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1. 发明授权

US08148211B2 Semiconductor structure processing using multiple laser beam spots spaced on-axis delivered simultaneously 有权
标题翻译：使用同轴间隔的多个激光束点的半导体结构处理
公开(公告)号：US08148211B2
公开(公告)日：2012-04-03
申请号：US11051500
申请日：2005-02-04
申请人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Stephen N. Swaringen , Frank G. Evans
发明人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Stephen N. Swaringen , Frank G. Evans
IPC分类号： H01L21/77 , B23K26/02 , B23K26/06 , B23K26/08 , B23K26/40
CPC分类号： B23K26/067 , H01L21/76894
摘要： Methods and systems selectively irradiate structures on or within a semiconductor substrate using a plurality of laser beams. The structures are arranged in a row extending in a generally lengthwise direction. The method generates a first laser beam that propagates along a first laser beam axis that intersects the semiconductor substrate and a second laser beam that propagates along a second laser beam axis that intersects the semiconductor substrate. The method simultaneously directs the first and second laser beams onto distinct first and second structures in the row. The method moves the first and second laser beam axes relative to the semiconductor substrate substantially in unison in a direction substantially parallel to the lengthwise direction of the row, so as to selectively irradiate structures in the row with one or more of the first and second laser beams simultaneously.
摘要翻译：方法和系统使用多个激光束选择性地照射半导体衬底上或内部的结构。这些结构被布置成在大体上沿长度方向延伸的一排。该方法产生沿着与半导体衬底相交的第一激光束轴传播的第一激光束和沿着与半导体衬底相交的第二激光束轴传播的第二激光束。该方法同时将第一和第二激光束引导到行中不同的第一和第二结构。该方法使第一和第二激光束轴线相对于半导体衬底在基本上平行于该行的长度方向的方向基本上一致地移动，以便用第一和第二激光器中的一个或多个选择性地照射该行中的结构梁同时进行。

2. 发明申请

US20110186555A1 SYSTEM FOR SEMICONDUCTOR STRUCTURE PROCESSING USING MULTIPLE LASER BEAM SPOTS 审中-公开
标题翻译：使用多个激光束波束进行半导体结构处理的系统
公开(公告)号：US20110186555A1
公开(公告)日：2011-08-04
申请号：US13085291
申请日：2011-04-12
申请人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Stephen N. Swaringen , Frank G. Evans
发明人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Stephen N. Swaringen , Frank G. Evans
IPC分类号： B23K26/06
CPC分类号： H01L23/5258 , B23K26/0613 , B23K26/0624 , B23K26/067 , B23K26/10 , B23K2101/40 , H01L21/76894 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems selectively irradiate structures on or within a semiconductor substrate using a plurality of pulsed laser beams. The structures are arranged in a row extending in a generally lengthwise direction. The method generates a first pulsed laser beam that propagates along a first laser beam axis that intersects the semiconductor substrate and a second pulsed laser beam that propagates along a second laser beam axis that intersects the semiconductor substrate. The method directs respective first and second pulses from the first and second pulsed laser beams onto distinct first and second structures in the row. The method moves the first and second laser beam axes relative to the semiconductor substrate substantially in unison in a direction substantially parallel to the lengthwise direction of the row.
摘要翻译：方法和系统使用多个脉冲激光束选择性地照射半导体衬底上或内部的结构。这些结构被布置成在大体上沿长度方向延伸的一排。该方法产生沿着与半导体衬底相交的第一激光束轴传播的第一脉冲激光束和沿着与半导体衬底相交的第二激光束轴传播的第二脉冲激光束。该方法将来自第一和第二脉冲激光束的相应的第一和第二脉冲引导到行中不同的第一和第二结构。该方法使第一激光束和第二激光束相对于半导体衬底在基本上平行于该行的长度方向的方向基本上一致地移动。

