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    • 6. 发明申请
    • Preparation of a mechanically durable single layer coating with anti-reflective properties
    • 制备具有抗反射性能的机械耐久的单层涂层
    • US20090191346A1
    • 2009-07-30
    • US12318594
    • 2008-12-31
    • Jens Christoph ThiesEdwin CurrieGuido Jozefina Wilhelmus Meijers
    • Jens Christoph ThiesEdwin CurrieGuido Jozefina Wilhelmus Meijers
    • B05D3/00
    • G02B1/111G02B1/105G02B1/14Y10T428/25Y10T428/252Y10T428/31971
    • Single layer anti-reflective hard-coat; in particular which comprises a structured surface, preferably a nano-structured surface. The hard-coat preferably a hardness above 0.5 GPa, more preferably above 0.7 GPa and most preferably above 1.0 GPa as measured by nano-indentation and/or a reduced tensile modulus above 3 GPa, more preferably above 8.5 GPa or 20 GPa, most preferably above 40 GPa as measured by nano-indentation and/or a scratch resistance above 5 mJ μm−3, preferably above 15 or 30 mJ μm−3, preferably above 60 mJ μm−3 as measured by nano-indentation, and/or contains an amount of inorganic nano-particles from 5 to 75 weight %, preferably from 15 to 50 weight % relative to the weight of the second material present in the hard-coat.Preferably, the spatial length scale of the refractive index gradient in the single layer hard-coat is between 10 and 1000 nm; in particular between 100 and 200 nm.Also concerned is a process for preparing a single layer hard-coat, comprising the steps ofa) applying a mixture on a substrate, which mixture comprises i. at least a first material which does not crosslink under the conditions chosen in step b) ii. at least a second material which does crosslink under the conditions chosen in step b) iii. nano-particles, and iv. optionally at least one solvent b) inducing crosslinking in the mixture applied to the substrate, v. subsequently removing at least part of the first material, and shaped articles comprising such single layer hard-coat.
    • 单层抗反射硬涂层; 特别地,其包括结构化表面,优选纳米结构化表面。 硬涂层优选硬度高于0.5GPa,更优选高于0.7GPa,最优选高于1.0GPa,通过纳米压痕和/或降低的拉伸模量高于3GPa,更优选高于8.5GPa或20GPa,最优选 和/或通过纳米压痕测量的/或耐擦伤性高于5mJ mum-3,优选高于15或30mJ mum-3,优选高于60mJ mm-3测量的40GPa以上和/或包含 相对于存在于硬涂层中的第二材料的重量,无机纳米颗粒的量为5至75重量%,优选15至50重量%。 优选地,单层硬涂层中的折射率梯度的空间长度尺度在10和1000nm之间; 特别是在100和200nm之间。 还涉及一种制备单层硬涂层的方法,包括以下步骤:a)在基材上施加混合物,该混合物包括: 至少一种在步骤b)ii中选择的条件下不交联的第一种材料。 至少第二种材料,其在步骤b)中选择的条件下进行交联。 纳米颗粒,和iv。 任选地至少一种溶剂b)在施加到基底上的混合物中引起交联,v随后除去至少部分第一材料,以及包含这种单层硬涂层的成型制品。
    • 8. 发明授权
    • Preparation of a mechanically durable single layer coating with anti-reflective properties
    • 制备具有抗反射性能的机械耐久的单层涂层
    • US07655298B2
    • 2010-02-02
    • US10533094
    • 2003-11-04
    • Jens Christoph ThiesEdwin CurrieGuido Jozefina Wilhelmus Meijers
    • Jens Christoph ThiesEdwin CurrieGuido Jozefina Wilhelmus Meijers
    • B32B18/00B32B15/00
    • G02B1/111G02B1/105G02B1/14Y10T428/25Y10T428/252Y10T428/31971
    • Single layer anti-reflective hard-coat and methods of making same are disclosed and in particular comprise a structured surface, preferably a nano-structured surface. The hard-coat preferably a hardness above 0.5 GPa, more preferably above 0.7 GPa and most preferably above 1.0 GPa as measured by nano-indentation and/or a reduced tensile modulus above 3 GPa, more preferably above 8.5 GPa or 20 GPa, most preferably above 40 GPa as measured by nano-indentation and/or a scratch resistance above 5 mJ μm-3, preferably above 15 or 30 mJ μm-3, preferably above 60 mJ μm-3 as measured by nano-indentation, and/or contains an amount of inorganic nano-particles from 5 to 75 weight %, preferably from 15 to 50 weight % relative to the weight of the second material present in the hard-coat. Preferably, the spatial length scale of the refractive index gradient in the single layer hard-coat is between 10 and 1000 nm; in particular between 100 and 200 nm.
    • 公开了单层抗反射硬涂层及其制造方法,并且特别地包括结构化表面,优选纳米结构化表面。 硬涂层优选硬度高于0.5GPa,更优选高于0.7GPa,最优选高于1.0GPa,通过纳米压痕和/或降低的拉伸模量高于3GPa,更优选高于8.5GPa或20GPa,最优选 和/或通过纳米压痕测量的/或耐擦伤性高于5mJ mum-3,优选高于15或30mJ mum-3,优选高于60mJ mm-3测量的40GPa以上和/或包含 相对于存在于硬涂层中的第二材料的重量,无机纳米颗粒的量为5至75重量%,优选15至50重量%。 优选地,单层硬涂层中的折射率梯度的空间长度尺度在10和1000nm之间; 特别是在100和200nm之间。