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1. 发明申请

US20130048571A1 FLOCCULANT COMPOSITIONS CONTAINING SILICON-CONTAINING POLYMERS 审中-公开
标题翻译：含有硅聚合物的絮凝剂组合物
公开(公告)号：US20130048571A1
公开(公告)日：2013-02-28
申请号：US13578267
申请日：2011-02-07
申请人： Haunn-Lin Tony Chen , Douglas A. Cywar , Matthew J. Davis , Morris Lewellyn
发明人： Haunn-Lin Tony Chen , Douglas A. Cywar , Matthew J. Davis , Morris Lewellyn
IPC分类号： C08L43/04 , B01D21/01
CPC分类号： C01F7/47 , B01D21/01 , C01F7/0653 , C08J3/09 , C08J2300/108 , C08J2300/14 , C08J2333/02 , C08J2333/06 , C08J2333/26 , C08J2383/00
摘要： A flocculant composition that includes a blend of a first water-in-oil emulsion having a silicon-containing polymer in its aqueous phase and a second water-in-oil emulsion having an anionic polymer in its aqueous phase. The silicon-containing polymer and the anionic polymer are present in the composition at a weight ratio between 100:1 and 1:100.
摘要翻译：一种絮凝剂组合物，其包含在其水相中具有含硅聚合物的第一种油包水乳液和在其水相中具有阴离子聚合物的第二种油包水乳液的共混物。含硅聚合物和阴离子聚合物以100:1至1:100的重量比存在于组合物中。

2. 发明授权

US06262141B1 Process for the preparation of polymers having low residual monomer content 有权
标题翻译：制备具有低残留单体含量的聚合物的方法
公开(公告)号：US06262141B1
公开(公告)日：2001-07-17
申请号：US09413351
申请日：1999-10-06
申请人： Douglas A. Cywar , Roderick G. Ryles , Melvyn Holdsworth
发明人： Douglas A. Cywar , Roderick G. Ryles , Melvyn Holdsworth
IPC分类号： C08J328
CPC分类号： C08F6/006 , C08L33/00
摘要： Methods of preparing an acrylic polymer according to the present invention comprise the steps of: forming a gelled polymer by polymerizing a mixture containing an acrylic monomer and a photoinitiator; comminuting the gelled polymer to produce gel particles; and irradiating the gel particles with light to decompose the photoinitiator, simultaneously with, or after, the step of comminuting. The gel particles may be irradiated with UV light while they are being dried in a fluid-bed dryer.
摘要翻译：制备根据本发明的丙烯酸类聚合物的方法包括以下步骤：通过聚合含有丙烯酸单体和光引发剂的混合物形成胶凝聚合物; 粉碎凝胶聚合物以产生凝胶颗粒; 并用光照射凝胶颗粒以在粉碎步骤的同时或之后分解光引发剂。当在流化床干燥器中干燥时，可以用UV光照射凝胶颗粒。

3. 发明授权

US5460921A High density pattern template: materials and processes for the application of conductive pastes 失效
标题翻译：高密度图案模板：应用导电浆料的材料和工艺
公开(公告)号：US5460921A
公开(公告)日：1995-10-24
申请号：US118010
申请日：1993-09-08
申请人： Douglas A. Cywar , Charles R. Davis , Thomas P. Duffy , Frank D. Egitto , Paul J. Hart , Gerald W. Jones , Edward McLeskey
发明人： Douglas A. Cywar , Charles R. Davis , Thomas P. Duffy , Frank D. Egitto , Paul J. Hart , Gerald W. Jones , Edward McLeskey
IPC分类号： G03F7/00 , H05K1/09 , H05K3/00 , H05K3/10 , H05K3/12 , H05K3/40 , H05K3/46 , G03C5/00
CPC分类号： G03F7/00 , H05K3/0032 , H05K3/1258 , H05K3/4069 , H05K1/095 , H05K2201/015 , H05K2201/0209 , H05K2203/0191 , H05K2203/0568 , H05K2203/0769 , H05K2203/0783 , H05K2203/1383 , H05K3/0035 , H05K3/107 , H05K3/4664 , Y10S428/901 , Y10S430/146 , Y10T428/24917
摘要： The present invention provides a method of ablative photodecomposition and forming metal pattern which attains high resolution, is convenient, and employs non-halogenated solvents. The present invention is directed to a process for forming a metal pattern, preferably circuitization on an organic substrate, preferably on a circuit board or component thereof, which comprises coating the substrate with an ablatively-removable coating comprising a polymer resin preferably an acrylate polymer resin and preferably an ultraviolet absorber. A pattern is formed in the polymer coating corresponding to the desired metal pattern by irradiating at least a portion of the polymer coating with a sufficient amount of ultraviolet radiation to thereby ablatively remove the irradiated portion of the polymer coating. Next the patterned substrate is coated with a conductive metal paste to define the metal pattern, and the conductive metal paste is cured. The remaining polymer coating is removed by solvent stripping with non-halogenated solvents. The present invention further includes patterning electronic structures comprising multilayer circuitry using the above method. An excimer laser is used to form vias or through holes in the electronic structure while simultaneously patterning the polymer coating. This results in perfect alignment between the pattern formed in the polymer coating and the vias or through holes. High resolution circuitry is thus attainable when the electronic structure is subsequently metallized with a conductive metal paste.
摘要翻译：本发明提供了一种烧蚀光分解和形成金属图案的方法，其获得高分辨率，方便并采用非卤化溶剂。本发明涉及一种用于形成金属图案的方法，优选在有机基板上，优选在电路板或其组件上进行电路化，该方法包括用可剥离涂层涂覆基材，该涂层包含聚合物树脂，优选丙烯酸酯聚合物树脂优选紫外线吸收剂。通过用足够量的紫外线照射至少一部分聚合物涂层，形成对应于所需金属图案的聚合物涂层中的图案，从而消除聚合物涂层的照射部分。接下来，用导电金属膏涂覆图案化衬底以限定金属图案，并且导电金属膏被固化。通过用非卤化溶剂的溶剂汽提除去剩余的聚合物涂层。本发明还包括使用上述方法图案化包括多层电路的电子结构。准分子激光器用于在电子结构中形成通孔或通孔，同时构图聚合物涂层。这导致在聚合物涂层中形成的图案与通孔或通孔之间完美对准。因此，当电子结构随后用导电金属膏进行金属化时，可实现高分辨率电路。

4. 发明申请

US20160185613A1 Water-in-Oil Emulsion Compositions and Methods for Making and Using the Same 审中-公开
标题翻译：油包水乳液组合物及其制备和使用方法
公开(公告)号：US20160185613A1
公开(公告)日：2016-06-30
申请号：US13578271
申请日：2011-02-07
申请人： Haunn-Lin Tony Chen , Douglas A. Cywar , Matthew J. Davis , Morris Lewellyn
发明人： Haunn-Lin Tony Chen , Douglas A. Cywar , Matthew J. Davis , Morris Lewellyn
IPC分类号： C01F7/06 , C08F212/08 , C02F1/56 , B01F17/54
CPC分类号： C01F7/0653 , B01F17/0071 , C02F1/56 , C08F212/08
摘要： The suspended solids content of a process stream in a process for producing alumina is reduced by contacting the stream with silicon-containing polymers provided by water-in-oil compositions.
摘要翻译：通过使流与由油包水组合物提供的含硅聚合物接触，在生产氧化铝的方法中工艺流的悬浮固体含量降低。

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