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1. 发明申请

US20120001087A1 DECELERATION LENS 有权
标题翻译：减光镜
公开(公告)号：US20120001087A1
公开(公告)日：2012-01-05
申请号：US13167399
申请日：2011-06-23
申请人： Svetlana Radovanov , Jason Schaller , Richard M. White , Kevin R. Verrier , James Blanchette , Bon-Woong Koo , Eric d. Hermanson , Kevin Daniels
发明人： Svetlana Radovanov , Jason Schaller , Richard M. White , Kevin R. Verrier , James Blanchette , Bon-Woong Koo , Eric d. Hermanson , Kevin Daniels
IPC分类号： H01J3/14
CPC分类号： H01J37/12 , H01J37/3171 , H01J2237/0213 , H01J2237/032 , H01J2237/0475
摘要： A system and method are disclosed for controlling an ion beam. A deceleration lens is disclosed for use in an ion implanter. The lens may include a suppression electrode, first and second focus electrodes, and first and second shields. The shields may be positioned between upper and lower portions of the suppression electrode. The first and second shields are positioned between the first focus electrode and an end station of the ion implanter. Thus positioned, the first and second shields protect support surfaces of said first and second focus electrodes from deposition of back-streaming particles generated from said ion beam. In some embodiments, the first and second focus electrodes may be adjustable to enable the electrode surfaces to be adjusted with respect to a direction of the ion beam. By adjusting the angle of the focus electrodes, parallelism of the ion beam can be controlled. Other embodiments are described and claimed.
摘要翻译：公开了用于控制离子束的系统和方法。公开了用于离子注入机的减速透镜。透镜可以包括抑制电极，第一和第二聚焦电极以及第一和第二屏蔽。屏蔽件可以位于抑制电极的上部和下部之间。第一和第二屏蔽件位于离子注入机的第一聚焦电极和端电极之间。如此定位，第一和第二屏蔽件保护所述第一和第二聚焦电极的支撑表面不会沉积从所述离子束产生的回流颗粒。在一些实施例中，第一和第二聚焦电极可以是可调节的，以使电极表面相对于离子束的方向被调整。通过调整聚焦电极的角度，可以控制离子束的平行度。描述和要求保护其他实施例。

2. 发明授权

US07482598B2 Techniques for preventing parasitic beamlets from affecting ion implantation 有权
标题翻译：防止寄生子束影响离子注入的技术
公开(公告)号：US07482598B2
公开(公告)日：2009-01-27
申请号：US11567485
申请日：2006-12-06
申请人： Russell J. Low , Jonathan Gerald England , Stephen E. Krause , Eric D. Hermanson
发明人： Russell J. Low , Jonathan Gerald England , Stephen E. Krause , Eric D. Hermanson
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/09 , H01J37/15 , H01J37/18 , H01J37/302 , H01J37/3023 , H01J2237/0455 , H01J2237/0458 , H01J2237/1503 , H01J2237/182 , H01J2237/188 , H01J2237/30488 , H01J2237/31705 , H01L21/266
摘要： Techniques for preventing parasitic beamlets from affecting ion implantation are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for preventing parasitic beamlets from affecting ion implantation. The apparatus may comprise a controller that is configured to scan a spot beam back and forth, thereby forming an ion beam spanning a predetermined width. The apparatus may also comprise an aperture mechanism that, if kept stationary, allows the spot beam to pass through. The apparatus may further comprise a synchronization mechanism, coupled to the controller and the aperture mechanism, that is configured to cause the aperture mechanism to move in synchronization with the scanned spot beam, allowing the scanned spot beam to pass through but blocking one or more parasitic beamlets associated with the spot beam.
摘要翻译：公开了用于防止寄生子束影响离子注入的技术。在一个特定的示例性实施例中，技术可以被实现为用于防止寄生子束影响离子注入的装置。该装置可以包括配置成来回扫描点波束的控制器，从而形成横跨预定宽度的离子束。该装置还可以包括孔机构，如果保持静止，则允许点束通过。该装置还可以包括耦合到控制器和孔机构的同步机构，其被配置为使得孔径机构与扫描的点光束同步地移动，允许扫描的光束穿过但阻挡一个或多个寄生与点光束相关的子束。