3. 发明授权

US07425471B2 Semiconductor structure processing using multiple laser beam spots spaced on-axis with cross-axis offset 有权
标题翻译：半导体结构的处理使用多个激光束点间隔轴上与横轴偏移
公开(公告)号：US07425471B2
公开(公告)日：2008-09-16
申请号：US11051958
申请日：2005-02-04
申请人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Stephen N. Swaringen , Frank G. Evans
发明人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Stephen N. Swaringen , Frank G. Evans
IPC分类号： H01L21/82
CPC分类号： H01L23/5258 , B23K26/0613 , B23K26/0624 , B23K26/067 , B23K26/10 , B23K2101/40 , H01L21/76894 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems selectively irradiate structures on or within a semiconductor substrate using a plurality of laser beams. The structures are arranged in a row extending in a generally lengthwise direction. The method generates a first laser beam that propagates along a first laser beam axis that intersects the semiconductor substrate and a second laser beam that propagates along a second laser beam axis that intersects the semiconductor substrate. The method directs the first and second laser beams onto distinct first and second structures in the row. The second spot is offset from the first spot by some amount in a direction perpendicular to the lengthwise direction of the row. The method moves the first and second laser beam axes relative to the semiconductor substrate along the row substantially in unison in a direction substantially parallel to the lengthwise direction of the row.
摘要翻译：方法和系统使用多个激光束选择性地照射半导体衬底上或内部的结构。这些结构被布置成在大体上沿长度方向延伸的一排。该方法产生沿着与半导体衬底相交的第一激光束轴传播的第一激光束和沿着与半导体衬底相交的第二激光束轴传播的第二激光束。该方法将第一和第二激光束引导到行中不同的第一和第二结构。第二点在与行长度方向垂直的方向上偏离第一点一定量。该方法使第一激光束和第二激光束相对于半导体衬底在基本上平行于该行的长度方向的方向上大致一齐地沿着行移动。

4. 发明授权

US06678058B2 Integrated alignment and calibration of optical system 有权
标题翻译：光学系统的集成对准和校准
公开(公告)号：US06678058B2
公开(公告)日：2004-01-13
申请号：US10039249
申请日：2001-10-24
申请人： Leo B. Baldwin , Frank G. Evans
发明人： Leo B. Baldwin , Frank G. Evans
IPC分类号： G01B1124
CPC分类号： G01B11/27 , G01N21/8806 , G01N21/956
摘要： A calibration system within an optical inspection apparatus comprising a sensor, lens, fiducials, and a CPU. The CPU is configured to receive information from the sensor relating to the fiducial coordinate system and the sensor coordinate system, and the fiducials are used to determine a physical relationship between the sensor coordinates and fiducial coordinates. The calibration system has a means for calibrating the inspection system and measuring critical dimensions of an object in an accurate manner on-the-fly without additional set-up or manual calibration of the system.
摘要翻译：光学检查装置内的校准系统，包括传感器，透镜，基准和CPU。 CPU被配置为从传感器接收与基准坐标系和传感器坐标系相关的信息，并且基准被用于确定传感器坐标和基准坐标之间的物理关系。校准系统具有用于校准检查系统并以准确的方式即时测量物体的关键尺寸的装置，而无需额外设置或手动校准系统。

5. 发明授权

US07935941B2 Semiconductor structure processing using multiple laser beam spots spaced on-axis on non-adjacent structures 有权
标题翻译：使用在非相邻结构上在轴上间隔开的多个激光束点的半导体结构处理
公开(公告)号：US07935941B2
公开(公告)日：2011-05-03
申请号：US11051263
申请日：2005-02-04
申请人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Frank G. Evans
发明人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Frank G. Evans
IPC分类号： B23K26/08 , B23K26/38
CPC分类号： B23K26/067
摘要： Methods and systems selectively irradiate structures on or within a semiconductor substrate using a plurality of laser beams. The structures are arranged in a row extending in a generally lengthwise direction. The method generates a first laser beam that propagates along a first laser beam axis that intersects the semiconductor substrate and a second laser beam that propagates along a second laser beam axis that intersects the semiconductor substrate. The method directs the first and second laser beams onto non-adjacent first and second structures in the row. The method moves the first and second laser beam axes relative to the semiconductor substrate along the row substantially in unison in a direction substantially parallel to the lengthwise direction of the row.
摘要翻译：方法和系统使用多个激光束选择性地照射半导体衬底上或内部的结构。这些结构被布置成在大体上沿长度方向延伸的一排。该方法产生沿着与半导体衬底相交的第一激光束轴传播的第一激光束和沿着与半导体衬底相交的第二激光束轴传播的第二激光束。该方法将第一和第二激光束引导到行中不相邻的第一和第二结构。该方法使第一激光束和第二激光束相对于半导体衬底在基本上平行于该行的长度方向的方向上大致一齐地沿着行移动。

6. 发明授权

US1025307A Wire-fence machine. 失效
公开(公告)号：US1025307A
公开(公告)日：1912-05-07
申请号：US1911637015
申请日：1911-07-05
申请人： FRANK G EVANS
发明人： RAYMOND GEORGE A
CPC分类号： B21F27/06

