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1. 发明授权

US06845287B2 Method, system, and computer program product for improved trajectory planning and execution 失效
标题翻译：方法，系统和计算机程序产品，用于改进轨迹规划和执行
公开(公告)号：US06845287B2
公开(公告)日：2005-01-18
申请号：US10299855
申请日：2002-11-20
申请人： Daniel Galburt , Todd Bednarek
发明人： Daniel Galburt , Todd Bednarek
IPC分类号： H01L21/027 , G03F7/20 , G06F19/00
CPC分类号： G03F7/70725
摘要： A method, system, and computer program product for non-real-time trajectory planning and real-time trajectory execution. A trajectory planning process receives data generated by high-level control software. This data defines positions and scan velocities, where multiple axis motion must be precisely synchronized. The trajectory planning process creates sequences of constant acceleration intervals that allow critical motions to be executed at maximum throughput. The output of a trajectory planning process is known as a profile. A profile executor, using the profile output by the trajectory planner process, generates continuous, synchronized, filtered, multi-axis position and acceleration commands (i.e., execution data) that drive control servos. Time intervals generated by the trajectory planner are quantized to be integer multiples of a real time clock period. The trajectory planner outputs have infinite jerk, but are smoothed by filters in the profile executor to both limit jerk and minimize servo-tracking errors. The trajectory planner allows time for the profile executor filters, but does not restrict fine tuning of the shape of these filters, provided that the width of the tuned filter does not exceed the allowed time.
摘要翻译：一种用于非实时轨迹规划和实时轨迹执行的方法，系统和计算机程序产品。轨迹规划过程接收由高级控制软件产生的数据。该数据定义了位置和扫描速度，其中多轴运动必须精确同步。轨迹规划过程创建恒定加速度间隔序列，允许以最大吞吐量执行关键运动。轨迹规划过程的输出被称为轮廓。使用轨迹计划程序输出的轮廓执行器生成连续，同步，过滤的多轴位置和加速命令（即，执行数据），驱动控制伺服。由轨迹计划器产生的时间间隔被量化为实时时钟周期的整数倍。轨迹计划器输出具有无限跳动，但通过轮廓执行器中的过滤器进行平滑，既可以限制加加速度，也可减少伺服跟踪误差。轨迹计划器允许轮廓执行器过滤器的时间，但不限制这些过滤器的形状的微调，只要调谐过滤器的宽度不超过允许的时间。

2. 发明授权

US06781674B1 System and method to increase throughput in a dual substrate stage double exposure lithography system 有权
标题翻译：在双衬底双曝光光刻系统中提高生产量的系统和方法
公开(公告)号：US06781674B1
公开(公告)日：2004-08-24
申请号：US10447200
申请日：2003-05-29
申请人： Daniel Galburt , Jos de Klerk
发明人： Daniel Galburt , Jos de Klerk
IPC分类号： G03B2732
CPC分类号： G03F7/70533 , G03B27/32 , G03F7/70733 , G03F9/7003
摘要： A lithography system and method are used to increase throughput using multiple reticles to pattern multiple substrates that are positioned with respect to one another according to a predetermined sequence. For example, during a first exposure period a first reticle patterns a first set of substrates, during a second exposure period a second reticle patterns a second set of substrates, during a third exposure period the first reticle patterns a third set of substrates, etc., until all desired substrates are patterned. It is to be appreciate that after the first and second reticles are complete, third and fourth reticles can pattern the first, second, third, etc. sets of substrates.
摘要翻译：使用光刻系统和方法来增加使用多个掩模版的产量，以根据预定的顺序对相对于彼此定位的多个基板进行图案化。例如，在第一曝光期间，第一掩模版图案化第一组基板，在第二曝光期间，第二掩模版图案化第二组基板，在第三曝光期间，第一掩模版图案第三组基板等。，直到所有期望的基底被图案化为止。应当理解，在第一和第二掩模版完成之后，第三和第四掩模版可以对第一，第二，第三等离子体基板进行图案化。

