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1. 发明授权

US07223157B2 Chemical-mechanical polishing apparatus and method of conditioning polishing pad 有权
标题翻译：化学机械抛光装置和调理抛光垫的方法
公开(公告)号：US07223157B2
公开(公告)日：2007-05-29
申请号：US11162120
申请日：2005-08-30
申请人： Sheng-Yu Chen , Te-Sung Hung , Chung-Jun Cheng , Chi-Piao Cheng , Po-Yuan Cheng
发明人： Sheng-Yu Chen , Te-Sung Hung , Chung-Jun Cheng , Chi-Piao Cheng , Po-Yuan Cheng
IPC分类号： B24B5/00
CPC分类号： B24B53/017 , B24B37/12 , B24B57/02
摘要： A chemical-mechanical polishing apparatus comprising at least a polishing platen, a polishing pad, a slurry supplying piping, a polishing pad conditioner, a chemical reagent supplying piping and a splitting piping is provided. The polishing platen has a plurality of slurry outlets disposed thereon and the polishing pad is disposed on the polishing platen. The slurry supplying piping is connected to the bottom of the polishing platen for delivering slurry to the surface of the polishing pad through the slurry outlets. The polishing pad conditioner is disposed over the polishing pad. The chemical reagent supplying piping is connected to the polishing pad conditioner for supplying the chemical reagent to the polishing conditioner. The splitting piping is connected between the slurry supplying piping and the chemical reagent supplying piping for providing chemical reagent to the surface of the polishing pad through the slurry supplying piping and the slurry outlets.
摘要翻译：一种化学机械抛光装置，其至少包括抛光台板，抛光垫，浆料供应管道，抛光垫调节剂，化学试剂供应管道和分裂管道。研磨台具有设置在其上的多个浆料出口，抛光垫设置在研磨台板上。浆料供应管道连接到研磨台板的底部，用于通过浆料出口将浆料输送到抛光垫的表面。抛光垫调节器设置在抛光垫上。化学试剂供给配管连接到抛光垫调节器，用于将化学试剂供给到抛光调理器。分流管道通过浆料供给管道和浆料出口连接在浆料供应管道和化学试剂供应管线之间，用于将化学试剂提供到抛光垫的表面。

2. 发明申请

US20070062451A1 STABILIZING SYSTEM FOR FILM DEPOSITION 审中-公开
标题翻译：薄膜沉积稳定系统
公开(公告)号：US20070062451A1
公开(公告)日：2007-03-22
申请号：US11162692
申请日：2005-09-20
申请人： Wen-Cheng Hsu , Kuo-Chin Hung , Chin-Ming Hsu , Hor-Ta Chaung , Chung-Jun Cheng
发明人： Wen-Cheng Hsu , Kuo-Chin Hung , Chin-Ming Hsu , Hor-Ta Chaung , Chung-Jun Cheng
IPC分类号： C23C16/00
CPC分类号： H01J37/32183 , H01J37/32082
摘要： A stabilizing system for a plasma process is provided. The system has a high frequency power source, a plasma chamber, a control circuit for outputting a control signal, first switch element and an impedance matching network. The first switch element has a first, a second and a first switch control terminals, wherein the first and the first switch control terminals are coupled to the control circuit to determines whether the first and the second terminals element are connected or not according to the control signal. The impedance matching network has a first terminal coupled to the plasma chamber, a second terminal coupled to the high frequency power source and a matching control terminal coupled to the second terminal of the first switch element. In this way, whether an impedance matching auto-tune operation for the high frequency power is performed or not is determined based on the control signal.
摘要翻译：提供了一种用于等离子体工艺的稳定系统。该系统具有高频电源，等离子体室，用于输出控制信号的控制电路，第一开关元件和阻抗匹配网络。第一开关元件具有第一开关控制端子和第一开关控制端子，其中第一开关控制端子和第一开关控制端子耦合到控制电路，以根据控制来确定第一和第二端子元件是否连接信号。阻抗匹配网络具有耦合到等离子体室的第一端子，耦合到高频电源的第二端子和耦合到第一开关元件的第二端子的匹配控制端子。以这种方式，基于控制信号确定是否执行用于高频功率的阻抗匹配自动调谐操作。

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