会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Seatback device
    • 座椅设备
    • US08590979B2
    • 2013-11-26
    • US13265444
    • 2010-03-16
    • Tomoki MatsumotoHiroyuki Honda
    • Tomoki MatsumotoHiroyuki Honda
    • A47C7/02B60N2/42
    • B60N2/4228B60N2/42745B60N2/7094
    • A seatback device configured to elastically support a planar elastic body between left and right side frames. The seatback device includes left and right first springs and left and right second springs. The left and right first springs have axes respectively, extending in the width direction of the vehicle. The upper parts of the left and right sides of the planar elastic body body are connected to the left and right side frames through the left and right first springs. The left and right second springs have axes, respectively, extending in the front-and-rear direction of the vehicle body. The lower parts on the left and right sides of the planar elastic body are connected to the left and right side frames through the left and right second springs.
    • 一种座椅靠背装置,其构造成在左右侧框架之间弹性支撑平面弹性体。 座椅靠背装置包括左右第一弹簧和左右第二弹簧。 左右第一弹簧具有分别在车辆的宽度方向上延伸的轴线。 平面弹性体的左右两侧的上部通过左右第一弹簧与左右侧框架连接。 左右第二弹簧分别具有沿车身前后方向延伸的轴线。 平面弹性体的左侧和右侧的下部通过左右第二弹簧连接到左侧和右侧框架。
    • 5. 发明申请
    • MANUFACTURING METHOD OF ORGANIC SEMICONDUCTOR DEVICE
    • 有机半导体器件的制造方法
    • US20080119010A1
    • 2008-05-22
    • US11855271
    • 2007-09-14
    • Mitsutaka NAGAEHironori KOBAYASHIMasanao MATSUOKAHiroyuki HONDA
    • Mitsutaka NAGAEHironori KOBAYASHIMasanao MATSUOKAHiroyuki HONDA
    • H01L51/40
    • H01L51/0018H01L51/0003H01L51/0541
    • A main object of the present invention is to provide a manufacturing method of an organic semiconductor device, wherein the method enabling an organic semiconductor layer to be patterned simply with high productivity and also enabling an organic semiconductor device having an organic semiconductor transistor to be produced with high productivity. To attain the problem, the present invention provides a manufacturing method of an organic semiconductor device comprising an organic semiconductor transistor formation process, wherein the process includes: an organic semiconductor layer formation step of using a substrate to form an organic semiconductor layer made of an organic semiconductor material on the substrate; a passivation layer formation step of forming pattern-wise on the organic semiconductor layer a passivation layer having an ability of shielding vacuum ultraviolet light; and an organic semiconductor layer patterning step of irradiating vacuum ultraviolet light to the passivation layer and to the organic semiconductor layer to etch the organic semiconductor layer corresponding to a part where the passivation layer is not formed.
    • 本发明的主要目的在于提供一种有机半导体器件的制造方法,其中使得有机半导体层能够以高生产率简单地进行构图,并且还能够使具有有机半导体晶体管的有机半导体器件与 生产力高。 为了解决这个问题,本发明提供了一种包括有机半导体晶体管形成工艺的有机半导体器件的制造方法,其中所述工艺包括:有机半导体层形成步骤,使用衬底形成由有机半导体制成的有机半导体层 衬底上的半导体材料; 钝化层形成步骤,在有机半导体层上以图形方式形成具有屏蔽真空紫外光的能力的钝化层; 以及向钝化层和有机半导体层照射真空紫外光以蚀刻与未形成钝化层的部分相对应的有机半导体层的有机半导体层图案形成步骤。