3. 发明授权

US4506204A Electro-magnetic apparatus 失效
标题翻译：电磁装置
公开(公告)号：US4506204A
公开(公告)日：1985-03-19
申请号：US502993
申请日：1983-06-10
申请人： Daniel Galburt
发明人： Daniel Galburt
IPC分类号： H01L21/30 , G03F7/20 , G03F9/00 , G05D3/00 , H01F7/06 , H01L21/027 , H01L21/68 , H02K41/035 , G05B1/06
CPC分类号： G03F7/70758 , H01F7/066 , H02K41/0356 , H02K2201/18
摘要： This invention is directed to electro-magnetic alignment apparatus, which is particularly adapted, among many other possible uses, for use in aligning the wafers in a microlithography system, said apparatus including in combination at least three magnet assemblies which are mounted in space relationship one with respect to the others, at least three coil assemblies mounted to pass through the high flux region of the magnet assemblies respectively, the width of the coil assemblies being substantially less than the width of the high flux regions respectively, a controller for controlling the flow of current through the coil assemblies respectively, a structural assembly for connecting the coil assemblies which is movable with respect to the magnet assemblies, the coil assemblies being wound with respect to each other so that by controlling the supply of current to the coils the structure assembly can be moved selectively in three degrees of freedom.
摘要翻译：本发明涉及电磁对准装置，其特别适用于许多其他可能的用途，用于在微光刻系统中对准晶片，所述装置包括至少三个以空间关系安装的磁体组件至少三个线圈组件安装成分别穿过磁体组件的高通量区域，线圈组件的宽度分别基本上小于高通量区域的宽度，用于控制流量的控制器电流通过线圈组件，用于连接可相对于磁体组件移动的线圈组件的结构组件，线圈组件相对于彼此缠绕，从而通过控制向线圈的电流供应，结构组件可以选择性地以三个自由度移动。

4. 发明申请

US20070035714A1 Lithographic apparatus and device manufacturing method utilizing a metrology system 有权
标题翻译：利用测量系统的平版印刷设备和设备制造方法
公开(公告)号：US20070035714A1
公开(公告)日：2007-02-15
申请号：US11201162
申请日：2005-08-11
申请人： Daniel Galburt
发明人： Daniel Galburt
IPC分类号： G03B27/62
CPC分类号： G03F9/7003 , G03F9/7034 , G03F9/7088
摘要： A system and method include an object supported on a moveable support, an optical system that transmits radiation onto the object, a support having an aperture therethrough, a sensor system coupled to the support, and a control system coupled to the sensor system and the moveable support. The sensor system is arranged with respect to the aperture to measure a surface of the object and send measurement signals to the control system, such that the control system generates control signals received and used by the moveable support to ensure that the surface of the object receiving light transmitted by the optical system through the aperture is in a focus plane of the optical system.
摘要翻译：系统和方法包括支撑在可移动支撑件上的物体，将辐射透射到物体上的光学系统，具有穿过其中的孔的支撑件，耦合到支撑件的传感器系统以及耦合到传感器系统的控制系统和可移动的支持。传感器系统相对于孔布置以测量物体的表面并将测量信号发送到控制系统，使得控制系统产生由可移动支撑件接收和使用的控制信号，以确保物体的表面接收由光学系统通过孔传播的光在光学系统的聚焦平面内。

5. 发明申请

US20060123888A1 Method and system for operating an air gauge at programmable or constant standoff 有权
标题翻译：用于在可编程或恒定间距下操作气压计的方法和系统
公开(公告)号：US20060123888A1
公开(公告)日：2006-06-15
申请号：US11011435
申请日：2004-12-15
申请人： Daniel Galburt , Boguslaw Gajdeczko
发明人： Daniel Galburt , Boguslaw Gajdeczko
IPC分类号： G01B13/08
CPC分类号： G03F7/70775 , G01B13/02 , G03F9/7023 , G03F9/7057 , G03F9/7088
摘要： Provided are a method and system for measuring a distance to an object. The system includes an air gauge configured to sense a distance to a surface of the object and a sensor configured to measure at least one from the group including (i) a relative position of the air gauge and (ii) a relative position of the surface of the object. Outputs of the air gauge and the sensor are combined to produce a combined air gauge reading.
摘要翻译：提供了一种用于测量到物体的距离的方法和系统。该系统包括配置成感测到物体的表面的距离的空气计和被配置为测量来自该组中的至少一个的传感器，该传感器包括（i）空气计的相对位置和（ii）表面的相对位置的对象。气压表和传感器的输出相结合，产生一个组合的气压表读数。

