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    • 1. 发明申请
    • POLYCRYSTALLINE CUPROUS OXIDE NANOWIRE ARRAY PRODUCTION METHOD USING LOW-TEMPERATURE ELECTROCHEMICAL GROWTH
    • 多晶硅氧化亚氮纳米阵列生产方法采用低温电化学生长
    • US20130270118A1
    • 2013-10-17
    • US13978416
    • 2012-01-04
    • Bae Ho ParkSung Oong Kang
    • Bae Ho ParkSung Oong Kang
    • C25D1/04C25D11/04
    • C25D1/04C25D1/006C25D11/045
    • There are provided a monocrystalline copper oxide (I) nanowire array manufacturing method using low-temperature electrochemical growth, and more particularly, to a manufacturing method allowing easy vapor deposition at low temperatures and also a monocrystalline copper oxide (I) nanowire array manufacturing method using low-temperature electrochemical growth which retains characteristics such as large-area growth, high-crystallinity nanowire, uniform radial distribution, easy length, radius adjustment, and the like.A monocrystalline copper oxide (I) nanowire array manufacturing method of the present invention includes a step of manufacturing a nanopore alumina layer (anodized alumina (AAO)) from a high-purity aluminum (Al) sheet by using a two-step anodic oxidation method; and a step of manufacturing a monocrystalline copper oxide (I) nanowire array by using the nanopore alumina layer as a nanopore molding flask by means of a low-temperature electrochemical growth method.
    • 提供了使用低温电化学生长的单晶氧化铜(I)纳米线阵列制造方法,更具体地,涉及一种允许在低温下容易蒸镀的制造方法,还提供了使用单晶氧化铜(I)纳米线阵列制造方法 保持诸如大面积生长,高结晶度纳米线,均匀径向分布,容易长度,半径调节等特性的低温电化学生长。 本发明的单晶氧化铜(I)纳米线阵列的制造方法包括通过使用两步阳极氧化法从高纯度铝(Al)片制造纳米孔氧化铝层(阳极化氧化铝(AAO))的工序 ; 以及通过使用纳米孔氧化铝层作为纳米孔型烧瓶的低温电化学生长法制造单晶氧化铜(I)纳米线阵列的步骤。