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    • 7. 发明授权
    • Method of structuring thin layers
    • 薄层结构的方法
    • US4119483A
    • 1978-10-10
    • US766662
    • 1977-02-08
    • Hubertus HubschUrsula ConvertiniHeinz DimigenHolger Luthje
    • Hubertus HubschUrsula ConvertiniHeinz DimigenHolger Luthje
    • G03F7/11G03F7/26G03F7/42H01L21/00H01L21/027H01L23/29H05K3/04B44C1/22B29C17/08
    • H05K3/048G03F7/11G03F7/26G03F7/428H01L21/00H01L21/0272H01L23/29H01L2924/0002
    • A method of structuring oxide layers, nitride layers or magnetic layers in such manner that a photolacquer mask is manufactured on a substrate and the layer to be structured is provided by means of cathode sputtering both on the photolacquer mask and on the surfaces of the substrate not covered with lacquer. The substrate is then treated with a solvent attacking the lacquer mask; the mask swells up and the parts of the layer to be structured present thereon are chipped off. In order to stimulate this latter process, a layer is provided below the photolacquer mask on the substrate relative to which photolacquer has a small adhesive capacity and, after providing the layer to be structured, an increase in volume of the lacquer mask is produced by thermal treatment. After the complete removal of the photolacquer mask and the parts of the layer to be structured present thereon, the structured thin layer remains on the substrate as a negative of the pattern of the photolacquer mask.
    • 以如下方式构造氧化物层,氮化物层或磁性层,使得在基板上制造光掩模,并且通过阴极溅射在衬底和衬底的表面上提供阴极溅射 用漆覆盖 然后用溶剂攻击漆面处理基材; 掩模向上膨胀,并且其上存在的待结构化层的部分被切掉。 为了刺激后一种方法,在基底上的遮光罩的下方设置有一层,相对于此,光漆具有小的粘合能力,并且在提供待结构的层之后,通过热量产生漆面的体积增加 治疗。 在完全去除光漆掩模和其上存在的结构层的部分之后,结构化薄层保留在基板上,作为遮光罩图案的负值。