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1. 发明授权

US06562092B1 Cerium based abrasive material, raw material thereof and method for their preparation 有权
标题翻译：铈基磨料，其原料及其制备方法
公开(公告)号：US06562092B1
公开(公告)日：2003-05-13
申请号：US09980123
申请日：2001-11-30
申请人： Terunori Ito , Hidehiko Yamasaki , Yoshitsugu Uchino
发明人： Terunori Ito , Hidehiko Yamasaki , Yoshitsugu Uchino
IPC分类号： C09K314
CPC分类号： C01F17/0043 , B24D3/06 , B24D18/0009 , C01P2006/82 , C09K3/1409
摘要： The present invention provides a stock material for cerium-based abrasives which can be sintered at a relatively low roasting temperature without causing abnormal growth of the particles. More concretely, the stock material for cerium-based abrasives is produced by calcinating the carbonate of rare earth at a given temperature level to partly convert it into the oxide of rare earth in such a way to produce the mixed stock material having a loss on ignition of 0.5 to 25% on a dry basis, determined by heating at 1000° C. for 1 hour.
摘要翻译：本发明提供一种用于铈基研磨剂的原料，其可以在相对低的焙烧温度下烧结而不引起颗粒的异常生长。更具体地说，用于铈系研磨剂的原料是通过在给定的温度水平下煅烧稀土的碳酸盐以部分地将其转化为稀土的氧化物而制造的，以产生具有点火损失的混合原料为0.5〜25％，通过在1000℃下加热1小时来测定。

2. 发明授权

US06776811B2 Cerium based abrasive material, method of quality examination thereof, and method of production thereof 失效
标题翻译：铈类研磨材料，其质量检测方法及其制造方法
公开(公告)号：US06776811B2
公开(公告)日：2004-08-17
申请号：US10344453
申请日：2003-02-12
申请人： Yoshitsugu Uchino , Hidehiko Yamasaki , Kazuaki Takahashi
发明人： Yoshitsugu Uchino , Hidehiko Yamasaki , Kazuaki Takahashi
IPC分类号： C09K314
CPC分类号： C01F17/0018 , C01F17/0012 , C01P2002/72 , C01P2002/74 , C01P2006/12 , C01P2006/80 , C09K3/1409
摘要： The present invention provides a method of examining quality of cerium-based abrasives which can simply determine their grinding characteristics. Specifically, the method employs X-ray diffractometry to examine qualities based on, for example, B/A wherein A and B are peak intensities relevant to LnxOy and LnF3, respectively. The present invention further provides: a method of producing a cerium-based abrasive which can give cerium-based abrasive with specific grinding characteristics; and a cerium-based abrasive which has specific grinding characteristics for specific purposes.
摘要翻译：本发明提供了一种能够简单地确定其研磨特性的铈基磨料的质量检验方法。具体地，该方法采用X射线衍射法来检查基于例如B / A的质量，其中A和B分别是与LnxOy和LnF3相关的峰强度。本发明还提供：一种制备可以给予具有特定研磨特性的铈基磨料的铈基磨料的方法; 以及为特定目的具有特定研磨特性的铈基磨料。

3. 发明授权

US06689178B2 Cerium based abrasive material and method for producing cerium based abrasive material 有权
标题翻译：铈基研磨材料及其制备方法
公开(公告)号：US06689178B2
公开(公告)日：2004-02-10
申请号：US10111405
申请日：2002-05-06
申请人： Terunori Ito , Hidehiko Yamasaki , Naoyoshi Mochizuki , Yoshitsugu Uchino
发明人： Terunori Ito , Hidehiko Yamasaki , Naoyoshi Mochizuki , Yoshitsugu Uchino
IPC分类号： C09K314
CPC分类号： C09K3/1409 , C01F17/0043 , C01P2004/61 , C01P2004/62 , C01P2006/12 , C03C19/00
摘要： Regarding a cerium oxide-based abrasive containing cerium oxide as a main component and abrasive particles with an average particle diameter of 0.2 to 3.0 &mgr;m, the present invention provides a cerium-based abrasive containing coarse particles of 10 &mgr;m or larger in a concentration of 1000 ppm or lower (by weight) or magnetic particles in a concentration of 1000 ppm or lower (by weight). The coarse particles or the magnetic particles are particularly preferable to exist in a concentration of 300 ppm or lower (by weight). Further, by controlling an average value of the specific surface area of the abrasive particles to be within 0.5 to 30 m2/g, the resulting abrasive is provided with a high cutting property and is capable of forming a polished face with high precision. The production method of such cerium-based abrasives comprises control being the concentration of the coarse particles and the classification point and repeated classification. The control of the magnetic particle concentration is made possible by utilization of a filter of a magnetic material and alteration of pulverization media, which are either solely or properly combined with each other to be performed.
摘要翻译：关于含有氧化铈作为主要成分的氧化铈系研磨剂和平均粒径为0.2〜3.0μm的磨料颗粒，本发明提供了含有浓度为1000的10μm以上的粗颗粒的铈系研磨剂 ppm或更低（重量）或浓度为1000ppm或更低（重量）的磁性颗粒。粗颗粒或磁性颗粒特别优选以300ppm或更低（重量）的浓度存在。此外，通过将磨粒的比表面积的平均值控制在0.5〜30m 2 / g以内，所得到的研磨剂具有高切削性，能够以高精度形成研磨面。这种铈系研磨剂的制造方法包括粗粒子的浓度和分级点和重复分级的控制。通过使用磁性材料的过滤器和粉碎介质的改变使得磁性颗粒浓度的控制成为可能，它们彼此单独地或适当地组合以进行。

