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1. 发明申请

US20060083027A1 Double side backlight module 审中-公开
标题翻译：双面背光模组
公开(公告)号：US20060083027A1
公开(公告)日：2006-04-20
申请号：US10967804
申请日：2004-10-19
申请人： Te-Neng Lin , Chin-Yung Liu
发明人： Te-Neng Lin , Chin-Yung Liu
IPC分类号： F21V7/04
CPC分类号： G02F1/133615 , G02F2001/133342
摘要： A double side backlight module comprising: a backlight module installed between a first display screen and a second display screen. The backlight module having the following elements; a least one light source; a light guiding plate having one lateral side adjacent to the at least one light source; the light guiding plate having at one pattern surface near the first display screen or the second display screen; at least one first light-enhancing sheet installed between light guiding plate and the first display screen and at least one light-enhancing sheet between the light guiding plate and the second display screen. Between the light guiding plate and the first display screen or second display screen can be installed with at least one lower diffusion sheet.
摘要翻译：一种双面背光模组，包括：安装在第一显示屏和第二显示屏之间的背光模块。该背光模块具有以下元件; 至少一个光源; 导光板，其具有与所述至少一个光源相邻的一个侧面; 所述导光板在第一显示屏或所述第二显示屏附近具有一个图案表面; 安装在导光板和第一显示屏之间的至少一个第一光增强片和在导光板和第二显示屏之间的至少一个光增强片。在导光板和第一显示屏或第二显示屏之间可以安装至少一个下扩散片。

2. 发明申请

US20070181420A1 WAFER STAGE HAVING AN ENCAPSULATED CENTRAL PEDESTAL PLATE 审中-公开
标题翻译：具有封闭式中央平板的波浪段
公开(公告)号：US20070181420A1
公开(公告)日：2007-08-09
申请号：US11307428
申请日：2006-02-07
申请人： Ming-Tung Wang , Sheng-Yuan Chen , Chin-Yung Liu , Peng-Yih Peng , Shang-Kuang Wu , Wen-Kun Lo , Fu-Yi Lai , Cheng-Bang Fan , Jeng-Hung Lue , Chien-Chih Ho
发明人： Ming-Tung Wang , Sheng-Yuan Chen , Chin-Yung Liu , Peng-Yih Peng , Shang-Kuang Wu , Wen-Kun Lo , Fu-Yi Lai , Cheng-Bang Fan , Jeng-Hung Lue , Chien-Chih Ho
IPC分类号： C23C14/00
CPC分类号： H01L21/68757 , H01L21/68785
摘要： A wafer stage includes a bottom insulator plate secured on a bottom portion of the processing chamber; a central pedestal plate mounted on the bottom insulator plate; and a removable top insulator cover having a chamber fittingly accommodating the central pedestal plate and the bottom insulator plate, wherein the top insulator cover has a flat top surface on which a wafer is placed.
摘要翻译：晶片台包括固定在处理室底部的底绝缘板; 安装在底部绝缘板上的中央基板; 以及可移除的顶部绝缘体盖，其具有适合地容纳中心基座板和底部绝缘体板的腔室，其中顶部绝缘体盖具有平坦的顶表面，晶片被放置在该平坦的顶表面上。

3. 发明申请

US20070066187A1 Chemical mechanical polishing device including a polishing pad and cleaning method thereof and method for planarization 审中-公开
标题翻译：包括抛光垫的化学机械抛光装置及其清洁方法以及用于平坦化的方法
公开(公告)号：US20070066187A1
公开(公告)日：2007-03-22
申请号：US11233564
申请日：2005-09-22
申请人： Chih-Chiang Yang , Peng-Yih Peng , Chin-Yung Liu , Chien-Fu Chu , Wen-Shan Lin , Chia-Yuan Hsieh
发明人： Chih-Chiang Yang , Peng-Yih Peng , Chin-Yung Liu , Chien-Fu Chu , Wen-Shan Lin , Chia-Yuan Hsieh
IPC分类号： B24B7/30 , B24B1/00 , B24B29/00 , B24B21/18
CPC分类号： B24B53/017 , H01L21/31053 , H01L21/3212
摘要： A chemical mechanical polishing device used to polish a wafer according to the present invention includes a polishing table, a polishing pad, a slurry supply device, a wafer carrier and a high-pressure liquid cleaning device. The polishing pad is disposed on the polishing table to polish the wafer. The slurry supply device is disposed on the polishing table to supply the slurry. In addition, the wafer carrier is disposed the polishing table to carry the wafer in such a manner that the wafer is brought into contact with the polishing pad. Besides, the high-pressure cleaning device is disposed on the polishing table to remove the impurities on the polishing pad by high-pressure liquid.
摘要翻译：根据本发明的用于抛光晶片的化学机械抛光装置包括抛光台，抛光垫，浆料供应装置，晶片载体和高压液体清洗装置。抛光垫设置在抛光台上以抛光晶片。浆料供给装置设置在抛光台上以供应浆料。此外，晶片载体设置在抛光台上以使得晶片与抛光垫接触的方式承载晶片。此外，高压清洗装置设置在抛光台上，以通过高压液体除去抛光垫上的杂质。

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