6. 发明申请

US20050231707A1 Removable reticle window and support frame using magnetic force 失效
标题翻译：可移动的分划板窗和支撑架采用磁力
公开(公告)号：US20050231707A1
公开(公告)日：2005-10-20
申请号：US11166392
申请日：2005-06-27
申请人： Daniel Galburt
发明人： Daniel Galburt
IPC分类号： G03F1/64 , G03F7/20 , H01L21/027 , G03F9/00
CPC分类号： G03F1/64 , G03F7/70983
摘要： An apparatus for maintaining an optical gap between a pellicle and a reticle in a photolithography system includes a frame defining first and second opposing surfaces, a reticle mated to the first opposing surface using magnetic coupling and a pellicle mated to the second opposing surface using magnetic coupling.
摘要翻译：用于在光刻系统中保持防护薄膜组件和掩模版之间的光学间隙的装置包括限定第一和第二相对表面的框架，使用磁耦合与第一相对表面配合的掩模版，以及使用磁耦合与第二相对表面配合的防护薄膜。

7. 发明申请

US20050103967A1 Flexure-supported split reaction mass 失效
标题翻译：弯曲支撑的分裂反应块
公开(公告)号：US20050103967A1
公开(公告)日：2005-05-19
申请号：US10713055
申请日：2003-11-17
申请人： Daniel Galburt , Mark Williams
发明人： Daniel Galburt , Mark Williams
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68 , B65D19/00
CPC分类号： G03F7/70766
摘要： An apparatus for stabilizing a scanning system during lithographic processing comprises a baseframe, a reaction mass, and a pair of flexures connecting the reaction mass to the baseframe. The apparatus also comprises a second reaction mass and a second pair of flexures, placed in parallel to the first to form a split reaction mass system. The apparatus is configured such that, upon acceleration of a stage movably coupled to the reaction masses, a resulting load is split substantially evenly between the first and second reaction masses. Also upon acceleration of the stage, the first reaction mass rotates in the opposite direction of the second reaction mass, resulting in a net moment reaction on the baseframe of approximately zero.
摘要翻译：用于在光刻处理期间稳定扫描系统的装置包括基架，反作用块和将反作用块连接到基架的一对挠曲件。该装置还包括与第一反应物质平行的第二反应物质和第二对弯曲物，以形成分裂反应物质体系。该装置被构造成使得在可移动地联接到反作用块的载物台加速时，所得载荷在第一和第二反作用块之间基本上均匀分离。此外，在加速阶段时，第一反应物质沿第二反应物质的相反方向旋转，导致基架上的净力矩反应大约为零。

8. 发明授权

US06853440B1 Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination 有权
标题翻译：由于Z偏移和非垂直照明，屏幕对象偏移的Y位置校正
公开(公告)号：US06853440B1
公开(公告)日：2005-02-08
申请号：US10406602
申请日：2003-04-04
申请人： Engelbertus Antonius Fransiscus Van De Pasch , Marcel Hendrikus Maria Beems , Hendricus J. M. Meijer , Daniel Galburt , Erik Roelof Loopstra
发明人： Engelbertus Antonius Fransiscus Van De Pasch , Marcel Hendrikus Maria Beems , Hendricus J. M. Meijer , Daniel Galburt , Erik Roelof Loopstra
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G03B27/58 , G03B27/62 , G03B27/68
CPC分类号： G03F7/70775 , G03F7/70233 , G03F7/70283 , G03F7/70725 , G03F9/7003 , G03F9/7034
摘要： In a reflective lithographic projection apparatus, shifts in the image of a pattern of a mask in the scanning direction caused by variations in the position of the pattern surface of the mask along the optical axis are corrected by shifting of the relative position of the mask and/or the substrate in the scanning direction. Correction of the image rotation error may also be accomplished by rotation of the relative positions of the mask and/or the substrate about the optical axis. Variations in the position of the pattern surface of the mask along the optical axis may be determined by interferometers upon installation of the mask to the lithographic projection apparatus. The variations may be mapped and stored to provide control of the lithographic projection apparatus.
摘要翻译：在反射式平版印刷投影装置中，通过掩模的相对位置的移动来校正沿着光轴沿掩模的图案表面的位置变化引起的扫描方向上的掩模图案的偏移， /或基板在扫描方向上。图像旋转误差的校正也可以通过围绕光轴旋转掩模和/或基底的相对位置来实现。沿着光轴的掩模的图案表面的位置的变化可以在将掩模安装到光刻投影设备时由干涉仪确定。可以映射和存储变化以提供光刻投影设备的控制。

