7/001G06T2207/30148
    • In a defect detection apparatus 1, in a reference image inspection circuit 42 compared are a reference image representing a pattern in a die which is determined as a reference on a substrate 9 and a plurality of supervisory images which represent patterns in selected block areas, respectively, to detect defects included in the reference image. Subsequently, in the target image inspection circuit 44, a target image representing a pattern in another die and the reference image are compared to detect a plurality of defect candidates included in the target image. Then, a defect detector 45 excludes defect candidates overlapping with the defects included in the reference image from the plurality of defect candidates on the basis of at least positional information of the defects included in the reference image. This makes it possible to detect defects existing in the pattern in another die accurately while eliminating effects of the defects existing in the pattern in the die which is determined as the reference.
    • 在缺陷检测装置1中,在比较的参照图像检查电路42中,分别表示作为基板9的基准的芯片中的图案的参考图像和分别表示所选块区域中的图案的多个监视图像 以检测参考图像中包含的缺陷。 随后,在目标图像检查电路44中,比较表示另一管芯中的图案的目标图像和参考图像,以检测包括在目标图像中的多个缺陷候选。 然后,缺陷检测器45至少基于包含在参考图像中的缺陷的位置信息,排除与来自多个缺陷候补的参考图像中包含的缺陷重叠的缺陷候选。 这使得可以精确地检测存在于另一个模具中的图案中的缺陷,同时消除存在于作为基准的芯片中的图案中存在的缺陷的影响。