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1. 发明申请

US20100044837A1 REPLICATION AND TRANSFER OF MICROSTRUCTURES AND NANOSTRUCTURES 有权
标题翻译：微结构和纳米结构的复制和转移
公开(公告)号：US20100044837A1
公开(公告)日：2010-02-25
申请号：US11848669
申请日：2007-08-31
申请人： Charles Daniel Schaper
发明人： Charles Daniel Schaper
IPC分类号： H01L29/02 , H01L21/30
CPC分类号： B81C1/0046 , B29C33/52 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/091 , Y10S438/942
摘要： A method for the duplication of microscopic patterns from a master to a substrate is disclosed, in which a replica of a topographic structure on a master is formed and transferred when needed onto a receiving substrate using one of a variety of printing or imprint techniques, and then dissolved. Additional processing steps can also be carried out using the replica before transfer, including the formation of nanostructures, microdevices, or portions thereof. These structures are then also transferred onto the substrate when the replica is transferred, and remain on the substrate when the replica is dissolved. This is a technique that can be applied as a complementary process or a replacement for various lithographic processing steps in the fabrication of integrated circuits and other microdevices.
摘要翻译：公开了一种用于从主机到基板的微观图案的复制的方法，其中主体上的形貌结构的复制品在需要时被形成并且使用各种印刷或印记技术之一转印到接收基板上，以及然后溶解。另外的处理步骤也可以在转移之前使用复制品进行，包括形成纳米结构，微器件或其部分。当复制品被转移时，这些结构也被转移到基底上，当复制品溶解时，这些结构保留在基底上。这是一种技术，可用作互补过程或替代集成电路和其他微型器件制造中的各种光刻处理步骤。

2. 发明授权

US07125639B2 Molecular transfer lithography 有权
公开(公告)号：US07125639B2
公开(公告)日：2006-10-24
申请号：US09898521
申请日：2001-07-03
申请人： Charles Daniel Schaper
发明人： Charles Daniel Schaper
IPC分类号： G03C3/00 , G03C11/12
CPC分类号： G03F7/0012 , G03F7/26 , G03F7/38
摘要： A method for the fabrication of patterned devices, in which a latent image is initially formed in a photosensitive material on a carrier, and the exposed material containing the latent image is physically transferred to a substrate before processing. Physical transfer is enhanced by the appropriate selection of coating surface properties and additional coating layers, and by processing steps, such as heating and UV exposure, to promote adhesion to the substrate and detachment from the carrier.

3. 发明授权

US07345002B2 Replication and transfer of microstructures and nanostructures 有权
标题翻译：微结构和纳米结构的复制和转移
公开(公告)号：US07345002B2
公开(公告)日：2008-03-18
申请号：US10974302
申请日：2004-10-27
申请人： Charles Daniel Schaper
发明人： Charles Daniel Schaper
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： B81C1/0046 , B29C33/52 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/091 , Y10S438/942
摘要： A method for the duplication of microscopic patterns from a master to a substrate is disclosed, in which a replica of a topographic structure on a master is formed and transferred when needed onto a receiving substrate using one of a variety of printing or imprint techniques, and then dissolved. Additional processing steps can also be carried out using the replica before transfer, including the formation of nanostructures, microdevices, or portions thereof. These structures are then also transferred onto the substrate when the replica is transferred, and remain on the substrate when the replica is dissolved. This is a technique that can be applied as a complementary process or a replacement for various lithographic processing steps in the fabrication of integrated circuits and other microdevices.
摘要翻译：公开了一种用于从主机到基板的微观图案的复制的方法，其中主体上的形貌结构的复制品在需要时被形成并且使用各种印刷或印记技术之一转印到接收基板上，以及然后溶解。另外的处理步骤也可以在转移之前使用复制品进行，包括形成纳米结构，微器件或其部分。当复制品被转移时，这些结构也被转移到基底上，当复制品溶解时，这些结构保留在基底上。这是一种技术，可用作互补过程或替代集成电路和其他微型器件制造中的各种光刻处理步骤。

4. 发明授权

US07981814B2 Replication and transfer of microstructures and nanostructures 有权
标题翻译：微结构和纳米结构的复制和转移
公开(公告)号：US07981814B2
公开(公告)日：2011-07-19
申请号：US11848669
申请日：2007-08-31
申请人： Charles Daniel Schaper
发明人： Charles Daniel Schaper
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： B81C1/0046 , B29C33/52 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/091 , Y10S438/942
摘要： A method for the duplication of microscopic patterns from a master to a substrate is disclosed, in which a replica of a topographic structure on a master is formed and transferred when needed onto a receiving substrate using one of a variety of printing or imprint techniques, and then dissolved. Additional processing steps can also be carried out using the replica before transfer, including the formation of nanostructures, microdevices, or portions thereof. These structures are then also transferred onto the substrate when the replica is transferred, and remain on the substrate when the replica is dissolved. This is a technique that can be applied as a complementary process or a replacement for various lithographic processing steps in the fabrication of integrated circuits and other microdevices.
摘要翻译：公开了一种用于从主机到基板的微观图案的复制的方法，其中主体上的形貌结构的复制品在需要时被形成并且使用各种印刷或印记技术之一转印到接收基板上，以及然后溶解。另外的处理步骤也可以在转移之前使用复制品进行，包括形成纳米结构，微器件或其部分。当复制品被转移时，这些结构也被转移到基底上，当复制品溶解时，这些结构保留在基底上。这是一种技术，可用作互补过程或替代集成电路和其他微型器件制造中的各种光刻处理步骤。

5. 发明授权

US06849558B2 Replication and transfer of microstructures and nanostructures 有权
标题翻译：微结构和纳米结构的复制和转移
公开(公告)号：US06849558B2
公开(公告)日：2005-02-01
申请号：US10246379
申请日：2002-09-17
申请人： Charles Daniel Schaper
发明人： Charles Daniel Schaper
IPC分类号： B81C1/00 , B82B3/00 , G03F7/00 , G03F7/09 , H01L21/027 , H01L21/31 , H01L21/469
CPC分类号： B81C1/0046 , B29C33/52 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/091 , Y10S438/942
摘要： A method for the duplication of microscopic patterns from a master to a substrate is disclosed, in which a replica of a topographic structure on a master is formed and transferred when needed onto a receiving substrate using one of a variety of printing or imprint techniques, and then dissolved. Additional processing steps can also be carried out using the replica before transfer, including the formation of nanostructures, microdevices, or portions thereof. These structures are then also transferred onto the substrate when the replica is transferred, and remain on the substrate when the replica is dissolved. This is a technique that can be applied as a complementary process or a replacement for various lithographic processing steps in the fabrication of integrated circuits and other microdevices.
摘要翻译：公开了一种用于从主机到基板的微观图案的复制的方法，其中主体上的形貌结构的复制品在需要时被形成并且使用各种印刷或印记技术之一转印到接收基板上，以及然后溶解。另外的处理步骤也可以在转移之前使用复制品进行，包括形成纳米结构，微器件或其部分。当复制品被转移时，这些结构也被转移到基底上，当复制品溶解时，这些结构保留在基底上。这是一种技术，可用作互补过程或替代集成电路和其他微型器件制造中的各种光刻处理步骤。

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