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    • 1. 发明授权
    • Apparatuses and methods for nondestructive microwave measurement of dry and wet film thickness
    • 干膜和湿膜无损微波测量的设备和方法
    • US07339382B1
    • 2008-03-04
    • US11271461
    • 2005-11-10
    • Alan V. BrayClaude H. GarrettChristian J. Corley
    • Alan V. BrayClaude H. GarrettChristian J. Corley
    • G01R27/32
    • G01B15/02
    • Wet and dry film thickness can be measured non-invasively on structures, such as surfaces associated with vessels, aircraft and buildings, using calibrated microwave sensors. The film is measured by directing microwave energy toward the film. The microwave energy passes through the film and is reflected by a reflective or semi-reflective substrate surface below the film. Properties of the reflected wave are compared with properties of reflected waves that were passed through calibration samples of known thicknesses to determine the unknown thickness of the film. In some embodiments, one or more sensors are maintained at a fixed altitude above the conductive/semi-conductive substrate for measurement, and in other embodiments, one or more sensors are maintained at a fixed altitude above the film. In one embodiment, sensors are associated with a coating applicator, with a first sensor preceding the applicator and a second sensor following the applicator to measure the thickness of the film applied by the applicator by comparing measurements before and after coating.
    • 使用校准的微波传感器可以非结构地测量湿和干膜厚度,例如与船只,飞机和建筑物相关的表面等结构上。 通过将微波能量引向胶片来测量胶片。 微波能量通过膜并被膜下面的反射或半反射的衬底表面反射。 将反射波的性质与通过已知厚度的校准样品的反射波的性质进行比较,以确定膜的未知厚度。 在一些实施例中,一个或多个传感器被保持在用于测量的导电/半导体衬底上方的固定高度处,并且在其他实施例中,一个或多个传感器保持在胶片上方的固定高度。 在一个实施例中,传感器与涂布器相关联,第一传感器位于施用器之前,第二传感器跟随施加器,以通过比较涂覆之前和之后的测量来测量施用器施加的膜的厚度。
    • 2. 发明申请
    • APPARATUSES AND METHODS FOR NONDESTRUCTIVE MICROWAVE MEASUREMENT OF DRY AND WET FILM THICKNESS
    • 干燥和湿膜厚度非结构微波测量的装置和方法
    • US20090066344A1
    • 2009-03-12
    • US12041470
    • 2008-03-03
    • Alan V. BrayClaude H. GarrettChristian J. Corley
    • Alan V. BrayClaude H. GarrettChristian J. Corley
    • G01R27/00
    • G01B15/02
    • Wet and dry film thickness can be measured non-invasively on structures, such as surfaces associated with vessels, aircraft and buildings, using calibrated microwave sensors. The film is measured by directing microwave energy toward the film. The microwave energy passes through the film and is reflected by a reflective or semi-reflective substrate surface below the film. Properties of the reflected wave are compared with properties of reflected waves that were passed through calibration samples of known thicknesses to determine the unknown thickness of the film. In some embodiments, one or more sensors are maintained at a fixed altitude above the conductive/semi-conductive substrate for measurement, and in other embodiments, one or more sensors are maintained at a fixed altitude above the film. In one embodiment, sensors are associated with a coating applicator, with a first sensor preceding the applicator and a second sensor following the applicator to measure the thickness of the film applied by the applicator by comparing measurements before and after coating.
    • 使用校准的微波传感器可以非结构地测量湿和干膜厚度,例如与船只,飞机和建筑物相关的表面等结构上。 通过将微波能量引向胶片来测量胶片。 微波能量通过膜并被膜下面的反射或半反射的衬底表面反射。 将反射波的性质与通过已知厚度的校准样品的反射波的性质进行比较,以确定膜的未知厚度。 在一些实施例中,一个或多个传感器被保持在用于测量的导电/半导体衬底上方的固定高度处,并且在其他实施例中,一个或多个传感器保持在胶片上方的固定高度。 在一个实施例中,传感器与涂布器相关联,第一传感器位于施用器之前,第二传感器跟随施加器,以通过比较涂覆之前和之后的测量来测量施用器施加的膜的厚度。
    • 3. 发明授权
    • Apparatuses and methods for nondestructive microwave measurement of dry and wet film thickness
    • 干膜和湿膜无损微波测量的设备和方法
    • US07705610B2
    • 2010-04-27
    • US12041470
    • 2008-03-03
    • Alan V. BrayClaude H. GarrettChristian J. Corley
    • Alan V. BrayClaude H. GarrettChristian J. Corley
    • G01R27/04G01R27/32
    • G01B15/02
    • Wet and dry film thickness can be measured non-invasively on structures, such as surfaces associated with vessels, aircraft and buildings, using calibrated microwave sensors. The film is measured by directing microwave energy toward the film. The microwave energy passes through the film and is reflected by a reflective or semi-reflective substrate surface below the film. Properties of the reflected wave are compared with properties of reflected waves that were passed through calibration samples of known thicknesses to determine the unknown thickness of the film. In some embodiments, one or more sensors are maintained at a fixed altitude above the conductive/semi-conductive substrate for measurement, and in other embodiments, one or more sensors are maintained at a fixed altitude above the film. In one embodiment, sensors are associated with a coating applicator, with a first sensor preceding the applicator and a second sensor following the applicator to measure the thickness of the film applied by the applicator by comparing measurements before and after coating.
    • 使用校准的微波传感器可以非结构地测量湿和干膜厚度,例如与船只,飞机和建筑物相关的表面等结构上。 通过将微波能量引向胶片来测量胶片。 微波能量通过膜并被膜下面的反射或半反射的衬底表面反射。 将反射波的性质与通过已知厚度的校准样品的反射波的性质进行比较,以确定膜的未知厚度。 在一些实施例中,一个或多个传感器被保持在用于测量的导电/半导体衬底上方的固定高度处,并且在其他实施例中,一个或多个传感器保持在胶片上方的固定高度。 在一个实施例中,传感器与涂布器相关联,第一传感器位于施用器之前,第二传感器跟随施加器,以通过比较涂覆之前和之后的测量来测量施用器施加的膜的厚度。