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1. 发明授权

US08134708B2 Method of measuring numerical aperture of exposure machine, control wafer, photomask, and method of monitoring numerical aperture of exposure machine 有权
标题翻译：测量曝光机，控制晶片，光掩模数值孔径及曝光机数值孔径监测方法
公开(公告)号：US08134708B2
公开(公告)日：2012-03-13
申请号：US12337606
申请日：2008-12-17
申请人： Chien-Min Wu , Chien-Chih Chen
发明人： Chien-Min Wu , Chien-Chih Chen
IPC分类号： G01B11/00
CPC分类号： G01B11/26 , G03B27/42 , G03F7/706
摘要： A method of measuring a numerical aperture of an exposure machine is described. A control wafer having vernier marks thereon and an aberration mask having pinholes therein are provided, wherein each pinhole corresponds to a vernier mark in position. A lithography process using the exposure machine and the aberration mask is performed to the control wafer, so as to form over each vernier mark a photoresist pattern having the same shape of the illumination pattern of the light source of the exposure machine. The numerical aperture of the exposure machine is then derived from a graduation of the vernier mark corresponding to an outer edge of the photoresist pattern.
摘要翻译：描述了一种测量曝光机的数值孔径的方法。提供其上具有游标标记的对照晶片和其中具有针孔的像差掩模，其中每个针孔对应于位置上的游标标记。对控制晶片执行使用曝光机和像差掩模的光刻处理，以在每个游标标记上形成具有与曝光机的光源的照明图案相同形状的光致抗蚀剂图案。然后，曝光机的数值孔径从对应于光致抗蚀剂图案的外边缘的游标标记的刻度得到。

2. 发明申请

US20100149535A1 METHOD OF MEASURING NUMERICAL APERTURE OF EXPOSURE MACHINE, CONTROL WAFER, PHOTOMASK, AND METHOD OF MONITORING NUMERICAL APERTURE OF EXPOSURE MACHINE 有权
标题翻译：测量曝光机数值孔径的方法，控制波形，光电转换和监测曝光机数值方法
公开(公告)号：US20100149535A1
公开(公告)日：2010-06-17
申请号：US12337606
申请日：2008-12-17
申请人： Chien-Min Wu , Chien-Chih Chen
发明人： Chien-Min Wu , Chien-Chih Chen
IPC分类号： G01B11/00 , G03F1/00 , G03B27/42
CPC分类号： G01B11/26 , G03B27/42 , G03F7/706
摘要： A method of measuring a numerical aperture of an exposure machine is described. A control wafer having vernier marks thereon and an aberration mask having pinholes therein are provided, wherein each pinhole corresponds to a vernier mark in position. A lithography process using the exposure machine and the aberration mask is performed to the control wafer, so as to form over each vernier mark a photoresist pattern having the same shape of the illumination pattern of the light source of the exposure machine. The numerical aperture of the exposure machine is then derived from a graduation of the vernier mark corresponding to an outer edge of the photoresist pattern.
摘要翻译：描述了一种测量曝光机的数值孔径的方法。提供其上具有游标标记的对照晶片和其中具有针孔的像差掩模，其中每个针孔对应于位置上的游标标记。对控制晶片执行使用曝光机和像差掩模的光刻处理，以在每个游标标记上形成具有与曝光机的光源的照明图案相同形状的光致抗蚀剂图案。然后，曝光机的数值孔径从对应于光致抗蚀剂图案的外边缘的游标标记的刻度得到。

