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    • 1. 发明申请
    • Imaging Diffraction Based Overlay
    • 基于成像衍射的覆盖
    • US20090296075A1
    • 2009-12-03
    • US12129448
    • 2008-05-29
    • Jiangtao HuChandra Saru SaravananSilvio J. RabelloZhuan LiuNigel P. Smith
    • Jiangtao HuChandra Saru SaravananSilvio J. RabelloZhuan LiuNigel P. Smith
    • G01N21/00
    • G03F7/70633
    • An overlay error is determined using a diffraction based overlay target by generating a number of narrow band illumination beams that illuminate the overlay target. Each beam has a different range of wavelengths. Images of the overlay target are produced for each different range of wavelengths. An intensity value is then determined for each range of wavelengths. In an embodiment in which the overlay target includes a plurality of measurement pads, which may be illuminated and imaged simultaneously, an intensity value for each measurement pad in each image is determined. The intensity value may be determined statistically, such as by summing, finding the mean or median of the intensity values of pixels in the image. Spectra is then constructed using the determined intensity value, e.g., for each measurement pad. Using the constructed spectra, the overlay error may then be determined.
    • 通过产生照亮覆盖目标的许多窄带照明光束,使用基于衍射的覆盖目标确定覆盖误差。 每个波束具有不同的波长范围。 为每个不同的波长范围产生覆盖目标的图像。 然后确定每个波长范围的强度值。 在其中覆盖目标包括可以同时照明和成像的多个测量焊盘的实施例中,确定每个图像中每个测量焊盘的强度值。 可以统计地确定强度值,例如通过求和,找到图像中的像素的强度值的平均值或中值。 然后使用确定的强度值构建光谱,例如,对于每个测量垫。 使用构造的光谱,可以确定覆盖误差。