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1. 发明授权

US09329491B2 Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus 有权
标题翻译：调整台面移动平面图和光刻设备的速度和/或路线的方法
公开(公告)号：US09329491B2
公开(公告)日：2016-05-03
申请号：US13168177
申请日：2011-06-24
申请人： Cédric Désiré Grouwstra , Nicolaas Rudolf Kemper , Norbertus Josephus Martinus Van Den Nieuwelaar , Dirk De Vries , Hua Li , Marinus Jochemsen
发明人： Cédric Désiré Grouwstra , Nicolaas Rudolf Kemper , Norbertus Josephus Martinus Van Den Nieuwelaar , Dirk De Vries , Hua Li , Marinus Jochemsen
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70775 , G03F7/70341 , G03F7/70725
摘要： A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.
摘要翻译：一种在光刻设备的浸没液体供应系统下调整桌子的运动计划的一部分的速度和/或路线的方法。该方法包括将表的运动计划分成多个离散运动; 确定存在于浸没流体中的尺寸大于一定尺寸的气泡的风险，通过该浸入流体中的光刻设备的图案化束将在特定离散运动期间通过该气泡通过确定浸没流体供应系统是否经过浸没的位置存在从浸没液体供应系统泄漏的液体; 以及调整所述运动计划的一部分的速度和/或路线，其对应于（i）比确定气泡风险的离散运动更早的离散运动，和/或（ii）离散运动，确定泡沫的风险。

2. 发明授权

US08394572B2 Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus 有权
公开(公告)号：US08394572B2
公开(公告)日：2013-03-12
申请号：US13361645
申请日：2012-01-30
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
IPC分类号： G03F7/00 , G03F7/004 , G03F7/11
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.

3. 发明申请

US20120129098A1 METHOD OF PREPARING A SUBSTRATE FOR LITHOGRAPHY, A SUBSTRATE, A DEVICE MANUFACTURING METHOD, A SEALING COATING APPLICATOR AND A SEALING COATING MEASUREMENT APPARATUS 有权
标题翻译：制备用于基体的基板的方法，基板，器件制造方法，密封涂层施加器和密封涂层测量装置
公开(公告)号：US20120129098A1
公开(公告)日：2012-05-24
申请号：US13361645
申请日：2012-01-30
申请人： Marcus Theodoor Wilhelmus VAN DER HEIJDEN , Marco Koert STAVENGA , Patrick WONG , Frederik Johannes VAN DEN BOGAARD , Dirk DE VRIES , David BESSEMS , Jacques Roger, Alice MYCKE
发明人： Marcus Theodoor Wilhelmus VAN DER HEIJDEN , Marco Koert STAVENGA , Patrick WONG , Frederik Johannes VAN DEN BOGAARD , Dirk DE VRIES , David BESSEMS , Jacques Roger, Alice MYCKE
IPC分类号： G03F7/20 , G03F7/027 , G03F7/075 , G03F7/004
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
摘要翻译：用于光刻投影装置的基板。衬底包括密封涂层，其覆盖衬底上的两层之间或层与衬底之间的第一界面的至少一部分，并且不延伸到衬底的中心部分。

4. 发明授权

US08114568B2 Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus 有权
标题翻译：光刻用基板的制造方法，基板，装置的制造方法，密封涂布装置以及密封涂布测定装置
公开(公告)号：US08114568B2
公开(公告)日：2012-02-14
申请号：US12289919
申请日：2008-11-06
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
IPC分类号： G03F7/00 , G03F7/004 , G03F7/11
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
摘要翻译：用于光刻投影装置的基板。衬底包括密封涂层，其覆盖衬底上的两层之间或层与衬底之间的第一界面的至少一部分，并且不延伸到衬底的中心部分。

5. 发明申请

US20090201485A1 Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus 有权
标题翻译：光刻用基板的制造方法，基板，装置的制造方法，密封涂布装置以及密封涂布测定装置
公开(公告)号：US20090201485A1
公开(公告)日：2009-08-13
申请号：US12289919
申请日：2008-11-06
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
IPC分类号： G03B27/32 , B05D1/36 , G03F7/004 , B05C11/00 , B05C5/00
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
摘要翻译：用于光刻投影装置的基板。衬底包括密封涂层，其覆盖衬底上的两层之间或层与衬底之间的第一界面的至少一部分，并且不延伸到衬底的中心部分。

6. 发明申请

US20090170041A1 Immersion lithography 失效
标题翻译：浸没光刻
公开(公告)号：US20090170041A1
公开(公告)日：2009-07-02
申请号：US12318033
申请日：2008-12-19
申请人： Dirk De Vries , Richard Moerman , Cedric Desire Grouwstra , Michel Franciscus Johannes Van Rooy
发明人： Dirk De Vries , Richard Moerman , Cedric Desire Grouwstra , Michel Franciscus Johannes Van Rooy
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/70608
摘要： A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with a dose which is sufficient for the radiation sensitive material to be substantially removed during subsequent development of the radiation sensitive material if the radiation sensitive material is a positive radiation sensitive material, or with a dose which is sufficient for the radiation sensitive material to be substantially insoluble during subsequent development of the radiation sensitive material if the radiation sensitive material is a negative radiation sensitive material. The method further includes developing the radiation sensitive material and obtaining information at least indicative of the topography of radiation sensitive material remaining on the substrate after the radiation sensitive material has been developed in order to obtain information related to the defect.
摘要翻译：公开了一种使用浸没式光刻法获得与涂覆有辐射敏感材料层的基板的照射中存在的缺陷有关的信息的方法。该方法包括用未图案化的辐射束照射辐射敏感材料的区域，如果辐射敏感材料的辐射敏感材料的后续显影期间，该辐射敏感材料的辐射敏感材料的辐射敏感材料的辐照敏感材料的辐射敏感材料的辐射敏感材料材料是正的辐射敏感材料，或者如果辐射敏感材料是负辐射敏感材料，则辐射敏感材料在辐射敏感材料的后续显影期间足以使辐射敏感材料基本上不溶的剂量。该方法还包括开发辐射敏感材料并获得至少指示辐射敏感材料已被开发之后剩余在基底上的辐射敏感材料的形貌的信息，以获得与该缺陷有关的信息。

