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    • 2. 发明授权
    • Thermoelectric transducing material thin film, sensor device, and its manufacturing method
    • 热电转换材料薄膜,传感器装置及其制造方法
    • US07282384B2
    • 2007-10-16
    • US10532825
    • 2003-11-11
    • Woosuck ShinFabin QiuNoriya IzuIchiro MatsubaraNorimitsu Murayama
    • Woosuck ShinFabin QiuNoriya IzuIchiro MatsubaraNorimitsu Murayama
    • H01L21/203H01L35/34
    • H01L35/22G01N27/16
    • The present invention provides an SiGe-based thin film, a method for manufacturing this thin film, and applications of this thin film. The present invention relates to a method for producing, by sputtering, an SiGe-based semiconductor thin film to serve as a member of a thermoelectric transducing material component that is a constituent element of a sensor device whose signal source is a temperature differential and that transduces a local temperature differential into an electric signal, wherein the SiGe-based thin film is produced by heat treating a SiGe-based semiconductor thin film material after sputtering vaporization; to the above-mentioned method for forming a thin film wherein the substrate temperature and/or the plasma output is raised in the formation of the SiGe-based semiconductor thin film by sputtering vaporization, to form a thin film with a more highly crystallized structure; to an SiGe-based thin film produced by the above-mentioned method, which serves as a member of a thermoelectric transducing material component that is a constituent element of a sensor device whose signal source is a temperature differential and that transduces a local temperature differential into an electric signal, and which has been endowed with good thermoelectric characteristics by heat treatment; and to a gas sensor device containing as a constituent element the above-mentioned SiGe-based thin film.
    • 本发明提供一种SiGe系薄膜,该薄膜的制造方法以及该薄膜的应用。 本发明涉及通过溅射制造SiGe系半导体薄膜,作为其信号源为温度差的传感器装置的构成元件的热电转换材料部件的部件的制造方法, 局部温差成为电信号,其中通过在溅射蒸发之后热处理SiGe基半导体薄膜材料来制造SiGe基薄膜; 涉及上述形成薄膜的方法,其中在通过溅射蒸发形成SiGe基半导体薄膜时衬底温度和/或等离子体输出升高以形成具有更高结晶结构的薄膜; 涉及通过上述方法制造的基于SiGe的薄膜,其作为热电转换材料成分的一部分,该热电转换材料成分是其信号源是温差的传感器装置的组成元件,并将局部温差转换成 电信号,通过热处理赋予了良好的热电特性; 以及包含作为构成元素的上述SiGe系薄膜的气体传感器装置。
    • 3. 发明申请
    • Thermoelectric transducing material thin film, sensor device, and its manufacturing method
    • 热电转换材料薄膜,传感器装置及其制造方法
    • US20060063291A1
    • 2006-03-23
    • US10532825
    • 2003-11-11
    • Woosuck ShinFabin QiuNoriya IzuIchiro MatsubaraNorimitsu Murayama
    • Woosuck ShinFabin QiuNoriya IzuIchiro MatsubaraNorimitsu Murayama
    • H01L21/363H01L29/12
    • H01L35/22G01N27/16
    • The present invention provides an SiGe-based thin film, a method for manufacturing this thin film, and applications of this thin film. The present invention relates to a method for producing, by sputtering, an SiGe-based semiconductor thin film to serve as a member of a thermoelectric transducing material component that is a constituent element of a sensor device whose signal source is a temperature differential and that transduces a local temperature differential into an electric signal, wherein the SiGe-based thin film is produced by heat treating a SiGe-based semiconductor thin film material after sputtering vaporization; to the above-mentioned method for forming a thin film wherein the substrate temperature and/or the plasma output is raised in the formation of the SiGe-based semiconductor thin film by sputtering vaporization, to form a thin film with a more highly crystallized structure; to an SiGe-based thin film produced by the above-mentioned method, which serves as a member of a thermoelectric transducing material component that is a constituent element of a sensor device whose signal source is a temperature differential and that transduces a local temperature differential into an electric signal, and which has been endowed with good thermoelectric characteristics by heat treatment; and to a gas sensor device containing as a constituent element the above-mentioned SiGe-based thin film.
    • 本发明提供一种SiGe系薄膜,该薄膜的制造方法以及该薄膜的应用。 本发明涉及通过溅射制造SiGe系半导体薄膜,作为其信号源为温度差的传感器装置的构成元件的热电转换材料部件的部件的制造方法, 局部温差成为电信号,其中通过在溅射蒸发之后热处理SiGe基半导体薄膜材料来制造SiGe基薄膜; 涉及上述形成薄膜的方法,其中在通过溅射蒸发形成SiGe基半导体薄膜时衬底温度和/或等离子体输出升高以形成具有更高结晶结构的薄膜; 涉及通过上述方法制造的基于SiGe的薄膜,其作为热电转换材料成分的一部分,该热电转换材料成分是其信号源是温差的传感器装置的组成元件,并将局部温度差转换成 电信号,通过热处理赋予了良好的热电特性; 以及包含作为构成元素的上述SiGe系薄膜的气体传感器装置。