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    • 3. 发明授权
    • Multi-quantum barrier laser
    • 多量子势垒激光器
    • US5319660A
    • 1994-06-07
    • US890167
    • 1992-05-29
    • Ying C. ChenHarvey B. Serreze
    • Ying C. ChenHarvey B. Serreze
    • H01S5/20H01S5/34H01S5/343H01S3/19
    • B82Y20/00H01S5/34H01S5/2013H01S5/3409H01S5/34326
    • A semiconductor laser device which provides enhanced carrier confinement. This device utilizes a single or multi-quantum well structure located between graded index confinement layers which are in turn between a pair of cladding layers. Semiconductor layers are selected such that the quantum well active region and confinement layers form a PN junction by being located between layers having N-type dopants on one side and P-type dopants on the second side for proper diode response. Within each confinement layer there is formed a plurality of multi-quantum barrier layers which serve to further increase the carrier confinement within the quantum well region by increasing the effective potential barrier within the graded index confinement region. The multi-quantum barrier layers are comprised of layers of the material forming the graded index confinement layers having alternating large and small concentrations of the material whose percentage is being varied in the graded index confinement layers.
    • 一种提供增强载体限制的半导体激光器件。 该装置利用位于渐变折射率限制层之间的单个或多量子阱结构,这些层又在一对包覆层之间。 选择半导体层,使得量子阱有源区和限制层通过位于一侧具有N型掺杂剂的层和位于第二侧上的P型掺杂剂以形成适合二极管响应的PN结。 在每个限制层内,形成多个多量子势垒层,其用于通过增加分级指数限制区域内的有效势垒来进一步增加量子阱区域内的载流子限制。 多量子势垒层由形成渐变折射率限制层的材料层组成,其具有交替的大和小浓度的材料,其百分比在渐变折射率限制层中变化。
    • 5. 发明授权
    • Visible diode laser
    • 可见二极管激光器
    • US5218613A
    • 1993-06-08
    • US877152
    • 1992-05-01
    • Harvey B. Serreze
    • Harvey B. Serreze
    • H01S5/343
    • B82Y20/00H01S5/34326
    • A semiconductor laser device comprised of GaInP/AlGaInP materials which efficiently produces visible light output with improved carrier confinement and decreased threshold current density levels. The laser diode uses a strained quantum well positioned between a pair of graded index confinement layers which are in turn positioned between a pair of cladding layers. The active region is preferably comprised of Ga.sub.y In.sub.1-y P and the confinement layers are graded index layers comprised of (Al.sub.x Ga.sub.1-x).sub.0.51 In.sub.0.49 P in which the value of x is linearly graded from 0.40 to a maximum value selected from the range of 0.8 to 1.0 in a direction away from the active region. The cladding layers are comprised of (Al.sub.x Ga.sub.1-x).sub.0.51 In.sub.0.49 P in which the value of x is selected from the range 0.8 to 1.0. Bounding layers may be interdisposed between active region and the confinement layer on either side of the active region. The bounding layers are thin layers comprised of (Al.sub.x Ga.sub.1-x).sub.0.51 In.sub.0.49 P in which the value of x is in the range of 0.2-0.3 in the preferred embodiment.
    • 一种由GaInP / AlGaInP材料组成的半导体激光器件,其有效地产生具有改进的载流子限制和降低的阈值电流密度水平的可见光输出。 激光二极管使用位于一对渐变指数限制层之间的应变量子阱,该限制层又位于一对包覆层之间。 有源区优选由GayIn1-yP组成,并且约束层是由(Al x Ga 1-x)0.51 In 0.49 P组成的渐变折射率层,其中x的值从0.40线性分级到从0.8的范围中选择的最大值 在远离有源区域的方向为1.0。 包层由(Al x Ga 1-x)0.51 In 0.49 P组成,其中x的值选自0.8至1.0。 边界层可以在有源区域和有源区域的任一侧上的约束层之间插入。 边界层是在优选实施例中由(Al x Ga 1-x)0.51 In 0.49 P组成的薄层,其中x的值在0.2-0.3的范围内。
    • 10. 发明授权
    • Passivation of InP by plasma deposited phosphorus
    • 通过等离子体沉积磷钝化InP
    • US4696828A
    • 1987-09-29
    • US736750
    • 1985-05-21
    • Rozalie SchachterMarcello ViscogliosiLewis A. BunzDiego J. OlegoHarvey B. SerrezePaul M. Raccah
    • Rozalie SchachterMarcello ViscogliosiLewis A. BunzDiego J. OlegoHarvey B. SerrezePaul M. Raccah
    • H01L21/306H01L21/314H01L23/29H01L23/31H01L31/0216H01L31/18H01L33/00H01L33/44H01L51/05B05D3/06
    • H01L33/44H01L21/02052H01L21/30621H01L21/314H01L23/291H01L23/3171H01L31/02161H01L31/18H01L33/0062H01L2924/0002H01L2924/13063H01L51/0508H01L51/0512Y10S438/958
    • Pnictide thin films, particularly phosphorus, grown on III-V semiconductors, particularly InP, GaP, and GaAs, are amorphous and have a novel layer-like, puckered sheet-like local order. The thin films are typically 400 Angstroms thick and grown preferably by molecular beam deposition, although other processes such as vacuum evaporation, sputtering, chemical vapor deposition, and deposition from a liquid melt may be used. The layers are grown on the , and surfaces of the III-V crystals. The pnictide layer reduces the density of surface states, and allows the depletion layer to be modulated, the surface barrier reduced, the electron concentration at the surface increased, and there is a decrease in the surface recombination velocity and an increase in the photoluminescence intensity. The layers may be utilized in MIS and Metalsemiconductor (Schottky) devices for example to insulate and passivate MISFETS, to passivate MESFETS, to reduce the surface current component of the reverse bias dark current in P-I-N and avalanche diodes, and to improve performance of opto-electronic devices such as light emitting diodes, lasers, solar cells, photo cathodes and photo detectors. The pnictide layer may be applied to intermetallic and compound semiconductors having a pnictide component. The pnictides may be phosphorus, arsenic, antimony or bismuth, or combinations thereof.
    • 在III-V族半导体,特别是InP,GaP和GaAs上生长的Pnictide薄膜,特别是磷是非晶态的,并且具有新颖的层状褶皱片状局部顺序。 薄膜通常为400埃厚,优选通过分子束沉积生长,尽管可以使用诸如真空蒸发,溅射,化学气相沉积和来自液体熔融的沉积等其它工艺。 这些层在III-V晶体的<100> <110>和<111>表面上生长。 第一层降低表面状态的密度,并且允许耗尽层被调制,表面阻挡减小,表面的电子浓度增加,并且表面复合速度降低,并且光致发光强度增加。 这些层可以用于MIS和金属半导体(肖特基)器件中,例如绝缘和钝化MISFET,钝化MESFETS,以减少PIN和雪崩二极管中的反向偏置暗电流的表面电流分量,并且提高光电二极管的性能, 诸如发光二极管,激光器,太阳能电池,光电阴极和光电检测器的电子器件。 可以将pnictide层应用于具有pnictide成分的金属间化合物和化合物半导体。 磷化氢可以是磷,砷,锑或铋,或它们的组合。