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    • 5. 发明授权
    • Charged particle beam equipment and charged particle microscopy
    • 带电粒子束设备和带电粒子显微镜
    • US07435957B2
    • 2008-10-14
    • US11302323
    • 2005-12-14
    • Hiromi InadaMitsugu SatoAtsushi Takane
    • Hiromi InadaMitsugu SatoAtsushi Takane
    • G01N23/00
    • H01J37/28H01J37/222H01J37/265H01J2237/223H01J2237/2826H01J2237/3045
    • On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.
    • 基于从包括通过使带电粒子束偏转预定量而记录的视野的位移的第一标本图像提取的带电粒子束的偏转之前和之后的视场位移的基础上, 通过在通过使用样本的样本放大图像作为放大标准校准的第一倍率捕获样本图像的图像中的光束偏转器,以及在充电的偏转之前和之后的视场位移 从第二标本图像中提取出的粒子束,包括通过使带电粒子束在第二放大倍数下拍摄样本图像的图像中的光束偏转器偏转预定量而记录的视野的位移, 校准第二放大倍数。
    • 9. 发明申请
    • Charged particle beam apparatus
    • 带电粒子束装置
    • US20070120065A1
    • 2007-05-31
    • US11599611
    • 2006-11-15
    • Atsushi TakaneSatoru YamaguchiMitsugu Sato
    • Atsushi TakaneSatoru YamaguchiMitsugu Sato
    • G01K1/08
    • H01J37/1471H01J37/265H01J2237/1501H01J2237/216H01J2237/28
    • A charged particle beam apparatus is provided which can prevent the accuracy of positional shift detection from being degraded owing to differences in picture quality, so that even when the state of a charged particle beam is changed at the time that optical conditions are changed or the optical axis changes with time, an auto adjustment of the optical axis can be realized easily and highly accurately. In the charged particle beam apparatus, evaluation or adjustment of focusing is conducted before the deflection condition of an alignment deflector for optical axis adjustment is changed or a table of focus adjustment amounts in correspondence with deflection conditions of the alignment deflector is provided, whereby when the deflection condition of the alignment deflector is changed, a focus adjustment is carried out in accordance with the table.
    • 提供一种带电粒子束装置,其可以防止由于图像质量的差异而导致的位置偏移检测的精度降低,使得即使当光学条件改变时带电粒子束的状态改变或光学条件改变时, 轴随时间变化,可以容易且高精度地实现光轴的自动调节。 在带电粒子束装置中,在用于光轴调节的对准偏转器的偏转状态改变之前进行聚焦的评估或调整,或者提供与对准偏转器的偏转条件相对应的焦点调整量表, 改变对准偏转器的偏转状态,根据该表进行焦点调整。