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    • 8. 发明授权
    • Semiconductor device having multi-bit nonvolatile memory cell and methods of fabricating the same
    • 具有多位非易失性存储单元的半导体器件及其制造方法
    • US07521750B2
    • 2009-04-21
    • US12017239
    • 2008-01-21
    • Bo-Young SeoHee-Seog JeonSung-Taeg Kang
    • Bo-Young SeoHee-Seog JeonSung-Taeg Kang
    • H01L29/76
    • G11C16/0475G11C11/5621G11C11/5692G11C16/0458H01L27/115H01L27/11521H01L27/11524H01L27/11568
    • A nonvolatile semiconductor device includes a pair of multi-bit nonvolatile memory unit cells. Each unit cell includes a grid type semiconductor body in which a plurality of parallel semiconductor bodies extend in a first direction and a plurality of parallel semiconductor bodies extend in a second direction perpendicular to the first direction, a channel region formed in a partial region of the semiconductor body along circumferences of the semiconductor bodies that extend in the first direction, a charge storage region formed on the channel region, a plurality of control gates, which are formed on the charge storage region and wherein each of the plurality of control gates is adapted to receive separate control voltages. Each unit cell further includes source and drain regions aligned on both sides of the plurality of control gates and formed in the semiconductor bodies, wherein the pair of unit cells share the source region, and the source region is formed at a cross point of the grid.
    • 非易失性半导体器件包括一对多位非易失性存储单元。 每个单电池包括栅格型半导体本体,其中多个平行的半导体本体在第一方向上延伸,并且多个平行的半导体本体在垂直于第一方向的第二方向上延伸,沟道区形成在 半导体本体沿着在第一方向上延伸的半导体本体的周边,形成在沟道区上的电荷存储区域,形成在电荷存储区域上的多个控制栅极,并且其中多个控制栅极中的每一个被适配 以接收单独的控制电压。 每个单元还包括在多个控制栅极的两侧对准并形成在半导体主体中的源极和漏极区域,其中该对单元电池共享源极区域,并且源极区域形成在栅极的交叉点处 。