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    • 2. 发明授权
    • Avalanche photodiode with edge breakdown suppression
    • 具有边缘击穿抑制的雪崩光电二极管
    • US07834379B2
    • 2010-11-16
    • US12173189
    • 2008-07-15
    • Zhong PanDavid VenablesCraig Ciesla
    • Zhong PanDavid VenablesCraig Ciesla
    • H01L31/18
    • H01L31/1075H01L21/2258H01L31/1035H01L31/184Y02E10/544
    • The invention relates to an avalanche photodiode having enhanced gain uniformity enabled by a tailored diffused p-n junction profile. The tailoring is achieved by a two stage doping process incorporating a solid source diffusion in combination with conventional gas source diffusion. The solid source diffusion material is selected for its solubility to the dopant compared to the solubility of the multiplication layer to dopant. The solid source has a diameter between the first and second diffusion windows. Thus, there are three distinct diffusion regions during the second diffusion. The dopant in the multiplication layer at the edge region, the dopant from the solid source material with a relatively higher dopant concentration (limited by the solubility of the dopant in the solid source material) at the intermediate region, and the central region exposed to an infinite diffusion source from the solid source material as it is continually charged with new dopant from the external gas source. The result is that both the dopant concentration and the diffusion depth decrease gradually from the center to the edge of the device. This tailored diffusion profile enables control of the electric field distribution such that edge breakdown is suppressed.
    • 本发明涉及一种雪崩光电二极管,其具有通过定制的扩散p-n结分布实现的增强的增益均匀性。 通过结合常规气源扩散的固体源扩散的两阶段掺杂工艺来实现定制。 与增殖层对掺杂剂的溶解度相比,选择固体源扩散材料对于掺杂剂的溶解度。 固体源具有在第一和第二扩散窗口之间的直径。 因此,在第二次扩散期间存在三个不同的扩散区域。 在边缘区域的乘法层中的掺杂剂,来自固体源材料的掺杂剂在中间区域具有相对较高的掺杂剂浓度(受掺杂剂在固体源材料中的溶解度的限制)和暴露于 来自固体源材料的无限扩散源,因为它从外部气体源连续地带有新的掺杂剂。 结果是掺杂剂浓度和扩散深度从器件的中心到边缘逐渐减小。 这种定制的扩散分布使得能够控制电场分布,从而抑制边缘击穿。
    • 3. 发明授权
    • Front-illuminated avalanche photodiode
    • 前照明雪崩光电二极管
    • US07795064B2
    • 2010-09-14
    • US12260688
    • 2008-10-29
    • Zhong PanCraig Ciesla
    • Zhong PanCraig Ciesla
    • H01L21/00
    • H01L31/107H01L31/18
    • The present invention provides a front-illuminated avalanche photodiode (APD) with improved intrinsic responsivity, as well as a method of fabricating such a front-illuminated APD. The front-illuminated APD comprises an APD body of semiconductor material, which includes a substrate and a layer stack disposed on a front surface of the substrate. The layer stack includes an absorption layer, a multiplication layer, and a field-control layer. Advantageously, a back surface of the APD body is mechanically and chemically polished, and a reflector having a reflectance of greater than 90% at the absorption wavelength band is disposed on the back surface of the APD body. Thus, incident light that is not absorbed in a first pass through the absorption layer is reflected by the reflector for a second pass through the absorption layer, increasing the intrinsic responsivity of the front-illuminated APD.
