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1. 发明授权

US4036167A Apparatus for monitoring vacuum deposition processes 失效
标题翻译：用于监测真空沉积工艺的设备
公开(公告)号：US4036167A
公开(公告)日：1977-07-19
申请号：US653936
申请日：1976-01-30
申请人： Chih-shun Lu
发明人： Chih-shun Lu
IPC分类号： C23C14/54 , C23C13/08
CPC分类号： C23C14/548 , C23C14/544
摘要： Apparatus is disclosed for utilizing a low energy electron beam to permit monitoring the rate of deposition and composition of the evaporant particles in a vacuum deposition system. This is accomplished by passing a sample of the evaporant employed in the vacuum deposition process through an enclosure defining a flow path for the evaporant sample which crosses the path of a relatively low energy electron beam which is sufficient to excite the electrons of the atoms constituting the vaporized particles in the deposition chamber. The outer-shell electrons of the atoms constituting the evaporant, after excitation, drop back to a lower energy state in the course of which photons are released which are characteristic of given materials. The enclosure is formed with an optical opening receiving the photons in a path orthogonal with respect to the excitation beam and evaporant sample path, and a photodetector is optically coupled to the opening for sensing the emitted photons. A filter or monochromator is used to select a specific emission line. The resulting electrical signal produced by the photodetector is employed either to provide a readout of the signal detected and/or to actuate control circuitry regulating the operation of the vapor deposition equipment.
摘要翻译：公开了利用低能电子束来允许监测真空沉积系统中沉积速率和蒸发颗粒组成的装置。这是通过将真空沉积工艺中使用的蒸发器的样品通过限定用于蒸发器样品的流动路径的外壳来实现的，该蒸发器样品穿过相对低能量的电子束的路径，其足以激发构成在沉积室中蒸发的颗粒。构成蒸发器的原子的外壳电子在激发后，在释放光子的过程中回到较低能量状态，这是给定材料的特征。外壳形成有一个光学开口，该光学开口在相对于激发光束和蒸发器采样路径正交的路径中接收光子，并且光电检测器光耦合到开口以感测所发射的光子。滤波器或单色仪用于选择特定的发射线。所产生的由光电检测器产生的电信号用于提供所检测信号的读出和/或致动控制气相沉积设备操作的控制电路。

2. 发明申请

US20090095616A1 APPARATUS AND METHOD FOR MEASURING VAPOR FLUX DENSITY 有权
标题翻译：用于测量蒸气密度的装置和方法
公开(公告)号：US20090095616A1
公开(公告)日：2009-04-16
申请号：US11871708
申请日：2007-10-12
申请人： Chih-shun Lu
发明人： Chih-shun Lu
IPC分类号： C23C14/52 , C23C14/34
CPC分类号： C23C14/544 , G01J3/443
摘要： A two-chamber electron impact emission sensor effective for monitoring vapor flux of materials in the presence of interfering species is described. The sensor includes two independent electron excitation regions and one photodetector for monitoring emission from excited species from both chambers. Copper vapor flux from an evaporation source was accurately measured in the presence of interfering H2O vapor, and Ga vapor flux from an evaporation source was accurately monitored in the presence of interfering CO2 gas. The invention permits deposition rates to be monitored using electron-impact emission spectroscopy with significantly improved accuracy in the presence of interfering gases at high partial pressures.
摘要翻译：描述了在干扰物质存在下有效监测材料的蒸气通量的双室电子撞击发射传感器。传感器包括两个独立的电子激发区域和一个光电检测器，用于监测来自两个腔室的激发物质的发射。在干扰的H 2 O蒸气的存在下，来自蒸发源的铜蒸汽通量被精确地测量，并且在干扰的CO 2气体的存在下，来自蒸发源的Ga蒸气通量被精确地监测。本发明允许使用电子轰击发射光谱监测沉积速率，并且在高分压下在干扰气体存在下具有显着提高的精度。

3. 发明授权

US07719681B2 Apparatus and method for measuring vapor flux density 有权
标题翻译：用于测量蒸气通量密度的装置和方法
公开(公告)号：US07719681B2
公开(公告)日：2010-05-18
申请号：US11871708
申请日：2007-10-12
申请人： Chih-shun Lu
发明人： Chih-shun Lu
IPC分类号： G01J3/28
CPC分类号： C23C14/544 , G01J3/443
摘要： A two-chamber electron impact emission sensor effective for monitoring vapor flux of materials in the presence of interfering species is described. The sensor includes two independent electron excitation regions and one photodetector for monitoring emission from excited species from both chambers. Copper vapor flux from an evaporation source was accurately measured in the presence of interfering H2O vapor, and Ga vapor flux from an evaporation source was accurately monitored in the presence of interfering CO2 gas. The invention permits deposition rates to be monitored using electron-impact emission spectroscopy with significantly improved accuracy in the presence of interfering gases at high partial pressures.
摘要翻译：描述了在干扰物质存在下有效监测材料的蒸气通量的双室电子撞击发射传感器。传感器包括两个独立的电子激发区域和一个光电检测器，用于监测来自两个腔室的激发物质的发射。在干扰的H 2 O蒸气的存在下，来自蒸发源的铜蒸汽通量被精确地测量，并且在干扰的CO 2气体的存在下，来自蒸发源的Ga蒸气通量被精确地监测。本发明允许使用电子轰击发射光谱监测沉积速率，并且在高分压下在干扰气体存在下具有显着提高的精度。

4. 发明授权

US5880823A Method and apparatus for measuring atomic vapor density in deposition systems 失效
标题翻译：用于测量沉积系统中原子蒸气密度的方法和装置
公开(公告)号：US5880823A
公开(公告)日：1999-03-09
申请号：US258243
申请日：1994-06-10
申请人： Chih-Shun Lu
发明人： Chih-Shun Lu
IPC分类号： G01J3/28 , G01J3/42 , G01N21/31
CPC分类号： G01J3/42 , G01N21/3103 , G01J2003/2866
摘要： A device that eliminates the baseline instability of Atomic Absorption Spectroscopy monitors by utilizing a dual-source, dual-beam optical configuration. The source of one beam, the measuring beam, is light emission from a hollow cathode lamp which is used to determine the atomic vapor density by conventional atomic absorption principles. The second source, the calibration beam, is an emission which has negligible absorption by the atomic vapor, and passes through the same optical path as the measuring beam. For each light source, one beam passes through the processing chamber before its intensity is analyzed. The intensity of a second beam is determined near the light source to provide a reference signal for ratio measurement. Using conventional signal processing, the atomic vapor density, and thus the deposition rate, can be precisely determined despite changes in light source intensity, window transmission and optical alignment.
摘要翻译：通过利用双光源双光束光学配置消除原子吸收光谱监测器的基线不稳定性的装置。一束光源，即测量光束，是用于通过常规原子吸收原理确定原子蒸汽密度的空心阴极灯的发光。第二个源，校准光束，是原子蒸汽吸收可忽略的，并通过与测量光束相同的光路的发射。对于每个光源，在分析其强度之前，一束光通过处理室。在光源附近确定第二光束的强度，以提供用于比率测量的参考信号。使用常规的信号处理，尽管光源强度，窗口传输和光学对准的变化，也可以精确地确定原子蒸气密度以及因此的沉积速率。

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