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1. 外观设计

USD332483S Swivel nipple 失效
公开(公告)号：USD332483S
公开(公告)日：1993-01-12
申请号：US418481
申请日：1989-10-10
申请人： Chen-Yung Lin
设计人： Chen-Yung Lin

2. 发明申请

US20130066580A1 AUTOMATIC MEASURING METHOD AND APPARATUS FOR MEASURING CONNECTING LINES 审中-公开
标题翻译：自动测量方法和测量连接线的装置
公开(公告)号：US20130066580A1
公开(公告)日：2013-03-14
申请号：US13301770
申请日：2011-11-21
申请人： CHANG-YI CHEN , Shih-Tung Lin , Chen-Yung Lin
发明人： CHANG-YI CHEN , Shih-Tung Lin , Chen-Yung Lin
IPC分类号： G01R31/28
CPC分类号： H04B3/46 , G01R31/021
摘要： An automatic measuring method for measuring connecting lines includes the steps of: S1, loading setting parameters and measuring regulations corresponding to the connecting lines into an automatic measuring apparatus; S2, receiving triggering signals to start measuring; and S3, automatically controlling measuring signals according to the setting parameters to measure multiple pairs of leads of the connecting lines one by one, and then determining whether the quality of the connecting lines is in compliance with standard regulations or not. Besides, an automatic measuring apparatus corresponding to the method is provided as well. The automatic measuring method and the apparatus are suitable for meeting the requirements of product measuring in mass production due to short time and high efficiency.
摘要翻译：一种用于测量连接线的自动测量方法包括以下步骤：S1，将设置参数和对应于连接线的测量规则加载到自动测量装置中; S2，接收触发信号开始测量; 和S3，根据设置参数自动控制测量信号，逐个测量连接线的多对引线，然后确定连接线的质量是否符合标准规定。此外，还提供了与该方法对应的自动测量装置。自动测量方法和设备适合于满足大量生产中产品测量时间短，效率高的要求。

3. 发明申请

US20050197730A1 System and method for process contamination prevention for semiconductor manufacturing 有权
标题翻译：用于半导体制造的工艺污染防止系统和方法
公开(公告)号：US20050197730A1
公开(公告)日：2005-09-08
申请号：US10791930
申请日：2004-03-03
申请人： Chih-Wei Hsu , Span Lu , Kuang-Huan Hsu , Chen-Yung Lin , Shui-Tien Lin , Chun-Hung Lin
发明人： Chih-Wei Hsu , Span Lu , Kuang-Huan Hsu , Chen-Yung Lin , Shui-Tien Lin , Chun-Hung Lin
IPC分类号： G06F17/50 , G06F19/00 , H01L21/00
CPC分类号： G05B19/41875 , Y02P90/22
摘要： Provided are a system and method for preventing contamination in a semiconductor manufacturing environment. The method includes comparing one or more attributes associated with a product, such as a substrate, with one or more attributes associated with an operation. If the comparison indicates that the product is not compatible with the operation, then the operation is suspended with respect to the product. If the comparison indicates that the product is compatible with the operation, then the operation is performed on the product.
摘要翻译：提供一种用于防止半导体制造环境中的污染的系统和方法。该方法包括将与产品（例如底物）相关联的一个或多个属性与与操作相关联的一个或多个属性进行比较。如果比较表明该产品与该操作不兼容，则该操作将相对于该产品暂停。如果比较表示产品与操作兼容，则对产品执行操作。

4. 发明授权

US07035705B2 System and method for process contamination prevention for semiconductor manufacturing 有权
标题翻译：用于半导体制造的工艺污染防止系统和方法
公开(公告)号：US07035705B2
公开(公告)日：2006-04-25
申请号：US10791930
申请日：2004-03-03
申请人： Chih-Wei Hsu , Span Lu , Kuang-Huan Hsu , Chen-Yung Lin , Shui-Tien Lin , Chun-Hung Lin
发明人： Chih-Wei Hsu , Span Lu , Kuang-Huan Hsu , Chen-Yung Lin , Shui-Tien Lin , Chun-Hung Lin
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , Y02P90/22
摘要： Provided are a system and method for preventing contamination in a semiconductor manufacturing environment. The method includes comparing one or more attributes associated with a product, such as a substrate, with one or more attributes associated with an operation. If the comparison indicates that the product is not compatible with the operation, then the operation is suspended with respect to the product. If the comparison indicates that the product is compatible with the operation, then the operation is performed on the product.
摘要翻译：提供一种用于防止半导体制造环境中的污染的系统和方法。该方法包括将与产品（例如底物）相关联的一个或多个属性与与操作相关联的一个或多个属性进行比较。如果比较表明该产品与该操作不兼容，则该操作将相对于该产品暂停。如果比较表示产品与操作兼容，则对产品执行操作。

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