3. 发明申请

US20070251272A1 Rectangular monobloc optical lens and manufacturing method thereof 审中-公开
公开(公告)号：US20070251272A1
公开(公告)日：2007-11-01
申请号：US11826395
申请日：2007-07-13
申请人： San-Woei Shyu , Chien-Min Wu
发明人： San-Woei Shyu , Chien-Min Wu
IPC分类号： C03B21/00
CPC分类号： G02B13/0025 , C03B11/08 , C03B2215/49 , G02B3/00
摘要： A rectangular monobloc optical lens and a manufacturing method thereof are disclosed. A monobloc optical lens includes a rectangular surround and a central mirror-surface area. The rectangular surround is mounted inside a clipping part of a lens holder. The central mirror-surface area consists of a convex aspherical surface and a concave aspherical surface while the convex aspherical surface faces an image side and the concave aspherical surface faces an object side. The manufacturing method includes the steps of: cutting a sheet made from glass material into a plurality of rectangular sheet units; then setting the rectangular sheet unit into a mold for lens for hot pressing. Thereby, the manufacturing process is simplified and the cost is reduced. Moreover, the lens has high resolution and the volume of the lens is effectively reduced so as to increase the applications of the lens.

4. 发明授权

US06862219B2 Weak programming method of non-volatile memory 有权
标题翻译：非易失性存储器编程方法薄弱
公开(公告)号：US06862219B2
公开(公告)日：2005-03-01
申请号：US10249140
申请日：2003-03-19
申请人： Shih-Hsien Yang , Chien-Min Wu , James Juen Hsu , Chi-Moon Huang
发明人： Shih-Hsien Yang , Chien-Min Wu , James Juen Hsu , Chi-Moon Huang
IPC分类号： G11C11/34 , G11C16/04 , G11C16/34
CPC分类号： G11C16/3477 , G11C16/3404 , G11C16/3409
摘要： A weak programming method of a non-volatile memory. A first voltage is applied to a substrate during a first duration, while a control-gate voltage, such as zero volt, is applied to the gate, such that the leakage of the bit line is reduced and electron-hole pairs are generated. In the second duration, a second voltage is applied to the substrate, and a third voltage is applied to the gate to enhance the capability of injecting electrons into the floating gate of the non-volatile memory. Therefore, the distribution of the threshold voltage is more concentrated. The second voltage has a polarity the same as that of the first voltage, while the polarity of the third voltage is opposite to that of the second voltage.
摘要翻译：非易失性存储器的弱编程方法。在第一持续时间内将第一电压施加到衬底，同时将诸如零伏特的控制栅极电压施加到栅极，使得位线的泄漏减小并且产生电子 - 空穴对。在第二持续时间中，向衬底施加第二电压，并且向栅极施加第三电压以增强将电子注入非易失性存储器的浮动栅极的能力。因此，阈值电压的分布更为集中。第二电压具有与第一电压相同的极性，而第三电压的极性与第二电压的极性相反。

5. 发明申请

US20210395573A1 HIGH FREQUENCY EASY MELTING MULTIPLE LAYERED STRUCTURE 有权
公开(公告)号：US20210395573A1
公开(公告)日：2021-12-23
申请号：US16905938
申请日：2020-06-19
申请人： CHIH YI LIN , KUO KUANG CHENG , CHIEN CHIA HUANG , CHIA HO LIN , CHIEN MIN WU , WEI CHAO WANG
发明人： CHIH YI LIN , KUO KUANG CHENG , CHIEN CHIA HUANG , CHIA HO LIN , CHIEN MIN WU , WEI CHAO WANG
IPC分类号： C09J7/35 , C09J7/50 , C09J7/21
摘要： The present invention is related to a high frequency easy melting multiple layered structure, which includes a high frequency easy melting coating layer; a high frequency easy melting adhesive layer installed below the high frequency easy melting coating layer and a high frequency easy melting thermoplastic polyurethane (TPU) substrate placed below the high frequency easy melting adhesive layer. They serve to reduce the energy and time period in the high frequency melting and connection so as to promote producing speed and capacity effectively.

