会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • Photosensitive Resin Composition and Organic Insulating Film Produced Using the Same
    • 感光树脂组合物及使用其的有机绝缘膜
    • US20080145783A1
    • 2008-06-19
    • US11951671
    • 2007-12-06
    • Sang Won CHOMin Sung KIMDong Ju SHINKil Sung LEE
    • Sang Won CHOMin Sung KIMDong Ju SHINKil Sung LEE
    • G03F7/004
    • G03F7/0397
    • A photosensitive resin composition is provided. The composition includes an acrylic copolymer, a photoacid generator and a solvent. The acrylic copolymer includes structural units of Formulae 1, 2, 3 and 4, which are described in the specification. The composition exhibits excellent performance characteristics in terms of mechanical and thermal properties, transmittance, insulating properties, transparency, developability, residual film ratio, heat resistance, flatness and the like. Particularly, the use of the composition facilitates the formation of a pattern as an interlayer insulating film. The composition can also be used to produce a thick film with high transmittance. Therefore, the composition is effectively used as a material for an interlayer insulating layer in LCD fabrication processes. An organic insulating film produced using the composition is also provided.
    • 提供感光性树脂组合物。 该组合物包括丙烯酸共聚物,光酸产生剂和溶剂。 丙烯酸共聚物包括在说明书中描述的式1,2,3和4的结构单元。 该组合物在机械和热性能,透光率,绝缘性能,透明性,显影性,残留膜比,耐热性,平坦度等方面表现出优异的性能特性。 特别地,组合物的使用便于形成作为层间绝缘膜的图案。 该组合物也可用于制备具有高透射率的厚膜。 因此,该组合物有效地用作LCD制造工艺中的层间绝缘层的材料。 还提供了使用该组合物制备的有机绝缘膜。