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1. 发明授权

US5248585A Polyphosphazene binder resins for photoresists comprising as photosensitizers o-quinone diazide esters 失效
标题翻译：多晶磷酸酯树脂，用于光合作用的光催化剂O-QUINONE DIAZIDE ESTERS
公开(公告)号：US5248585A
公开(公告)日：1993-09-28
申请号：US810634
申请日：1991-12-18
申请人： Thomas J. Lynch , Dana L. Durham , Chester Sobodacha
发明人： Thomas J. Lynch , Dana L. Durham , Chester Sobodacha
IPC分类号： C08G79/02 , G03F7/023
CPC分类号： C08G79/025 , G03F7/0233 , Y10S430/106
摘要： This invention relates to novel radiation sensitive compositions. More particularly the invention relates to photoresists containing phosphorus and nitrogen linked polymers; i.e., polyphosphazenes, useful in the preparation of a relief pattern on a substrate; e.g., a silicon wafer or aluminum plate. The polyphosphazenes of in this invention can be synthesized by the condensation of N-trimethylsilylalkoxyphosphorimides. Radiation sensitive positive photoresist compositions of the invention can be developed in aqueous base developer or organic solvent developer The base developer dissolution properties of the composition can be controlled by incorporating carboxylate groups into the polyphosphazene. The polyphosphazenes utilized in this invention have good solubility properties in various organic solvents and also have good mechanical, electrical, adhesion and thermal properties.
摘要翻译：本发明涉及新型的辐射敏感组合物。更具体地说，本发明涉及含有磷和氮的聚合物的光刻胶; 即聚磷腈，可用于在底物上制备浮雕图案; 例如硅晶片或铝板。本发明中的聚磷腈可以通过N-三甲基甲硅烷氧基氧磷酰亚胺的缩合来合成。本发明的辐射敏感正性光致抗蚀剂组合物可以在含水基础显影剂或有机溶剂显影剂中显影。组合物的基底显影剂溶解性能可以通过将羧酸酯基团掺入到聚磷腈中来控制。本发明中使用的聚磷腈在各种有机溶剂中具有良好的溶解性，并且还具有良好的机械，电学，粘合性和热性能。

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