7. 发明申请

US20090011614A1 RECONFIGURABLE SEMICONDUCTOR STRUCTURE PROCESSING USING MULTIPLE LASER BEAM SPOTS 审中-公开
标题翻译：使用多个激光束的可重构半导体结构处理
公开(公告)号：US20090011614A1
公开(公告)日：2009-01-08
申请号：US12210955
申请日：2008-09-15
申请人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Stephen N. Swaringen , Frank G. Evans
发明人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Stephen N. Swaringen , Frank G. Evans
IPC分类号： H01L21/268 , B23K26/08
CPC分类号： B23K26/067 , B23K26/0624 , B23K26/066 , B23K26/0676 , B23K26/0853 , B23K2101/40 , B23K2103/10 , B23K2103/12 , B23K2103/14 , H01L21/76894 , H01L23/5258 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems selectively irradiate structures on or within a semiconductor wafer using multiple laser beams. The structures may be laser-severable conductive links, and the purpose of the irradiation may be to sever selected links. The structures are arranged in rows and may be processed in either an on-axis mode or a cross-axis mode. In the on-axis mode, the beam spots fall on structures in the same row as they move along the row. In the cross-axis mode, the beam spots fall on structures in different rows as they move along the rows.
摘要翻译：方法和系统使用多个激光束选择性地照射半导体晶片上或其中的结构。结构可以是激光可分割的导电连接，并且照射的目的可以是切断所选择的连接。这些结构被排列成行，并且可以以轴上模式或横轴模式进行处理。在轴上模式下，光束点落在同一行的结构上，因为它们沿着行移动。在横轴模式下，当束沿着行移动时，束斑落在不同行中的结构上。

8. 发明授权

US4016407A Universal modular controller 失效
标题翻译：通用模块化控制器
公开(公告)号：US4016407A
公开(公告)日：1977-04-05
申请号：US614996
申请日：1975-09-19
申请人： Roderick S. Mesecar , Frank G. Evans
发明人： Roderick S. Mesecar , Frank G. Evans
IPC分类号： H03K17/292 , H03K23/66 , G06M3/00
CPC分类号： H03K23/66 , H03K17/292
摘要： A universal modular controller for controlling remote events over short or long time periods. The controller includes a clock, a counter and one or more decoder and logic networks. The clock may have a pulse rate range of from a few microseconds to more than an hour. The counter preferably includes four counter stages. Each of the decoder and logic networks is connected to the data output of the counter stage s and each decoder and logic network includes a programmable switching and logic network. This makes it possible to provide long and short duration continuous signals as well as individual or repeating pulse signals for control of various types of devices or loads. The controller may control one or many devices, in a simple or complex manner and over short or long time periods.
摘要翻译：一种通用的模块化控制器，用于在短时间和长时间内控制远程事件。控制器包括时钟，计数器和一个或多个解码器和逻辑网络。时钟可能具有从几微秒到超过一小时的脉搏率范围。计数器最好包括四个计数器级。解码器和逻辑网络中的每一个都连接到计数器级s的数据输出端，并且每个解码器和逻辑网络包括可编程的开关和逻辑网络。这使得可以提供长和短持续时间的连续信号以及用于控制各种类型的装置或负载的单独或重复的脉冲信号。控制器可以以简单或复杂的方式以及短时间或长时间段来控制一个或多个设备。

9. 发明授权

US07923306B2 Semiconductor structure processing using multiple laser beam spots 有权
标题翻译：使用多个激光束点的半导体结构处理
公开(公告)号：US07923306B2
公开(公告)日：2011-04-12
申请号：US11052000
申请日：2005-02-04
申请人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Stephen N. Swaringen , Frank G. Evans
发明人： Kelly J. Bruland , Brian W. Baird , Ho Wai Lo , Stephen N. Swaringen , Frank G. Evans
IPC分类号： H01L21/00 , B23K26/00
CPC分类号： H01L23/5258 , B23K26/0613 , B23K26/0624 , B23K26/067 , B23K26/10 , B23K2101/40 , H01L21/76894 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems selectively irradiate structures on or within a semiconductor substrate using a plurality of pulsed laser beams. The structures are arranged in a row extending in a generally lengthwise direction. The method generates a first pulsed laser beam that propagates along a first laser beam axis that intersects the semiconductor substrate and a second pulsed laser beam that propagates along a second laser beam axis that intersects the semiconductor substrate. The method directs respective first and second pulses from the first and second pulsed laser beams onto distinct first and second structures in the row. The method moves the first and second laser beam axes relative to the semiconductor substrate substantially in unison in a direction substantially parallel to the lengthwise direction of the row.
摘要翻译：方法和系统使用多个脉冲激光束选择性地照射半导体衬底上或内部的结构。这些结构被布置成在大体上沿长度方向延伸的一排。该方法产生沿着与半导体衬底相交的第一激光束轴传播的第一脉冲激光束和沿着与半导体衬底相交的第二激光束轴传播的第二脉冲激光束。该方法将来自第一和第二脉冲激光束的相应的第一和第二脉冲引导到行中不同的第一和第二结构。该方法使第一激光束和第二激光束相对于半导体衬底在基本上平行于该行的长度方向的方向基本上一致地移动。

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