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1. 发明授权

US07707536B2 V-shaped multilevel full-chip gridless routing 有权
标题翻译： V形多层全芯片无格栅路由
公开(公告)号：US07707536B2
公开(公告)日：2010-04-27
申请号：US11681859
申请日：2007-03-05
申请人： Shyh-Chang Lin , Tai-Chen Chen , Yao-Wen Chang , Feng-Yuan Chang
发明人： Shyh-Chang Lin , Tai-Chen Chen , Yao-Wen Chang , Feng-Yuan Chang
IPC分类号： G06F17/50
CPC分类号： G06F17/5077
摘要： A router organizes an IC area into an array of global routing cells (GRCs) and generates a congestion map providing a separate congestion factor for each GRC boundary. The router then iteratively partitions the IC area into progressively smaller tiles while selecting a route for each net passing between tiles when possible without altering any previously routed net. The router thereafter iteratively merges the tiles into progressively larger tiles while selecting a route for each previously unrouted net residing wholly within a single tile, altering routes of previously routed nets when necessary to accommodate the selected route. When selecting each route for any connection of a net, the router seeks to minimize a cost function of congestion factors of all GRC boundaries.
摘要翻译：路由器将IC区域组织成全局路由信元（GRC）阵列，并产生拥塞映射，为每个GRC边界提供单独的拥塞因子。然后路由器然后迭代地将IC区域分割成逐渐变小的瓦片，同时在可能的情况下为每个网络之间传递每个网络的路由而不改变任何先前路由的网络。然后，路由器将块逐次合并为逐渐变大的瓦片，同时为完全在单个瓦片内的每个先前未被路由的网络选择路由，在必要时改变先前路由网络的路由以适应所选择的路由。当选择网络的任何连接的每个路由时，路由器寻求最小化所有GRC边界的拥塞因素的成本函数。

2. 发明申请

US20070256045A1 V-SHAPED MULTILEVEL FULL-CHIP GRIDLESS ROUTING 有权
标题翻译： V形多路全芯片无线路由器
公开(公告)号：US20070256045A1
公开(公告)日：2007-11-01
申请号：US11681859
申请日：2007-03-05
申请人： Shyh-Chang Lin , Tai-Chen Chen , Yao-Wen Chang , Feng-Yuan Chang
发明人： Shyh-Chang Lin , Tai-Chen Chen , Yao-Wen Chang , Feng-Yuan Chang
IPC分类号： G06F17/50
CPC分类号： G06F17/5077
摘要： A router selects routes for nets interconnecting terminals of circuit devices within an area of an IC. The router organizes the IC area into an array of global routing cells (GRCs) and generates a congestion map providing a separate congestion factor for each GRC boundary that is a probabilistic measure of an estimated percentage of a capacity of the GRC boundary that will be occupied by nets when all nets have been routed. The router then iteratively partitions the IC area into progressively smaller tiles until the tiles reach a predetermined minimum size. Between partitioning iterations, the router selects a route for each net passing between tiles when possible to do so without altering any previously routed net. The router thereafter iteratively merges the tiles into progressively larger tiles. Between merging iterations, the router selects a route for each previously unrouted net residing wholly within a single tile, altering routes of previously routed nets when necessary to accommodate the selected route. When selecting a route for any connection of a net, the router seeks to minimize a cost function of congestion factors of all GRC boundaries and then modifies the congestion map to reflect changes in routing probabilities occasioned by the route selection before choosing a route for any other connection.
摘要翻译：路由器选择IC内的电路设备的互连终端的网络路由。路由器将IC区域组织成全局路由信元（GRC）阵列，并生成拥塞映射，为每个GRC边界提供单独的拥塞因子，这是对将被占用的GRC边界的容量的估计百分比的概率测量当所有的网络都被路由时，通过网络。然后路由器将IC区域迭代地分割成逐渐变小的瓦片，直到瓦片达到预定的最小尺寸。在分区迭代之间，路由器为可能的每个网络选择一个路由，以便在不改变任何先前路由的网络的情况下进行。之后路由器迭代地将瓦片合并成逐渐变大的瓦片。在合并迭代之间，路由器选择一个完全位于单个瓦片内的每个先前未被路由的网络的路由，在必要时更改先前路由网络的路由以适应所选择的路由。当选择网络的任何连接的路由时，路由器寻求将所有GRC边界的拥塞因素的成本函数最小化，然后修改拥塞映射以反映路由选择引起的路由概率的变化，然后选择任何其他路由连接。

3. 发明授权

US06582858B2 Alternating phase shifting mask 有权
标题翻译：交替相移掩模
公开(公告)号：US06582858B2
公开(公告)日：2003-06-24
申请号：US09682480
申请日：2001-09-07
申请人： Chien-Wen Lai , Chien-Ming Wang , Feng-Yuan Chang , I-Hsiung Huang
发明人： Chien-Wen Lai , Chien-Ming Wang , Feng-Yuan Chang , I-Hsiung Huang
IPC分类号： G03F900
CPC分类号： G03F1/30 , G03F1/70
摘要： The present invention provides An alternating phase shifting mask (Alt-PSM), that is to be used in a double exposure lithographic process with a light source of 248 nm. The Alt-PSM comprises: (1) a quartz substrate; (2) at least one semi-dense line on the substrate, wherein the semi-dense line is adjacent to a clear region with a width larger than 2 nm on one side and on the other side is adjacent to a dense-line pattern with a narrow pitch; (3) a first phase shifting region, which is located between the dense line pattern and the semi-dense line pattern and is adjacent to the semi-dense line; and (4) a second phase shifting region with a predetermined width, which is adjacent to the semi-dense line and located on the side opposite to the first phase shifting region; wherein the phase difference between the first phase shifting region and the second phase shifting region is 180 degree.
摘要翻译：本发明提供一种用于248nm光源的双曝光光刻工艺中的交替相移掩模（Alt-PSM）。 Alt-PSM包括：（1）石英基片; （2）衬底上的至少一条半致密线，其中半致密线与一侧的宽度大于2nm的透明区域相邻，另一侧与密集线图案相邻，狭窄的音调（3）第一相移区域，位于密集线图案和半致密线图案之间并且与半密集线相邻; 和（4）具有预定宽度的第二相移区域，其与半密度线相邻并且位于与第一相移区域相对的一侧上; 其中所述第一相移区域和所述第二相移区域之间的相位差为180度。

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