4. 发明授权

US06585787B2 Cerium based abrasive material 失效
标题翻译：铈基磨料
公开(公告)号：US06585787B2
公开(公告)日：2003-07-01
申请号：US10181450
申请日：2002-07-18
申请人： Hidehiko Yamasaki , Yoshitsugu Uchino , Kazuaki Takahashi
发明人： Hidehiko Yamasaki , Yoshitsugu Uchino , Kazuaki Takahashi
IPC分类号： B24B3700
CPC分类号： B24D3/346 , C01F17/00 , C01F17/0043 , C01P2002/54 , C01P2002/72 , C01P2002/77 , C01P2002/78 , C09G1/02 , C09K3/1409 , G01N23/20
摘要： There is provided a cerium-based abrasive which enables formation of a highly accurate polished surface and has improved grindability. There is also provided a method of evaluating cerium-based abrasives in a relatively easy manner. In order to achieve the above objects, the cerium-based abrasive of this invention is a cerium-based abrasive containing 40% by weight or more of cerium oxide (on the basis of the total weight of rare earth oxides) which is characterized by further containing 0.5 to 10% by weight of fluorine per 100% by weight of the cerium-based abrasive, in terms of atomic weight, and polishing particles consisting of crystals with a lattice constant measured by an X-ray powder diffraction method ranging from 0.544 to 0.560 nm. And the method of evaluating cerium-based abrasives of this invention is a method including the steps of: analyzing samples of cerium-based abrasive to be subjected to evaluation by the X-ray powder diffraction method; obtaining a diffraction angle (&thgr;) of at least one of maximum peaks appearing over the prescribed four ranges; and calculating a lattice constant of crystals constituting the polishing particles of the cerium-based abrasive using the above diffraction angle (&thgr;).
摘要翻译：提供了能够形成高精度抛光表面并具有改善的可磨性的铈基磨料。还提供了以相对容易的方式评价铈基研磨剂的方法。为了实现上述目的，本发明的铈系研磨剂是含有40重量％以上的氧化铈（基于稀土氧化物的总重量）的铈系研磨剂，其特征在于进一步含有0.5〜10重量％的氟，相对于100重量％的铈系研磨剂，以原子量计，由通过X射线粉末衍射法测定的晶格常数的晶体组成的研磨粒子为0.544〜 0.560nm。本发明的铈系研磨剂的评价方法是将X射线粉末衍射法进行评价的铈系研磨剂的样品进行分析的方法，获得在规定的四个范围内出现的最大峰值中的至少一个的衍射角（θ）; 并使用上述衍射角（θ）计算构成铈系研磨剂的研磨粒子的晶体的晶格常数。

5. 发明授权

US06824578B2 Abrasive material 有权
标题翻译：磨料
公开(公告)号：US06824578B2
公开(公告)日：2004-11-30
申请号：US10363678
申请日：2003-03-06
申请人： Yoshitsugu Uchino , Hidehiko Yamasaki , Shigeru Kuwabara
发明人： Yoshitsugu Uchino , Hidehiko Yamasaki , Shigeru Kuwabara
IPC分类号： C09K314
CPC分类号： C09K3/1463 , B24D3/344 , C03C19/00 , C09K3/1454
摘要： A polishing material is provided in which the dispersibility of the abrasive grains of the polishing material having, as a major component, rare earth oxides including cerium oxide is made better and the hardness of abrasive grain precipitates is reduced, and at the same time high efficiency of polishing can be achieved stably. According to the present invention, in a polishing material having, as the major component, rare earth oxides including cerium oxide, any one of crystalline cellulose, calcium secondary phosphate, a condensate of sodium &bgr;-naphthalenesulphonate and formalin, and synthetic silica is contained as an anti-solidification agent capable of softening abrasive grain precipitates of the polishing material when the abrasive grains of the polishing material are dispersed into a dispersion medium, and sodium hexametaphosphate or pyrophosphate is contained as a dispersant capable of dispersing the abrasive grains of the polishing material into the dispersion medium.
摘要翻译：提供了一种抛光材料，其中以具有氧化铈的稀土氧化物为主要成分的研磨材料的磨粒的分散性更好，磨粒析出物的硬度降低，同时高效率的抛光可以稳定地实现。根据本发明，在作为主要成分的具有氧化铈，结晶纤维素，次磷酸钙，β-萘磺酸钠和福尔马林的缩合物和合成二氧化硅中的任一种作为主要成分的研磨材料中，作为当研磨材料的磨粒分散在分散介质中时能够使研磨材料的磨粒沉淀物软化，并且含有六偏磷酸钠或焦磷酸钠作为能够分散研磨材料的磨粒的分散剂的抗凝固剂进入分散介质。

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