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    • 6. 发明申请
    • Energy harvesting buoy
    • 能量采集浮标
    • US20110031749A1
    • 2011-02-10
    • US12806124
    • 2010-08-04
    • Itzhak SapirW. Eric Boyd
    • Itzhak SapirW. Eric Boyd
    • F03B13/16H02J7/32
    • F03B13/20Y02E10/38
    • An energy-harvesting buoy is provided comprising an air-pressure generator, such as a piezo-electric generator, or any other generator that can harvest energy from an air pressure. The energy harvesting buoy consists of a first float and a second float. An air pressure is created when relative vertical motion occurs between the first float and the second float which drives an air pressurization means such as a piston driven air pump using a linkage member pivotably mounted between the respective floats. The generator uses the air pressure from the air pressurization means to drive the generator to generate electrical power.
    • 提供了一种能量收集浮标,其包括诸如压电发生器的空气压力发生器或可以从空气压力收集能量的任何其它发电机。 能量收集浮标由第一个浮子和第二个浮子组成。 当在第一浮子和第二浮子之间发生相对垂直运动时产生空气压力,该第二浮子利用可枢转地安装在各浮子之间的连杆构件来驱动空气加压装置,例如活塞驱动的空气泵。 发电机使用来自空气加压装置的空气压力来驱动发电机产生电力。
    • 10. 发明授权
    • Method for precision integrated circuit die singulation using differential etch rates
    • 使用差分蚀刻速率的精密集成电路芯片分离方法
    • US07335576B2
    • 2008-02-26
    • US11197828
    • 2005-08-05
    • Ludwig DavidJames YamaguchiStuart ClarkW. Eric Boyd
    • Ludwig DavidJames YamaguchiStuart ClarkW. Eric Boyd
    • H01L21/00
    • H01L21/78H01L21/3065H01L21/30655
    • A preprocessed semiconductor substrate such as a wafer is provided with a metal etch mask which defines singulation channels on the substrate surface. An isotropic etch process is used to define a singulation channel with a first depth extending into the semiconductor substrate material. A second anisotropic etch process is used to increase the depth of the singulation channel while providing substantially vertical singulation channel sidewalls. The singulation channel can be extended through the depth of the substrate or, in an alternative embodiment, a predetermined portion of the inactive surface of the substrate removed to expose the singulation channels. In this manner, semiconductor die can be precisely singulated from a wafer while maintaining vertical die sidewalls.
    • 诸如晶片的预处理半导体衬底设置有在衬底表面上限定单个通道的金属蚀刻掩模。 使用各向同性蚀刻工艺来限定具有延伸到半导体衬底材料中的第一深度的分离通道。 使用第二种各向异性蚀刻工艺来增加单个通道的深度,同时提供基本垂直的分割通道侧壁。 分离通道可以延伸穿过衬底的深度,或者在替代实施例中,去除衬底的非活性表面的预定部分以暴露单个通道。 以这种方式,可以在保持垂直管芯侧壁的同时从晶片精确地分离半导体管芯。