3. 发明授权

US06791097B2 Adjustable conductance limiting aperture for ion implanters 有权
标题翻译：离子注入机可调电导限制孔径
公开(公告)号：US06791097B2
公开(公告)日：2004-09-14
申请号：US10050743
申请日：2002-01-16
申请人： Jay T. Scheuer , Anthony Renau , Eric D. Hermanson
发明人： Jay T. Scheuer , Anthony Renau , Eric D. Hermanson
IPC分类号： H01J3708
CPC分类号： H01J37/16 , H01J37/3171 , H01J2237/045 , H01J2237/188
摘要： A charged particle beam apparatus includes a charged particle beam source for directing a charged particle beam along a beam path in a downstream direction to a target, and a processing station that defines a target chamber. The processing station includes a chamber divider which divides the target chamber into upstream and downstream regions during charged particle beam processing of the target, the target being located in the downstream region. The divider has an aperture therethrough sized to permit passage of the ion beam to the target without substantial blockage and to limit backflow of gas into the upstream region of the chamber. The divider minimizes the beam volume which is exposed to extraneous species generated at the target and thereby reduces the probability of beam-altering collisions.
摘要翻译：带电粒子束装置包括用于将带电粒子束沿着沿着下游方向的光束路径引导到目标的带电粒子束源，以及限定目标腔室的处理站。处理站包括一个室分隔器，其在靶的带电粒子束处理期间将目标室分成上游和下游区域，目标位于下游区域。分隔器具有穿过其中的孔，其尺寸允许离子束通过靶，而不会实质阻塞，并限制气体回流到腔室的上游区域。分隔器最小化暴露于在目标处产生的外来物种的光束体积，从而降低光束变化碰撞的可能性。

4. 发明授权

US09008740B2 Techniques for protecting a superconducting (SC) tape 有权
标题翻译：保护超导（SC）胶带的技术
公开(公告)号：US09008740B2
公开(公告)日：2015-04-14
申请号：US13299131
申请日：2011-11-17
申请人： Gregory Citver , Semaan Fersan , Kasegn D. Tekletsadik , Scott Nickerson , Charles L. Stanley , Eric D. Hermanson
发明人： Gregory Citver , Semaan Fersan , Kasegn D. Tekletsadik , Scott Nickerson , Charles L. Stanley , Eric D. Hermanson
IPC分类号： H01L39/24 , H01L39/02 , H01L39/14 , H01L39/16 , H01F6/06
CPC分类号： H01L39/02 , H01F6/06 , H01L39/14 , H01L39/143 , H01L39/16 , Y10T428/1345
摘要： Techniques for protecting a superconducting (SC) article are disclosed. The techniques may be realized as an apparatus for protecting a superconducting (SC) article. The apparatus may comprise a porous sleeve configured to fit around the superconducting (SC) article. The porous sleeve may be made of non-conductive, dielectric material.
摘要翻译：公开了用于保护超导（SC）制品的技术。这些技术可以被实现为用于保护超导（SC）制品的装置。该装置可以包括被配置成围绕超导（SC）制品配置的多孔套筒。多孔套管可以由非导电的介电材料制成。

