专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08431190B2 Method for depositing hard metallic coatings 失效
标题翻译：沉积硬质金属涂层的方法
公开(公告)号：US08431190B2
公开(公告)日：2013-04-30
申请号：US12374109
申请日：2007-07-19
申请人： Francis Maury , Aurélia Douard
发明人： Francis Maury , Aurélia Douard
IPC分类号： C23C16/00 , C23C14/26 , H05B6/02 , H05B6/24
CPC分类号： C23C16/18 , C23C16/4486
摘要： A method for depositing a hard metallic chrome coating or similar metal by chemical vapor deposition on a metallic substrate, includes: a) preparing a solution containing, in an oxygen-free solvent, i) a molecular compound of the bis(arene) family that's a precursor of the deposited metal with a decomposition temperature 300° C.-550° C., and ii) a chlorinated additive; b) introducing the solution as aerosol into a heated evaporator at a temperature between the solvent boiling temperature and the precursor decomposition temperature (PDT); and c) driving the vaporized aerosol from the evaporator towards a CVD reactor including a susceptor carrying the substrate, heated above the PDT, up to 550° C., the evaporator and CVD reactor being subjected to atmospheric pressure. This DLI-CVD method performed at low temperature and atmospheric pressure enables continuous industrial treatment of large metallic plates, producing hard, monolayer or nanostructured multilayer metallic coatings. An appropriate injectable solution is also described.
摘要翻译：通过化学气相沉积在金属基底上沉积硬金属铬涂层或类似金属的方法包括：a）制备在无氧溶剂中含有i）二（芳烃）族的分子化合物分解温度为300℃-550℃的沉积金属的前体，和ii）氯化添加剂; b）在溶剂沸腾温度和前体分解温度（PDT）之间的温度下将溶液作为气溶胶引入加热的蒸发器中; 以及c）将蒸发的气溶胶从蒸发器驱动到包括承载基板的CVD反应器的CVD反应器，所述基体在PDT上方加热至550℃，蒸发器和CVD反应器经受大气压力。这种在低温和大气压下进行的DLI-CVD方法可连续工业处理大型金属板，生产硬质，单层或纳米结构的多层金属涂层。还描述了适当的可注射溶液。

2. 发明授权

US5077091A Deposition process in the vapour phase at low temperature of a ceramic coating of the metallic nitride or carbonitride type 失效
标题翻译：金属氮化物或碳化物类型的陶瓷涂层的低温蒸发相中的沉积过程
公开(公告)号：US5077091A
公开(公告)日：1991-12-31
申请号：US479708
申请日：1990-02-14
申请人： Jean-Francois Nowak , Frederic Schuster , Francis Maury , Roland Morancho
发明人： Jean-Francois Nowak , Frederic Schuster , Francis Maury , Roland Morancho
IPC分类号： C04B41/50 , C04B41/87 , C07F11/00 , C23C20060101 , C23C16/18 , C23C16/34 , C23C16/36
CPC分类号： C04B41/009 , C04B41/5062 , C04B41/87 , C23C16/34 , C23C16/36
摘要： The object of the invention is a one-step deposition process of a coating of the ceramic type based on nitrides or carbonitrides of at least one metallic element selected from Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf and Ta on a metallic or ceramic substrate, massive or obtained from fibres, by deposition in the vapor phase wherein a coating is deposited on the substrate by a chemical means at a pressure lower than 10 kPa at a temperature lower than 600.degree. C. and by using a system of precursors constituted simultaneously of:an organo-metallic precursor of the said metallic element selected from the organo-metallic compounds of the sandwich type of general formula:[Ar.sup.1 M Ar.sup.2.sub.n ]L.sub.x L'.sub.ya nitrogen precursor selected from ammonia and hydrazine.
摘要翻译：本发明的目的是基于选自Cr，V，Zr，W，Mo，Co，Mn，Ni，Hf中的至少一种金属元素的氮化物或碳氮化物的陶瓷型涂层的一步沉积工艺， Ta在金属或陶瓷基体上，通过沉积在气相中沉积在金属或陶瓷基底上，其中通过化学方法在低于600℃的温度下在低于10kPa的压力下沉积涂层，并通过使用前体构成的系统：所述金属元素的有机金属前体，选自通式为[Ar1M Ar2n] Lx L'y的有机金属化合物，选自氨和肼的氮前体。

