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1. 发明授权

US07860217B2 X-ray diffraction measuring apparatus having debye-scherrer optical system therein, and an X-ray diffraction measuring method for the same 有权
$X-ray diffraction measuring apparatus having debye-scherrer optical system therein, and an X-ray diffraction measuring method for the same$
标题翻译：其中具有德拜勒光学系统的X射线衍射测量装置及其X射线衍射测量方法
公开(公告)号：US07860217B2
公开(公告)日：2010-12-28
申请号：US12238471
申请日：2008-09-26
申请人： Tetsuya Ozawa , Ryuji Matsuo , Go Fujinawa , Akira Echizenya
发明人： Tetsuya Ozawa , Ryuji Matsuo , Go Fujinawa , Akira Echizenya
IPC分类号： G01N23/207
CPC分类号： G01N23/20
摘要： An X-ray diffraction measuring apparatus equipped with Debye-Scherrer optical system therein, comprises a generator for generating a characteristic X-ray to be irradiated upon a sample to be measured; an X-ray detector being disposed to surround that sample around; and a focusing arrangement, being disposed between the sample and the X-ray detector, for collecting an X-ray scattering from the sample covering over a predetermined angle, in a peripheral direction, around the sample, and for focusing and irradiating it upon the X-ray detector.
摘要翻译：在其中配备有德拜舍勒光学系统的X射线衍射测量装置包括用于产生待照射待测样品的特征X射线的发生器; 设置为围绕该样本的X射线检测器; 以及配置在样品和X射线检测器之间的聚焦装置，用于在样品周围沿周向收集来自样品覆盖物的X射线散射预定角度，并且用于聚焦并将其照射在 X射线探测器。

2. 发明申请

US20090086910A1 X-Ray Diffraction Measuring Apparatus Having Debye-Scherrer Optical System Therein, and an X-ray Diffraction Measuring Method for the Same 有权
$X-Ray Diffraction Measuring Apparatus Having Debye-Scherrer Optical System Therein, and an X-ray Diffraction Measuring Method for the Same$
标题翻译：其中具有德拜舍勒光学系统的X射线衍射测量装置及其相同的X射线衍射测量方法
公开(公告)号：US20090086910A1
公开(公告)日：2009-04-02
申请号：US12238471
申请日：2008-09-26
申请人： Tetsuya Ozawa , Ryuji Matsuo , Go Fujinawa , Akira Echizenya
发明人： Tetsuya Ozawa , Ryuji Matsuo , Go Fujinawa , Akira Echizenya
IPC分类号： G01N23/20
CPC分类号： G01N23/20
摘要： An X-ray diffraction measuring apparatus equipped with Debye-Scherrer optical system therein, comprises a means for generating a characteristic X-ray to be irradiated upon a sample to be measured; an X-ray detector means being disposed to surround that sample around; and a focusing means, being disposed between the sample and the X-ray detector means, for collecting an X-ray scattering from the sample covering over a predetermined angle, in a peripheral direction, around the sample, and thereby irradiating it upon the X-ray detector means.
摘要翻译：在其中配备有德拜 - 谢勒光学系统的X射线衍射测量装置包括用于产生待照射待测样品的特征X射线的装置; 被设置为围绕该样本的X射线检测器装置; 以及聚焦装置，设置在样品和X射线检测器装置之间，用于在样品周围沿周向收集来自样品覆盖物的X射线散射预定角度，从而将其照射在X上射线检测装置。