5. 发明授权

US07202483B2 Methods and apparatus for ion beam angle measurement in two dimensions 有权
标题翻译：二维离子束角度测量的方法和装置
公开(公告)号：US07202483B2
公开(公告)日：2007-04-10
申请号：US11099119
申请日：2005-04-05
申请人： Joseph C. Olson , Eric D. Hermanson , Rosario Mollica , Paul J. Murphy
发明人： Joseph C. Olson , Eric D. Hermanson , Rosario Mollica , Paul J. Murphy
IPC分类号： G01K1/08 , H01J3/14
CPC分类号： H01J37/244 , G01B15/00 , H01J2237/2446 , H01J2237/24507 , H01J2237/24528 , H01J2237/31701
摘要： An angle measurement system for an ion beam includes a flag defining first and second features, wherein the second feature has a variable spacing from the first feature, a mechanism to translate the flag along a translation path so that the flag intercepts at least a portion of the ion beam, and a sensing device to detect the ion beam for different flag positions along the translation path and produce a sensor signal having a first signal component representative of the first feature and a second signal component representative of the second feature. The first and second signal components and corresponding positions of the flag are representative of an angle of the ion beam in a direction orthogonal to the translation path. The sensing device may be a two-dimensional array of beam current sensors. The system may provide measurements of horizontal and vertical beam angles while translating the flag in only one direction.
摘要翻译：用于离子束的角度测量系统包括限定第一和第二特征的标志，其中第二特征具有与第一特征可变的间隔，沿着平移路径平移标记的机构，使得标记拦截至少一部分离子束和感测装置，用于检测沿着平移路径的不同标志位置的离子束，并产生具有代表第一特征的第一信号分量和表示第二特征的第二信号分量的传感器信号。标志的第一和第二信号分量和对应的位置代表垂直于平移路径的方向上离子束的角度。感测装置可以是束电流传感器的二维阵列。该系统可以提供水平和垂直波束角度的测量，同时仅在一个方向上翻译标志。

6. 发明授权

US07476878B2 Techniques for reducing effects of photoresist outgassing 有权
标题翻译：降低光致抗蚀剂脱气效果的技术
公开(公告)号：US07476878B2
公开(公告)日：2009-01-13
申请号：US11567522
申请日：2006-12-06
申请人： Russell J. Low , Jonathan Gerald England , Stephen E. Krause , Eric D. Hermanson
发明人： Russell J. Low , Jonathan Gerald England , Stephen E. Krause , Eric D. Hermanson
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/09 , H01J37/15 , H01J37/18 , H01J37/302 , H01J37/3023 , H01J2237/0455 , H01J2237/0458 , H01J2237/1503 , H01J2237/182 , H01J2237/188 , H01J2237/30488 , H01J2237/31705 , H01L21/266
摘要： Techniques for reducing effects of photoresist outgassing are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for reducing effects of photoresist outgassing in an ion implanter. The apparatus may comprise a drift tube located between an end-station and an upstream beamline component. The apparatus may also comprise a first variable aperture between the drift tube and the end-station. The apparatus may further comprise a second variable aperture between the drift tube and the upstream beamline component. The first variable aperture and the second variable aperture can be adjusted to facilitate differential pumping.
摘要翻译：公开了减少光阻剂除气效果的技术。在一个特定的示例性实施例中，技术可以被实现为用于减少离子注入机中的光致抗蚀剂除气的影响的装置。该装置可以包括位于终端站和上游束线组件之间的漂移管。该装置还可以包括漂移管和终端站之间的第一可变孔径。该装置还可以包括漂移管和上游束线部件之间的第二可变孔径。可以调节第一可变孔径和第二可变孔径以促进差动泵送。

7. 发明申请

US20130130913A1 Techniques for Protecting a superconducting (SC) Tape 有权
标题翻译：保护超导（SC）磁带的技术
公开(公告)号：US20130130913A1
公开(公告)日：2013-05-23
申请号：US13299131
申请日：2011-11-17
申请人： Gregory Citver , Semaan Fersan , Kasegn D. Tekletsadik , Scott Nickerson , Charles L. Stanley , Eric D. Hermanson
发明人： Gregory Citver , Semaan Fersan , Kasegn D. Tekletsadik , Scott Nickerson , Charles L. Stanley , Eric D. Hermanson
IPC分类号： H02H9/00 , H01L39/12 , B32B1/08 , H01L39/02
CPC分类号： H01L39/02 , H01F6/06 , H01L39/14 , H01L39/143 , H01L39/16 , Y10T428/1345
摘要： Techniques for protecting a superconducting (SC) article are disclosed. The techniques may be realized as an apparatus for protecting a superconducting (SC) article. The apparatus may comprise a porous sleeve configured to fit around the superconducting (SC) article. The porous sleeve may be made of non-conductive, dielectric material.
摘要翻译：公开了用于保护超导（SC）制品的技术。这些技术可以被实现为用于保护超导（SC）制品的装置。该装置可以包括被配置成围绕超导（SC）制品配置的多孔套筒。多孔套管可以由非导电的介电材料制成。

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