3. 发明申请

US20090324822A1 METHOD FOR DEPOSITING HARD METALLIC COATINGS 失效
标题翻译：沉积硬金属涂层的方法
公开(公告)号：US20090324822A1
公开(公告)日：2009-12-31
申请号：US12374109
申请日：2007-07-19
申请人： Francis Maury , Aurelia Douard
发明人： Francis Maury , Aurelia Douard
IPC分类号： C23C16/44 , C09D1/00
CPC分类号： C23C16/18 , C23C16/4486
摘要： A method for depositing a hard metallic chrome coating or similar metal by chemical vapor deposition on a metallic substrate, includes: a) preparing a solution containing, in an oxygen atom depleted solvent, i) a molecular compound of the bis(arene) family that's a precursor of the deposited metal with a decomposition temperature 300° C.-550° C., and ii) a chlorinated additive; b) introducing the solution as aerosol into a heated evaporator at a temperature between the solvent boiling temperature and the precursor decomposition temperature (PDT); and c) driving the vaporized aerosol from the evaporator towards a CVD reactor including a susceptor carrying the substrate, heated above the PDT, up to 550° C., the evaporator and CVD reactor being subjected to atmospheric pressure. This DLI-CVD method performed at low temperature and atmospheric pressure enables continuous industrial treatment of large metallic plates, producing hard, monolayer or nanostructured multilayer metallic coatings. An appropriate injectable solution is also described.
摘要翻译：通过化学气相沉积在金属基底上沉积硬质金属铬涂层或类似金属的方法包括：a）制备在氧原子贫化溶剂中含有i）二（芳烃）族的分子化合物，其为分解温度为300℃-550℃的沉积金属的前体，和ii）氯化添加剂; b）在溶剂沸腾温度和前体分解温度（PDT）之间的温度下将溶液作为气溶胶引入加热的蒸发器中; 以及c）将蒸发的气溶胶从蒸发器驱动到包括承载基板的CVD反应器的CVD反应器，所述基体在PDT上方加热至550℃，蒸发器和CVD反应器经受大气压力。这种在低温和大气压下进行的DLI-CVD方法可连续工业处理大型金属板，生产硬质，单层或纳米结构的多层金属涂层。还描述了适当的可注射溶液。

4. 发明授权

US08343582B2 Process for deposition of non-oxide ceramic coatings 失效
标题翻译：沉积非氧化物陶瓷涂层的方法
公开(公告)号：US08343582B2
公开(公告)日：2013-01-01
申请号：US12374555
申请日：2007-07-19
申请人： Francis Maury , Aurélia Douard
发明人： Francis Maury , Aurélia Douard
IPC分类号： C23C16/32 , C23C16/34 , C23C16/36
CPC分类号： C23C16/32 , C23C16/34 , C23C16/36 , C23C16/4486
摘要： A method for depositing a non-oxide ceramic-type coating based on chrome carbides, nitrides or carbonitrides, by DLI-CVD at low temperature and atmospheric pressure on a metallic substrate, includes: a) a solution is prepared, containing a molecular compound which is a precursor of the metal to be deposited, belongs to the bis(arene) family, and has a decomposition temperature of 300° C.-550° C., the compound being dissolved in an oxygen atom depleted solvent; b) the solution is introduced as aerosol into a heated evaporator at a temperature between the solvent boiling temperature and the precursor decomposition temperature; and c) the precursor and the vaporized solvent are driven from the evaporator towards a CVD reactor having cold walls, with a susceptor carrying the substrate to be covered and heated to a temperature higher than the decomposition temperature of the precursor, to a maximum of 550° C., the evaporator and the CVD reactor being at atmospheric pressure.
摘要翻译：在金属基材上，通过DLI-CVD在低温和大气压下沉积基于铬碳化物，氮化物或碳氮化物的非氧化物陶瓷型涂层的方法包括：a）制备含有分子化合物的溶液，是属于双（芳烃）族的金属的前体，分解温度为300℃-550℃，该化合物溶解在氧原子消耗溶剂中; b）溶液在溶剂沸腾温度和前体分解温度之间的温度下作为气溶胶引入加热的蒸发器中; 和c）将前体和蒸发的溶剂从蒸发器驱动到具有冷壁的CVD反应器，其中将承载基底的基座被覆盖并加热至高于前体分解温度的温度，最大值为550 蒸发器和CVD反应器处于大气压。

5. 发明申请

US20120177844A1 METHOD AND DEVICE FOR CHEMICAL VAPOR DEPOSITION OF POLYMER FILM ONTO A SUBSTRATE 审中-公开
标题翻译：聚合物薄膜化学蒸气沉积在基材上的方法和装置
公开(公告)号：US20120177844A1
公开(公告)日：2012-07-12
申请号：US13496304
申请日：2010-09-06
申请人： Claudine Biver , Francis Maury , Virginie Santucci , François Senocq , Sylvie Vinsonneau
发明人： Claudine Biver , Francis Maury , Virginie Santucci , François Senocq , Sylvie Vinsonneau
IPC分类号： C23C16/02 , C23C16/455
CPC分类号： B05D3/002 , B05D1/60 , B05D3/06 , B05D3/062 , B05D2203/30 , B05D2203/35
摘要： A method for chemical vapor deposition of a polymer film onto a substrate (6), includes the following two separate, consecutive steps:—a step for the photon activation of the gas phase wherein photon activation energy (42, 43) is provided to at least one gaseous polymer precursor that is present in a mainly gaseous composition, and—a chemical vapor deposition step wherein the activated gaseous polymer precursor, from the photon activation step, is deposited onto a substrate (6) so as to form a polymer film on the substrate, the total gas phase pressure ranging from 102 to 105 Pa. A device (1) for using such a method is also described.
摘要翻译：将聚合物膜化学气相沉积到衬底（6）上的方法包括以下两个独立的连续步骤： - 用于光子激活气相的步骤，其中光子活化能（42,43）被提供到存在于主要气体组合物中的至少一种气态聚合物前体和 - 化学气相沉积步骤，其中来自光子活化步骤的活化气态聚合物前体沉积在基底（6）上以形成聚合物膜基板，总气相压力为102〜105Pa，还描述了使用这种方法的装置（1）。

