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    • 1. 发明授权
    • Process for metallization of a nonconductor surface, especially on a
circuit board having preexisting copper surfaces
    • 非导体表面的金属化工艺,特别是在具有预先存在的铜表面的电路板上
    • US5183552A
    • 1993-02-02
    • US655789
    • 1991-02-14
    • Burkhard BresselHeinrich MeyerWalter MeyerKlaus Gedrat
    • Burkhard BresselHeinrich MeyerWalter MeyerKlaus Gedrat
    • C08G61/12C25D5/56H05K3/18
    • H05K3/188C08G61/123C25D5/56H05K2201/0329H05K2203/0796Y10S205/92
    • The process for directly metallizing a circuit board having nonconductor surfaces, includes reacting the nonconductor surface with an alkaline permanganate solution to form manganese dioxide chemically adsorbed on the nonconductor surface; forming an aqueous solution of a weak acid having an acid dissociation constant, for loss of a proton in aqueous solution, between 0.1 and 0.01, and of pyrrole or a pyrrole derivative and soluble oligomers thereof; contacting the aqueous solution containing the pyrrole monomer and its oligomers with the nonconductor surface having the manganese dioxide adsorbed chemically thereon to deposit an adherent, electrically conducting, insoluble polymer product on the nonconductor surface; and directly electrodepositing metal on the nonconductor surface having the insoluble adherent polymer product formed thereon. The oligomers are advantageously formed in aqueous solution containing 0.1 to 200 g/l of the pyrrole monomer at a temperature between room temperature and the freezing point of the solution.
    • 用于直接金属化具有非导体表面的电路板的方法包括使非导体表面与碱性高锰酸盐溶液反应以形成化学吸附在非导体表面上的二氧化锰; 形成具有酸解离常数的弱酸的水溶液,水溶液中的质子损失为0.1〜0.01,以及吡咯或吡咯衍生物及其可溶性低聚物; 使含有吡咯单体及其低聚物的水溶液与其上具有化学吸附的二氧化锰的非导体表面接触,以在非导体表面上沉积粘附的导电不溶性聚合物产物; 并在其上形成有不溶性粘附聚合物产物的非导体表面上直接电沉积金属。 低聚物有利地在室温至溶液凝固点之间的温度下形成含有0.1至200g / l吡咯单体的水溶液。
    • 3. 发明授权
    • Process for metallization of a nonconductor surface
    • 非导体表面的金属化工艺
    • US5693209A
    • 1997-12-02
    • US518575
    • 1995-08-23
    • Burkhard BresselHeinrich MeyerWalter MeyerKlaus Gedrat
    • Burkhard BresselHeinrich MeyerWalter MeyerKlaus Gedrat
    • C08G61/12C25D5/56H05K3/18
    • H05K3/188C08G61/123C25D5/56H05K2203/0796Y10S205/92
    • The process for directly metallizing a circuit board having nonconductor surfaces, includes reacting the nonconductor surface with an alkaline permanganate solution to form manganese dioxide chemically adsorbed on the nonconductor surface; forming an aqueous solution of a weak acid and of pyrrole or a pyrrole derivative and soluble oligomers thereof; contacting the aqueous solution containing the pyrrole monomer and its oligomers with the nonconductor surface having the manganese dioxide adsorbed chemically thereon to deposit an adherent, electrically conducting, insoluble polymer product on the nonconductor surface; and directly electrodepositing metal on the nonconductor surface having the insoluble adherent polymer product formed thereon. The oligomers are advantageously formed in aqueous solution containing 0.1 to 200 g/l of the pyrrole monomer at a temperature between room temperature and the freezing point of the solution.
    • 用于直接金属化具有非导体表面的电路板的方法包括使非导体表面与碱性高锰酸盐溶液反应以形成化学吸附在非导体表面上的二氧化锰; 形成弱酸和吡咯或吡咯衍生物及其可溶性低聚物的水溶液; 使含有吡咯单体及其低聚物的水溶液与其上具有化学吸附的二氧化锰的非导体表面接触,以在非导体表面上沉积粘附的导电不溶性聚合物产物; 并在其上形成有不溶性粘附聚合物产物的非导体表面上直接电沉积金属。 低聚物有利地在室温至溶液凝固点之间的温度下形成含有0.1至200g / l吡咯单体的水溶液。