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1. 发明申请

US20090206720A1 LOW-PRESSURE GAS DISCHARGE LAMP HAVING IMPROVED EFFICIENCY 审中-公开
标题翻译：低压气体放电灯具有改进的效率
公开(公告)号：US20090206720A1
公开(公告)日：2009-08-20
申请号：US12300836
申请日：2007-04-25
申请人： Piet Antonis , Ariel De Graaf , Spyridon Kitsinelis , Peter Johannes Wilhelmus Vankan
发明人： Piet Antonis , Ariel De Graaf , Spyridon Kitsinelis , Peter Johannes Wilhelmus Vankan
IPC分类号： H01J61/12 , H01J61/52 , H01J1/62
CPC分类号： H01J61/125 , A61L2/10 , A61L9/20 , C02F1/32 , H01J61/70 , H01J65/042
摘要： The invention relates to a low-pressure mercury vapor discharge lamp (10) comprising a metal compound which is selected from the group formed by compounds of titanium, zirconium, hafnium and their mixtures. The effect of adding the metal compound selected from said group to the gas filling of the discharge space (14) results in an increased efficiency of the low-pressure gas discharge lamp (10), because part of the emitted light from the discharge space (14) is in the visible range of the electromagnetic spectrum. In one embodiment of the invention, the low-pressure gas discharge lamp (10) produces substantially white light without the use of a luminescent layer (16) comprising a luminescent material. In another embodiment of the invention, the luminescent layer (16) is applied to the discharge vessel (12) of the low-pressure gas discharge lamp (10). The light emitted by the luminescent material can be mixed with the light emitted from the discharge space (14) to produce the required color.
摘要翻译：本发明涉及一种低压汞蒸汽放电灯（10），其包含选自钛，锆，铪及其混合物的化合物形成的组的金属化合物。将从所述组中选择的金属化合物添加到放电空间（14）的气体填充物的效果导致低压气体放电灯（10）的效率提高，这是由于来自放电空间 14）在电磁光谱的可见范围内。在本发明的一个实施例中，低压气体放电灯（10）在不使用包含发光材料的发光层（16）的情况下产生基本上白光。在本发明的另一实施例中，将发光层（16）施加到低压气体放电灯（10）的放电容器（12）。由发光材料发射的光可以与从放电空间（14）发射的光混合以产生所需的颜色。

2. 发明申请

US20090174870A1 Cleaning apparatus and immersion lithographic apparatus 审中-公开
标题翻译：清洁设备和浸没式光刻设备
公开(公告)号：US20090174870A1
公开(公告)日：2009-07-09
申请号：US12289621
申请日：2008-10-30
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paul Blom , Ronald Harm Gunther Kramer , Michel van Putten , Ariel de Graaf
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paul Blom , Ronald Harm Gunther Kramer , Michel van Putten , Ariel de Graaf
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70733
摘要： A cleaning apparatus to clean a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of the surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the cleaning apparatus to clean a surface is also disclosed. The immersion lithographic apparatus may comprise a substrate table to support a substrate and a fluid confinement structure to at least partly confine immersion fluid between a projection system and a substrate table and/or substrate.
摘要翻译：公开了一种用于清洁浸没式光刻设备的基板或部件的清洁装置。清洁装置可以包括等离子体激光源，导管和激光束限制系统。等离子体自由基源可以提供自由基流。导管可以将来自等离子体源的源自由基提供到待清洁的表面。自由基限制系统可以引导自由基清洁表面的局部化部分。清洁装置可以包括旋转器并且可以被配置为清洁基板边缘。还公开了包括清洁表面的清洁装置的浸没式光刻设备。浸没式光刻设备可以包括用于支撑衬底和流体限制结构的衬底台，以至少部分地将浸没流体限制在投影系统和衬底台和/或衬底之间。

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