6. 发明授权

US08077394B2 Glass lens array module with alignment member and manufacturing method thereof 失效
标题翻译：具有对准构件的玻璃透镜阵列模块及其制造方法
公开(公告)号：US08077394B2
公开(公告)日：2011-12-13
申请号：US12640670
申请日：2009-12-17
申请人： Chien-Min Wu , Hsueh-Lin Chen , Bo-Hao Chang , San-Woei Shyu
发明人： Chien-Min Wu , Hsueh-Lin Chen , Bo-Hao Chang , San-Woei Shyu
IPC分类号： G02B27/10
CPC分类号： G02B13/0085 , G02B3/0031 , G02B3/0062 , G02B3/0075
摘要： A glass lens array module with alignment fixture and a manufacturing method thereof are revealed. A glass lens array is produced by multi-cavity glass molding and alignment members are arranged on a peripheral of non-optical area of the glass lens array. Optical axis of each of two adjacent glass lens arrays is aligned by corresponding alignment members and the glass lens arrays are assembled by glue. A spacer is disposed between the two adjacent glass lens arrays to form a preset interval if needed. Thus a glass lens array module is formed after curing of the glue. Thereby the alignment of the optical axis of the glass lens is achieved easily and optical precision is also attained. Moreover, the manufacturing processes are simplified and the cost is reduced.
摘要翻译：揭示了具有对准夹具的玻璃透镜阵列模块及其制造方法。玻璃透镜阵列通过多腔玻璃成型制造，并且对准构件布置在玻璃透镜阵列的非光学区域的周边上。两个相邻的玻璃透镜阵列中的每一个的光轴由对应的对准构件对准，并且玻璃透镜阵列通过胶水组装。如果需要，间隔件设置在两个相邻的玻璃透镜阵列之间以形成预设间隔。因此，在固化胶之后形成玻璃透镜阵列模块。由此，可以容易地实现玻璃透镜的光轴的对准，并且也可实现光学精度。而且，制造工艺简化，成本降低。

7. 发明授权

US07869283B2 Method for determining native threshold voltage of nonvolatile memory 有权
标题翻译：用于确定非易失性存储器的本机阈值电压的方法
公开(公告)号：US07869283B2
公开(公告)日：2011-01-11
申请号：US12425650
申请日：2009-04-17
申请人： Chao-Hua Chang , Chien-Min Wu
发明人： Chao-Hua Chang , Chien-Min Wu
IPC分类号： G11C16/04
CPC分类号： G11C16/10
摘要： A method for determining native threshold voltage of nonvolatile memory includes following steps. A memory cell including a control gate, a charge storage layer, a source region, and a drain region is provided. A programming operation is performed on the memory cell by using F-N tunneling effect to obtain a programming curve of time versus threshold voltage. In the programming operation, a positive voltage is applied to the control gate. An erase operation is performed on the memory cell by using F-N tunneling effect to obtain an erasure curve of time versus threshold voltage. In the erase operation, a negative voltage is applied to the control gate. The absolute values of the positive voltage and the negative voltage are the same. The native threshold voltage of memory cell is determined from the cross point of the programming curve and the erasure curve.
摘要翻译：用于确定非易失性存储器的本机阈值电压的方法包括以下步骤。提供了包括控制栅极，电荷存储层，源极区域和漏极区域的存储单元。通过使用F-N隧道效应对存储器单元执行编程操作以获得时间对阈值电压的编程曲线。在编程操作中，向控制栅极施加正电压。通过使用F-N隧道效应对存储器单元执行擦除操作，以获得时间对阈值电压的擦除曲线。在擦除操作中，向控制栅极施加负电压。正电压和负电压的绝对值相同。从编程曲线和擦除曲线的交叉点确定存储单元的本机阈值电压。