    • 本发明提供了具有改进的本征响应性的前照明雪崩光电二极管(APD),以及制造这种前照明APD的方法。 前照明APD包括半导体材料的APD体,其包括衬底和设置在衬底的前表面上的层堆叠。 层叠包括吸收层,倍增层和场控制层。 有利地,APD主体的后表面被机械和化学抛光,并且在吸收波长带处具有大于90%的反射率的反射器设置在APD体的背面上。 因此,通过吸收层的第一次通过中没有被吸收的入射光被反射器反射,用于通过吸收层的第二次通过,增加了前照明APD的固有响应性。
    • 5. 发明申请
    • Avalanche Photodiode With Edge Breakdown Suppression
    • 具有边缘破坏抑制的雪崩光电二极管
    • US20090020782A1
    • 2009-01-22
    • US12173189
    • 2008-07-15
    • Zhong PanDavid VenablesCraig Ciesla
    • Zhong PanDavid VenablesCraig Ciesla
    • H01L31/0336H01L31/18
    • H01L31/1075H01L21/2258H01L31/1035H01L31/184Y02E10/544
    • The invention relates to an avalanche photodiode having enhanced gain uniformity enabled by a tailored diffused p-n junction profile. The tailoring is achieved by a two stage doping process incorporating a solid source diffusion in combination with conventional gas source diffusion. The solid source diffusion material is selected for its solubility to the dopant compared to the solubility of the multiplication layer to dopant. The solid source has a diameter between the first and second diffusion windows. Thus, there are three distinct diffusion regions during the second diffusion. The dopant in the multiplication layer at the edge region, the dopant from the solid source material with a relatively higher dopant concentration (limited by the solubility of the dopant in the solid source material) at the intermediate region, and the central region exposed to an infinite diffusion source from the solid source material as it is continually charged with new dopant from the external gas source. The result is that both the dopant concentration and the diffusion depth decrease gradually from the center to the edge of the device. This tailored diffusion profile enables control of the electric field distribution such that edge breakdown is suppressed.
    • 本发明涉及一种雪崩光电二极管,其具有通过定制的扩散p-n结分布实现的增强的增益均匀性。 通过结合常规气源扩散的固体源扩散的两阶段掺杂工艺来实现定制。 与增殖层对掺杂剂的溶解度相比,选择固体源扩散材料对于掺杂剂的溶解度。 固体源具有在第一和第二扩散窗口之间的直径。 因此,在第二次扩散期间存在三个不同的扩散区域。 在边缘区域的乘法层中的掺杂剂,来自固体源材料的掺杂剂在中间区域具有相对较高的掺杂剂浓度(受掺杂剂在固体源材料中的溶解度的限制)和暴露于 来自固体源材料的无限扩散源,因为它从外部气体源连续地带有新的掺杂剂。 结果是掺杂剂浓度和扩散深度从器件的中心到边缘逐渐减小。 这种定制的扩散分布使得能够控制电场分布,从而抑制边缘击穿。
    • 8. 发明申请
    • Front-Illuminated Avalanche Photodiode
    • 前照明雪崩光电二极管
    • US20090121305A1
    • 2009-05-14
    • US12260688
    • 2008-10-29
    • Zhong PanCraig Ciesla
    • Zhong PanCraig Ciesla
    • H01L31/107H01L31/18
    • H01L31/107H01L31/18
    • The present invention provides a front-illuminated avalanche photodiode (APD) with improved intrinsic responsivity, as well as a method of fabricating such a front-illuminated APD. The front-illuminated APD comprises an APD body of semiconductor material, which includes a substrate and a layer stack disposed on a front surface of the substrate. The layer stack includes an absorption layer, a multiplication layer, and a field-control layer. Advantageously, a back surface of the APD body is mechanically and chemically polished, and a reflector having a reflectance of greater than 90% at the absorption wavelength band is disposed on the back surface of the APD body. Thus, incident light that is not absorbed in a first pass through the absorption layer is reflected by the reflector for a second pass through the absorption layer, increasing the intrinsic responsivity of the front-illuminated APD.
    • 本发明提供了具有改进的本征响应性的前照明雪崩光电二极管(APD),以及制造这种前照明APD的方法。 前照明APD包括半导体材料的APD体,其包括衬底和设置在衬底的前表面上的层堆叠。 层叠包括吸收层,倍增层和场控制层。 有利地,APD主体的后表面被机械和化学抛光,并且在吸收波长带处具有大于90%的反射率的反射器设置在APD体的背面上。 因此,通过吸收层的第一次通过中没有被吸收的入射光被反射器反射,用于通过吸收层的第二次通过,增加了前照明APD的固有响应性。