7. 发明授权

US4301759A Control system, particularly for use on ships 失效
标题翻译：控制系统，特别适用于船舶
公开(公告)号：US4301759A
公开(公告)日：1981-11-24
申请号：US4560
申请日：1979-01-18
申请人： Dirk de Vries
发明人： Dirk de Vries
IPC分类号： B63H21/21 , B63H21/22 , G05D3/12 , G05D3/14 , B63H25/52 , G05G11/00
CPC分类号： B63H21/22 , G05D3/12 , G05D3/14 , Y10T74/20232
摘要： Control system, including a plurality of control members electrically coupled with one another and with a device to be controlled, particularly for controlling a ship's equipment, wherein each control member is provided with a potentiometer for generating electrical control signals, and each control member can be coupled with a follow-up member, the control member and the follow-up member being connected to a differential amplifier determining a signal which is characteristic of a difference in position of each control member and each follow-up member and forming control signals for the follow-up members, the follow-up members preferably being formed by a setting motor and a potentiometer coupled with the same.
摘要翻译：控制系统，包括彼此电耦合并具有要控制的装置的多个控制构件，特别是用于控制船舶设备，其中每个控制构件设置有用于产生电气控制信号的电位器，并且每个控制构件可以是与跟随构件连接，控制构件和跟随构件连接到差分放大器，该差分放大器确定作为每个控制构件和每个后续构件的位置差的特征的信号，并且形成用于后续构件，优选地由设置电动机和与其连接的电位器形成后续构件。

8. 发明申请

US20120003381A1 METHOD OF ADJUSTING SPEED AND/OR ROUTING OF A TABLE MOVEMENT PLAN AND A LITHOGRAPHIC APPARATUS 有权
标题翻译：调整表格运动计划和地图设备的速度和/或路由的方法
公开(公告)号：US20120003381A1
公开(公告)日：2012-01-05
申请号：US13168177
申请日：2011-06-24
申请人： Cédric Désiré GROUWSTRA , Nicolaas Rudolf Kemper , Norbertus Josephus Martinus Van Den Nieuwelaar , Dirk De Vries , Hua Li , Marinus Jochemsen
发明人： Cédric Désiré GROUWSTRA , Nicolaas Rudolf Kemper , Norbertus Josephus Martinus Van Den Nieuwelaar , Dirk De Vries , Hua Li , Marinus Jochemsen
IPC分类号： C23C16/52 , B05C11/00 , B01J19/12
CPC分类号： G03F7/70775 , G03F7/70341 , G03F7/70725
摘要： A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.
摘要翻译：一种在光刻设备的浸没液体供应系统下调整桌子的运动计划的一部分的速度和/或路线的方法。该方法包括将表的运动计划分成多个离散运动; 确定存在于浸没流体中的尺寸大于一定尺寸的气泡的风险，通过该浸入流体中的光刻设备的图案化束将在特定离散运动期间通过该气泡通过确定浸没流体供应系统是否经过浸没的位置存在从浸没液体供应系统泄漏的液体; 以及调整所述运动计划的一部分的速度和/或路线，其对应于（i）比确定气泡风险的离散运动更早的离散运动，和/或（ii）离散运动，确定泡沫的风险。

9. 发明授权

US08129097B2 Immersion lithography 失效
标题翻译：浸没光刻
公开(公告)号：US08129097B2
公开(公告)日：2012-03-06
申请号：US12318033
申请日：2008-12-19
申请人： Dirk De Vries , Richard Moerman , Cédric Désiré Grouwstra , Michel Franciscus Johannes Van Rooy
发明人： Dirk De Vries , Richard Moerman , Cédric Désiré Grouwstra , Michel Franciscus Johannes Van Rooy
IPC分类号： G03F7/26
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/70608
摘要： A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with a dose which is sufficient for the radiation sensitive material to be substantially removed during subsequent development of the radiation sensitive material if the radiation sensitive material is a positive radiation sensitive material, or with a dose which is sufficient for the radiation sensitive material to be substantially insoluble during subsequent development of the radiation sensitive material if the radiation sensitive material is a negative radiation sensitive material. The method further includes developing the radiation sensitive material and obtaining information at least indicative of the topography of radiation sensitive material remaining on the substrate after the radiation sensitive material has been developed in order to obtain information related to the defect.
摘要翻译：公开了一种使用浸没式光刻法获得与涂覆有辐射敏感材料层的基板的照射中存在的缺陷有关的信息的方法。该方法包括用未图案化的辐射束照射辐射敏感材料的区域，如果辐射敏感材料的辐射敏感材料的后续显影期间，该辐射敏感材料的辐射敏感材料的辐射敏感材料的辐照敏感材料的辐射敏感材料的辐照敏感材料材料是正的辐射敏感材料，或者如果辐射敏感材料是负辐射敏感材料，则辐射敏感材料在辐射敏感材料的后续显影期间足以使辐射敏感材料基本上不溶的剂量。该方法还包括开发辐射敏感材料并获得至少指示辐射敏感材料已被开发之后剩余在基底上的辐射敏感材料的形貌的信息，以获得与该缺陷有关的信息。

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