3. 发明申请

US20080084967A1 X-ray optical system 有权
标题翻译： X光光学系统
公开(公告)号：US20080084967A1
公开(公告)日：2008-04-10
申请号：US11973825
申请日：2007-10-10
申请人： Ryuji Matsuo , Akira Echizenya , Go Fujinawa
发明人： Ryuji Matsuo , Akira Echizenya , Go Fujinawa
IPC分类号： G21K1/02
CPC分类号： G21K1/06 , G21K1/025
摘要： An X-ray optical system provides selectively a linear X-ray beam and a point X-ray beam while using an X-ray source which generates an X-ray beam having a linear section. When the point X-ray beam is selected, an X-ray intensity per unit area becomes higher. The X-ray optical system has an X-ray source, a parabolic multilayer mirror to which an aperture slit plate is attached, an optical-path selection slit device, a polycapillary optics and an exit-width restriction slit. The polycapillary optics and the exit-width restriction slit are detachably inserted into a path of a parallel beam coming from the parabolic multilayer mirror, and thus they can be removed from the path and a Soller slit and a divergence slit can be inserted instead.
摘要翻译： X射线光学系统选择性地提供线性X射线束和点X射线束，同时使用产生具有线性部分的X射线束的X射线源。当选择点X射线束时，每单位面积的X射线强度变高。 X射线光学系统具有X射线源，安装孔径狭缝板的抛物面多层反射镜，光路选择狭缝器件，多毛细管光学器件和出口宽度限制狭缝。多毛细管光学器件和出口宽度限制狭缝可拆卸地插入到来自抛物面多层反射镜的平行光束的路径中，因此它们可以从路径移除，并且可以插入索勒狭缝和发散狭缝。

4. 发明授权

US06807251B2 X-ray diffraction apparatus 有权
$X-ray diffraction apparatus$
标题翻译： X射线衍射装置
公开(公告)号：US06807251B2
公开(公告)日：2004-10-19
申请号：US10328305
申请日：2002-12-23
申请人： Hitoshi Okanda , Go Fujinawa
发明人： Hitoshi Okanda , Go Fujinawa
IPC分类号： G01N2320
CPC分类号： G01N23/20
摘要： In the measurement with the focusing method, an X-ray beam from an X-ray source passes through an opening of a path-selection slit device and is narrowed by a divergence slit with a predetermined divergence angle and is thereafter incident upon a sample. The changing operation from the focusing method into the parallel beam method is carried out by turning, by 180 degrees, the path-selection slit device around its axis of rotation and by moving the divergence slit in a direction perpendicular to an X-ray traveling direction. Then, the X-ray beam from the X-ray source is reflected by a multilayer mirror to become a parallel beam and passes through the opening of the path-selection slit device and is thereafter incident upon the sample. Thus, the turning of the path-selection slit device enables the change between the focusing method and the parallel beam method, requiring no re-setting operation for the optical system.
摘要翻译：在使用聚焦方法的测量中，来自X射线源的X射线束通过路径选择狭缝器件的开口，并且被具有预定发散角的发散狭缝变窄，然后入射到样品上。通过将路径选择狭缝装置围绕其旋转轴线旋转180度，并且通过沿与X射线行进方向垂直的方向移动发散狭缝来进行从聚焦方法到平行束方法的改变操作。然后，来自X射线源的X射线束被多层反射镜反射成平行光束，并通过路径选择狭缝器件的开口，然后入射到样品上。因此，路径选择狭缝装置的转动能够实现聚焦方式和平行光束方式之间的变化，不需要光学系统的重新设置操作。