9. 发明授权

US07389155B2 Method and system for improved trajectory planning and execution 失效
标题翻译：改进轨迹规划和执行的方法和系统
公开(公告)号：US07389155B2
公开(公告)日：2008-06-17
申请号：US11002429
申请日：2004-12-03
申请人： Daniel Galburt , Todd Bednarek
发明人： Daniel Galburt , Todd Bednarek
IPC分类号： G06F19/00
CPC分类号： G03F7/70725
摘要： A trajectory planning process receives data generated by high-level control software. This data defines positions and scan velocities. The trajectory planning process creates sequences of constant acceleration intervals that allow critical motions to be executed at maximum throughput. The trajectory planning process outputs a profile. A profile executor, using the profile output by the trajectory planner process, generates continuous synchronized, filtered, multi-axis position and acceleration commands that drive control servos. Time intervals generated by the trajectory planner are quantized to be integer multiples of a real time clock period. The trajectory planner outputs have infinite jerk, but are smoothed by filters in the profile executor to both limit jerk and minimize servo-tracking errors. The trajectory planner allows time for the profile executor filters, but does not restrict fine tuning of the shape of these filters, provided that the width of the tuned filter does not exceed the allowed time.
摘要翻译：轨迹规划过程接收由高级控制软件产生的数据。该数据定义位置和扫描速度。轨迹规划过程创建恒定加速度间隔序列，允许以最大吞吐量执行关键运动。轨迹规划过程输出轮廓。轮廓执行器使用轨迹计划程序输出的轮廓生成连续的同步，过滤的多轴位置和加速度命令来驱动控制伺服。由轨迹计划器产生的时间间隔被量化为实时时钟周期的整数倍。轨迹计划器输出具有无限跳动，但通过轮廓执行器中的过滤器进行平滑，既可以限制加加速度，也可减少伺服跟踪误差。轨迹计划器允许轮廓执行器过滤器的时间，但不限制这些过滤器的形状的微调，只要调谐过滤器的宽度不超过允许的时间。

10. 发明申请

US20050268698A1 High-resolution gas gauge proximity sensor 失效
标题翻译：高分辨率气表接近传感器
公开(公告)号：US20050268698A1
公开(公告)日：2005-12-08
申请号：US11198278
申请日：2005-08-08
申请人： Boguslaw Gajdeczko , Kenneth Bogursky , Daniel Galburt , Willy Sander , Kevin Violette
发明人： Boguslaw Gajdeczko , Kenneth Bogursky , Daniel Galburt , Willy Sander , Kevin Violette
IPC分类号： G01F1/00 , G01B13/12 , G03F7/20 , G05D7/01 , H01L21/027 , G01F23/00
CPC分类号： G03F7/709 , G01B13/12 , G03F7/70341 , G03F7/7085 , G05D7/0186
摘要： An apparatus and method for precisely detecting very small distances between a measurement probe and a surface, and more particularly to a proximity sensor using a constant gas flow and sensing a mass flow rate within a pneumatic bridge to detect very small distances. Within the apparatus the use of a flow restrictor and/or snubber made of porous material and/or a mass flow rate controller enables detection of very small distances in the nanometer to sub-nanometer range. A further embodiment wherein a measurement channel of a proximity sensor is connected to multiple measurement branches.
摘要翻译：一种用于精确检测测量探头和表面之间非常小距离的装置和方法，更具体地涉及使用恒定气流并感测气动桥中的质量流量以检测非常小的距离的接近传感器。在该装置内，使用由多孔材料制成的限流器和/或缓冲器和/或质量流量控制器使得能够在纳米至亚纳米范围内检测非常小的距离。另一实施例，其中接近传感器的测量通道连接到多个测量分支。

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