8. 发明申请

US20100284089A1 STACKED OPTICAL GLASS LENS ARRAY, STACKED LENS MODULE AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：堆叠光学透镜阵列，堆叠镜头模块及其制造方法
公开(公告)号：US20100284089A1
公开(公告)日：2010-11-11
申请号：US12556294
申请日：2009-09-09
申请人： San-Woei SHYU , Chien-Min Wu , Hsueh-Lin Chen
发明人： San-Woei SHYU , Chien-Min Wu , Hsueh-Lin Chen
IPC分类号： G02B27/12 , G02B11/02 , B29D11/00
CPC分类号： G02B3/0062 , G02B3/0068 , G02B3/0075
摘要： A stacked optical glass lens array, a stacked lens module and a manufacturing method thereof are disclosed. The stacked optical glass lens array includes at least two optical glass lens arrays whose optical axis are aligned and then stacked with each other by cement glue in glue grooves. A stacked optical glass lens element can be singularized by cutting along with the alignment notches of stacked optical glass lens array. The stacked lens module is formed by a single stacked optical glass lens element and related optical element mounted in a lens holder. Thereby the optical axis of the lenses of the stacked lens module are aligned precisely, the manufacturing processes are simplified and the production cost is reduced.
摘要翻译：公开了层叠光学玻璃透镜阵列，层叠透镜组件及其制造方法。层叠的光学玻璃透镜阵列包括至少两个光学玻璃透镜阵列，其光轴对准，然后通过胶水将胶水彼此堆叠。层叠的光学玻璃透镜元件可以通过与堆叠的光学玻璃透镜阵列的对准凹口一起切割而被单一化。层叠透镜模块由安装在透镜保持器中的单个堆叠的光学玻璃透镜元件和相关的光学元件形成。因此，层叠的透镜模块的透镜的光轴精确对准，制造工艺简化，并且降低了生产成本。

9. 发明授权

US07312933B2 Rectangular monobloc optical lens and manufacturing method thereof 失效
标题翻译：矩形单块光学透镜及其制造方法
公开(公告)号：US07312933B2
公开(公告)日：2007-12-25
申请号：US11403894
申请日：2006-04-14
申请人： San-Woei Shyu , Chien-Min Wu
发明人： San-Woei Shyu , Chien-Min Wu
IPC分类号： G02B17/00
CPC分类号： G02B13/0025 , C03B11/08 , C03B2215/49 , G02B3/00
摘要： A rectangular monobloc optical lens and a manufacturing method thereof are disclosed. A monobloc optical lens includes a rectangular surround and a central mirror-surface area. The rectangular surround is mounted inside a clipping part of a lens holder. The central mirror-surface area consists of a convex aspherical surface and a concave aspherical surface while the convex aspherical surface faces an image side and the concave aspherical surface faces an object side. The manufacturing method includes the steps of: cutting a sheet made from glass material into a plurality of rectangular sheet units; then setting the rectangular sheet unit into a mold for lens for hot pressing. Thereby, the manufacturing process is simplified and the cost is reduced. Moreover, the lens has high resolution and the volume of the lens is effectively reduced so as to increase the applications of the lens.
摘要翻译：公开了一种矩形单体光学透镜及其制造方法。单体光学透镜包括矩形环绕和中心镜面区域。矩形环绕安装在透镜架的夹持部分内。中央镜面区域由凸非球面和凹非球面组成，而凸非球面则面向像侧，而凹面非球面则面向物侧。该制造方法包括以下步骤：将由玻璃材料制成的片材切割成多个矩形片单元; 然后将矩形片单元设置到用于热压的透镜用模具中。由此，简化制造工序，降低成本。此外，透镜具有高分辨率，并且有效地减小了透镜的体积，从而增加了透镜的应用。

10. 发明申请

US20070171535A1 Rectangular monobloc optical lens and manufacturing method thereof 失效
公开(公告)号：US20070171535A1
公开(公告)日：2007-07-26
申请号：US11403894
申请日：2006-04-14
申请人： San-Woei Shyu , Chien-Min Wu
发明人： San-Woei Shyu , Chien-Min Wu
IPC分类号： G02B3/00
CPC分类号： G02B13/0025 , C03B11/08 , C03B2215/49 , G02B3/00
摘要： A rectangular monobloc optical lens and a manufacturing method thereof are disclosed. A monobloc optical lens includes a rectangular surround and a central mirror-surface area. The rectangular surround is mounted inside a clipping part of a lens holder. The central mirror-surface area consists of a convex aspherical surface and a concave aspherical surface while the convex aspherical surface faces an image side and the concave aspherical surface faces an object side. The manufacturing method includes the steps of: cutting a sheet made from glass material into a plurality of rectangular sheet units; then setting the rectangular sheet unit into a mold for lens for hot pressing. Thereby, the manufacturing process is simplified and the cost is reduced. Moreover, the lens has high resolution and the volume of the lens is effectively reduced so as to increase the applications of the lens.

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