5. 发明授权

US06307917B1 Soller slit and X-ray apparatus 有权
标题翻译：索勒狭缝和X射线装置
公开(公告)号：US06307917B1
公开(公告)日：2001-10-23
申请号：US09440057
申请日：1999-11-15
申请人： Katsuhiko Shimizu , Kazuhiko Omote , Go Fujinawa
发明人： Katsuhiko Shimizu , Kazuhiko Omote , Go Fujinawa
IPC分类号： G21K102
CPC分类号： G21K1/025
摘要： A soller slit includes a plurality of metal foils and a plurality of spacers. The spacers are laminated alternatively with the metal foils to support one end portions of the metal foils with a space between adjacent metal foils. The other end portions of the metal foils are opened to be unsupported as a free end. When the soller slit is used in an X-ray apparatus, other X-ray optical components, such as monochromator or a specimen to be analyzed, then the soller slit can be arranged in contact with or in the vicinity of the unsupported end portions of the soller slit. That is, it is possible to unify the soller slit and other X-ray optical components in an assembled state. Therefore, a space dedicated to the soller slit becomes unnecessary. Further, since it is possible to shorten a passage of X-rays correspondingly, attenuation of X-rays to be detected by the X-ray detector can be avoided.
摘要翻译：索勒狭缝包括多个金属箔和多个间隔件。间隔件与金属箔交替层叠以支撑金属箔的一个端部，在相邻的金属箔之间具有空间。金属箔的另一端部作为自由端打开而不被支撑。当在X射线装置中使用索勒狭缝时，其他X射线光学部件，例如单色器或要分析的试样，则可以将索勒狭缝布置成与未支撑端部的接触或附近索勒狭缝。也就是说，可以在组装状态下将soller狭缝和其他X射线光学部件统一起来。因此，不需要专用于索勒狭缝的空间。此外，由于可以相应地缩短X射线的通过，可以避免由X射线检测器检测的X射线的衰减。

6. 发明授权

US06266392B1 Soller slit and manufacturing method of the same 有权
标题翻译：索勒狭缝及其制造方法相同
公开(公告)号：US06266392B1
公开(公告)日：2001-07-24
申请号：US09427617
申请日：1999-10-27
申请人： Go Fujinawa , Shiro Umegaki
发明人： Go Fujinawa , Shiro Umegaki
IPC分类号： G21K102
CPC分类号： G21K1/06
摘要： A soller slit is disclosed, which includes a plurality of metal foils and functions to restrict divergence of X-rays when arranged on an X-ray optical path. The metal foils are prepared by sintering a metal material such that surface thereof have high harmonic surface roughness. Alternatively, the metal foil has oxides formed by oxidation on the surfaces thereof such that the oxides can provide the high harmonic surface roughness. The high harmonic surface roughness of the metal foil restricts total reflection of X-rays at the metal foil. Therefore, it is possible to form high precision parallel X-ray beams by the soller slit to thereby improve resolution in an X-ray measurement.
摘要翻译：公开了一种索勒狭缝，其包括多个金属箔，并且用于在布置在X射线光路上时限制X射线的发散。通过烧结金属材料使其表面具有高谐波表面粗糙度来制备金属箔。或者，金属箔具有通过其表面上的氧化形成的氧化物，使得氧化物可以提供高谐波表面粗糙度。金属箔的高谐波表面粗糙度限制了金属箔上X射线的全反射。因此，可以通过索勒狭缝形成高精度的平行X射线束，从而提高X射线测量中的分辨率。

7. 发明授权

US07542548B2 X-ray optical system 有权
标题翻译： X光光学系统
公开(公告)号：US07542548B2
公开(公告)日：2009-06-02
申请号：US11973825
申请日：2007-10-10
申请人： Ryuji Matsuo , Akira Echizenya , Go Fujinawa
发明人： Ryuji Matsuo , Akira Echizenya , Go Fujinawa
IPC分类号： G21K1/06
CPC分类号： G21K1/06 , G21K1/025
摘要： An X-ray optical system provides selectively a linear X-ray beam and a point X-ray beam while using an X-ray source which generates an X-ray beam having a linear section. When the point X-ray beam is selected, an X-ray intensity per unit area becomes higher. The X-ray optical system has an X-ray source, a parabolic multilayer mirror to which an aperture slit plate is attached, an optical-path selection slit device, a polycapillary optics and an exit-width restriction slit. The polycapillary optics and the exit-width restriction slit are detachably inserted into a path of a parallel beam coming from the parabolic multilayer mirror, and thus they can be removed from the path and a Soller slit and a divergence slit can be inserted instead.
摘要翻译： X射线光学系统选择性地提供线性X射线束和点X射线束，同时使用产生具有线性部分的X射线束的X射线源。当选择点X射线束时，每单位面积的X射线强度变高。 X射线光学系统具有X射线源，安装孔径狭缝板的抛物面多层反射镜，光路选择狭缝器件，多毛细管光学器件和出口宽度限制狭缝。多毛细管光学器件和出口宽度限制狭缝可拆卸地插入到来自抛物面多层反射镜的平行光束的路径中，因此它们可以从路径移除，并且可以插入索勒狭缝和发散狭缝。