6. 发明授权

US5302422A Deposition process of a ceramic coating on a metallic substrate 失效
标题翻译：陶瓷涂层在金属基底上的沉积过程
公开(公告)号：US5302422A
公开(公告)日：1994-04-12
申请号：US975999
申请日：1992-11-13
申请人： Jean-Francois Nowak , Francis Maury , Djarollah Oquab , Roland Morancho
发明人： Jean-Francois Nowak , Francis Maury , Djarollah Oquab , Roland Morancho
IPC分类号： C23C8/36 , C23C16/02 , C23C16/30 , C23C16/32 , C23C16/34 , C23C16/36 , C23C28/04 , C23C30/00 , B05D3/06 , C23C16/00
CPC分类号： C23C16/0245 , C23C16/30 , C23C16/32 , C23C28/04
摘要： The object of the present invention is a deposition process of a coating of the ceramic type based on carbides, nitrides, or carbonitrides of metallic elements such as Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf, Ta, Ti, Nb and Fe in which the coating of the ceramic type is deposited at low temperature in the vapour phase on a metallic substrate from organo-metallic precursors wherein, prior to this deposition in the vapour phase and without subsequent placing in contact with an oxidizing and/or polluting atmosphere, a reactive ionic pickling is carried out in a reducing atmosphere.
摘要翻译：本发明的目的是基于Cr，V，Zr，W，Mo，Co，Mn，Ni，Hf，Ta等金属元素的碳化物，氮化物或碳氮化物的陶瓷型涂层的沉积工艺， Ti，Nb和Fe，其中陶瓷类型的涂层在有机金属前体的金属基底上以气相沉积在金属基底上，其中在气相沉积之前并且不随后与氧化和/或污染气氛，在还原气氛中进行反应性离子酸洗。

7. 发明申请

US20100047449A1 PROCESS FOR DEPOSITION OF NON-OXIDE CERAMIC COATINGS 失效
标题翻译：沉积非氧化物陶瓷涂料的方法
公开(公告)号：US20100047449A1
公开(公告)日：2010-02-25
申请号：US12374555
申请日：2007-07-19
申请人： Francis Maury , Aurelia Douard
发明人： Francis Maury , Aurelia Douard
IPC分类号： C23C16/32 , C23C16/34 , C23C16/36 , C23C16/448
CPC分类号： C23C16/32 , C23C16/34 , C23C16/36 , C23C16/4486
摘要： A method for depositing a non-oxide ceramic-type coating based on chrome carbides, nitrides or carbonitrides, by DLI-CVD at low temperature and atmospheric pressure on a metallic substrate, includes: a) a solution is prepared, containing a molecular compound which is a precursor of the metal to be deposited, belongs to the bis(arene) family, and has a decomposition temperature of 300° C.-550° C., the compound being dissolved in an oxygen atom depleted solvent; b) the solution is introduced as aerosol into a heated evaporator at a temperature between the solvent boiling temperature and the precursor decomposition temperature; and c) the precursor and the vaporized solvent are driven from the evaporator towards a CVD reactor having cold walls, with a susceptor carrying the substrate to be covered and heated to a temperature higher than the decomposition temperature of the precursor, to a maximum of 550° C., the evaporator and the CVD reactor being at atmospheric pressure.
摘要翻译：在金属基材上，通过DLI-CVD在低温和大气压下沉积基于铬碳化物，氮化物或碳氮化物的非氧化物陶瓷型涂层的方法包括：a）制备含有分子化合物的溶液，是属于双（芳烃）族的金属的前体，分解温度为300℃-550℃，该化合物溶解在氧原子消耗溶剂中; b）溶液在溶剂沸腾温度和前体分解温度之间的温度下作为气溶胶引入加热的蒸发器中; 和c）将前体和蒸发的溶剂从蒸发器驱动到具有冷壁的CVD反应器，其中将承载基底的基座被覆盖并加热至高于前体分解温度的温度，最大值为550 蒸发器和CVD反应器处于大气压。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式