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    • 4. 发明授权
    • Cell structure of EPROM device and method for fabricating the same
    • EPROM器件的单元结构及其制造方法
    • US07348241B2
    • 2008-03-25
    • US11384727
    • 2006-03-20
    • Joon-hyung LeeByung-sun KimTae-jung Lee
    • Joon-hyung LeeByung-sun KimTae-jung Lee
    • H01L21/336
    • H01L21/28273H01L29/42324H01L29/513H01L29/66825H01L29/7881
    • Provided are a cell structure of an EPROM device and a method for fabricating the same. The cell structure includes a gate stack, which includes a first floating gate, an insulating pattern including a nitride layer, and a control gate that are sequentially stacked on a semiconductor substrate, and includes a window for exposing the top surface or both sidewalls of the first floating gate on both sides of the control gate, so that charges of the first floating gate can be erased by ultraviolet rays. The cell structure further includes a floating gate transistor, which includes a gate insulating layer formed on the semiconductor substrate, a second floating gate that is formed on the gate insulating layer and is connected to the first floating gate in the gate stack, and a source/drain that is formed in the semiconductor substrate so as to be aligned to the second floating gate. In the cell structure, the window is formed on the top surface or both sidewalls of the first floating gate of the gate stack. Thus, ultraviolet rays can penetrate through the window and easily erase charges of the programmed cell.
    • 提供EPROM器件的单元结构及其制造方法。 电池结构包括栅极堆叠,其包括第一浮置栅极,包括氮化物层的绝缘图案和顺序地堆叠在半导体衬底上的控制栅极,并且包括用于暴露所述顶部表面或两个侧壁的窗口 第一个浮动栅极位于控制栅极的两侧,使得第一个浮动栅极的电荷可以被紫外线消除。 电池结构还包括浮栅晶体管,其包括形成在半导体衬底上的栅极绝缘层,形成在栅极绝缘层上并连接到栅堆叠中的第一浮栅的第二浮栅,以及源极 /漏极,其形成在半导体衬底中以便与第二浮栅对准。 在电池结构中,窗口形成在栅堆叠的第一浮栅的顶表面或两个侧壁上。 因此,紫外线可以穿过窗口并容易地擦除编程单元的电荷。