8. 发明授权

US06990177B2 X-ray optical system for small angle scattering 有权
标题翻译：用于小角度散射的X射线光学系统
公开(公告)号：US06990177B2
公开(公告)日：2006-01-24
申请号：US10654350
申请日：2003-09-02
申请人： Go Fujinawa , Hitoshi Okanda
发明人： Go Fujinawa , Hitoshi Okanda
IPC分类号： G21K1/02
CPC分类号： G01N23/201
摘要： An X-ray optical system for small angle scattering has a parabolic multilayer mirror and, so that switching to other X-ray incident optical systems for X-ray analysis can be easily performed. A parabolic multilayer mirror, an optical-path selecting slit device, a small-angle selecting slit device and a Soller slit are arranged between an X-ray source and a specimen-side slit. An X-ray beam having passed through the first aperture of an aperture slit plate is interrupted by the optical-path selecting slit. An X-ray beam having passed through the second aperture of the aperture slit plate is reflected at the reflecting surface of the multilayer mirror to become a parallel beam. This parallel beam passes through an aperture of the optical-path selecting slit device. The beam width is restricted by a narrow slit of the small-angle selecting slit device.
摘要翻译：用于小角度散射的X射线光学系统具有抛物面多层反射镜，因此可以容易地进行切换到用于X射线分析的其它X射线入射光学系统。在X射线源和试样侧狭缝之间配置抛物面多层反射镜，光路选择狭缝装置，小角度选择狭缝装置和索勒狭缝。通过光阑狭缝板的第一孔的X射线束被光路选择狭缝中断。已经穿过孔径狭缝板的第二孔的X射线束在多层反射镜的反射表面处被反射成平行光束。该平行光束通过光路选择缝隙装置的孔。光束宽度受到小角度选择狭缝装置的狭窄狭缝的限制。

9. 发明授权

US06917667B2 Method and apparatus for making parallel X-ray beam and X-ray diffraction apparatus 有权
$Method and apparatus for making parallel X-ray beam and X-ray diffraction apparatus$
标题翻译：制造平行X射线束和X射线衍射装置的方法和装置
公开(公告)号：US06917667B2
公开(公告)日：2005-07-12
申请号：US10654349
申请日：2003-09-02
申请人： Go Fujinawa , Hitoshi Okanda
发明人： Go Fujinawa , Hitoshi Okanda
IPC分类号： G21K1/06 , G01N23/20
CPC分类号： G21K1/06
摘要： Parallel X-ray beams with two kinds of wavelength are made with the use of a single parabolic multilayer mirror. A single parabola prepared for a CuKa X-ray is used for making parallel X-ray beams of both the CuKa X-ray and the CoKa X-ray. The CuKa ray emitted from a first X-ray focal spot located at the focus of the parabola is reflected at a reflecting surface composed of the parabola to become a parallel beam going out. When a second X-ray focal spot is arranged at the position apart from the first X-ray focal spot by a predetermined distance, the CoKa X-ray emitted from the second X-ray focal spot is reflected at the same reflecting surface to become a parallel beam going out.
摘要翻译：使用单个抛物面多层反射镜制造具有两种波长的平行X射线束。用CuKa X射线制备的单个抛物线被用于制作CuKa X射线和CoKa X射线的平行X射线束。从位于抛物线的焦点处的第一X射线焦斑发射的CuKa射线在由抛物线组成的反射面上反射成为平行光束出射。当将第二X射线焦点布置在与第一X射线焦点分开预定距离的位置时，从第二X射线焦点发射的CoKa X射线在同一反射面反射成为平行光束出射。

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