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1. 发明授权

US07164282B1 Methods and apparatus for determining an average electrical response to a conductive layer on a substrate 有权
标题翻译：用于确定对基底上的导电层的平均电响应的方法和装置
公开(公告)号：US07164282B1
公开(公告)日：2007-01-16
申请号：US11092849
申请日：2005-03-28
申请人： Andrew D. Bailey, III , Michael Leonard , Benjamin W. Mooring , Candi Kristoffersen
发明人： Andrew D. Bailey, III , Michael Leonard , Benjamin W. Mooring , Candi Kristoffersen
IPC分类号： G01R31/26
CPC分类号： G01N27/9046
摘要： A method of determining an average electrical response to a conductive layer on a set of substrates vibrating about a vibration mean is disclosed. The method includes positioning a sensor near a position on a first substrate; and measuring a first plurality of electrical responses, wherein each of the first plurality of electrical responses is function of an electrical film property response and a first substrate proximity response. The method also includes positioning the sensor near the position on a second substrate; and measuring a second plurality of electrical responses, wherein each of the second plurality of electrical responses is function of the electrical film property response and a second substrate proximity response. The method further includes determining a first average electrical response for the first substrate and a second average electrical response for the second substrate, wherein a difference between an average first substrate proximity response and an average second substrate proximity response is about zero.
摘要翻译：公开了一种确定围绕振动平均值振动的一组基底上的导电层的平均电响应的方法。该方法包括将传感器定位在第一基底上的位置附近; 以及测量第一多个电响应，其中所述第一多个电响应中的每一个是电膜性质响应和第一衬底接近响应的函数。该方法还包括将传感器定位在第二基底上的位置附近; 以及测量第二多个电响应，其中所述第二多个电响应中的每一个是所述电膜特性响应和第二基板接近响应的函数。该方法还包括确定第一衬底的第一平均电响应和第二衬底的第二平均电响应，其中平均第一衬底接近响应和平均第二衬底接近响应之间的差为约零。

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