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1. 发明授权

US08035056B2 Plasma generation apparatus 有权
标题翻译：等离子体发生装置
公开(公告)号：US08035056B2
公开(公告)日：2011-10-11
申请号：US12111903
申请日：2008-04-29
申请人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
IPC分类号： B23K10/00
CPC分类号： H01J37/32935 , H01J37/321 , H05H1/46
摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, comprising: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
摘要翻译：等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 向处理室供给处理气体的气体供给装置; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。

2. 发明授权

US07411148B2 Plasma generation apparatus 有权
标题翻译：等离子体发生装置
公开(公告)号：US07411148B2
公开(公告)日：2008-08-12
申请号：US11356947
申请日：2006-02-16
申请人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
IPC分类号： B23K9/00 , B23K9/02
CPC分类号： H01J37/32935 , H01J37/321 , H05H1/46
摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supplier supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, including: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
摘要翻译：等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 供应处理气体的气体供应器; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。

3. 发明申请

US20090183834A1 PLASMA GENERATION APPARATUS 有权
标题翻译：等离子体发生装置
公开(公告)号：US20090183834A1
公开(公告)日：2009-07-23
申请号：US12111903
申请日：2008-04-29
申请人： Gi-Chung KWON , Sang-Won LEE , Sae-Hoon UHM , Jae-Hyun KIM , Bo-Han HONG , Yong-Kwan LEE
发明人： Gi-Chung KWON , Sang-Won LEE , Sae-Hoon UHM , Jae-Hyun KIM , Bo-Han HONG , Yong-Kwan LEE
IPC分类号： C23F1/08 , C23C16/54
CPC分类号： H01J37/32935 , H01J37/321 , H05H1/46
摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, comprising: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
摘要翻译：等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 向处理室供给处理气体的气体供给装置; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。

4. 发明申请

US20060191880A1 Plasma generation apparatus 有权
标题翻译：等离子体发生装置
公开(公告)号：US20060191880A1
公开(公告)日：2006-08-31
申请号：US11356947
申请日：2006-02-16
申请人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
IPC分类号： B23K9/00 , B23K9/02
CPC分类号： H01J37/32935 , H01J37/321 , H05H1/46
摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, comprising: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
摘要翻译：等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 向处理室供给处理气体的气体供给装置; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。

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