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1. 发明授权

US08278249B2 Composition for forming thick oxide superconductor film and process for producing thick tape-shaped oxide superconductor film 有权
标题翻译：用于形成厚氧化物超导体膜的组合物和用于生产厚的带状氧化物超导体膜的方法
公开(公告)号：US08278249B2
公开(公告)日：2012-10-02
申请号：US13132512
申请日：2010-01-06
申请人： Tomotaka Goto , Atsuya Yoshinaka , Akimasa Yajima
发明人： Tomotaka Goto , Atsuya Yoshinaka , Akimasa Yajima
IPC分类号： H01L39/12 , C04B35/45
CPC分类号： H01L39/2425 , C04B35/4508 , C04B35/6263 , C04B35/6264 , C04B35/6325 , C04B2235/3215 , C04B2235/3225 , C04B2235/449 , C04B2235/6562 , C23C18/1216 , C23C18/1295
摘要： Disclosed is a composition for forming a thick oxide superconductor film, the oxide being an RE-BA—Cu based oxide, wherein RE is at least one element selected from the group consisting of Y, Nd, Sm, Gd, Eu, Yb, Pr, and Ho. The composition contains an RE salt of a keto acid having 4 to 8 carbon atoms as an RE component, barium trifluoroacetate as a Ba component, at least one copper salt selected from the group consisting of a copper salt of a branched saturated aliphatic carboxylic acid having 6 to 16 carbon atoms and a copper salt of an alicyclic carboxylic acid having 6 to 16 carbon atoms as a Cu component, and an organic solvent dissolving these metal salt components. In the composition, the RE to Ba to Cu molar ratio is 1:1.3 to 2.2:2.4 to 3.6 and the content of the organic solvent is 25% to 80% by weight.
摘要翻译：公开了一种用于形成厚氧化物超导体膜的组合物，该氧化物是RE-BA-Cu基氧化物，其中RE是选自Y，Nd，Sm，Gd，Eu，Yb，Pr中的至少一种元素和何。该组合物含有作为RE成分的具有4〜8个碳原子的酮酸的RE盐，作为Ba成分的三氟乙酸钡，选自由支链饱和脂肪族羧酸的铜盐组成的组中的至少一种铜盐， 6至16个碳原子和具有6至16个碳原子的脂环族羧酸的铜盐作为Cu组分，以及溶解这些金属盐组分的有机溶剂。在组合物中，RE与Ba〜Cu的摩尔比为1：1.3〜2.2：2.4〜3.6，有机溶剂的含量为25〜80重量％。

2. 发明申请

US20110237440A1 COMPOSITION FOR FORMING THICK OXIDE SUPERCONDUCTOR FILM AND PROCESS FOR PRODUCING THICK TAPE-SHAPED OXIDE SUPERCONDUCTOR FILM 有权
标题翻译：用于形成厚氧化超导体膜的组合物和用于生产厚带状氧化物超导体膜的方法
公开(公告)号：US20110237440A1
公开(公告)日：2011-09-29
申请号：US13132512
申请日：2010-01-06
申请人： Tomotaka Goto , Atsuya Yoshinaka , Akimasa Yajima
发明人： Tomotaka Goto , Atsuya Yoshinaka , Akimasa Yajima
IPC分类号： H01L39/24 , C04B35/01 , B05D5/12 , H01B1/02
CPC分类号： H01L39/2425 , C04B35/4508 , C04B35/6263 , C04B35/6264 , C04B35/6325 , C04B2235/3215 , C04B2235/3225 , C04B2235/449 , C04B2235/6562 , C23C18/1216 , C23C18/1295
摘要： Disclosed is a composition for forming a thick oxide superconductor film, the oxide being an RE-BA-Cu based oxide, wherein RE is at least one element selected from the group consisting of Y, Nd, Sm, Gd, Eu, Yb, Pr, and Ho. The composition contains an RE salt of a keto acid having 4 to 8 carbon atoms as an RE component, barium trifluoroacetate as a Ba component, at least one copper salt selected from the group consisting of a copper salt of a branched saturated aliphatic carboxylic acid having 6 to 16 carbon atoms and a copper salt of an alicyclic carboxylic acid having 6 to 16 carbon atoms as a Cu component, and an organic solvent dissolving these metal salt components. In the composition, the RE to Ba to Cu molar ratio is 1:1.3 to 2.2:2.4 to 3.6 and the content of the organic solvent is 25% to 80% by weight
摘要翻译：公开了一种用于形成厚氧化物超导体膜的组合物，该氧化物是RE-BA-Cu基氧化物，其中RE是选自Y，Nd，Sm，Gd，Eu，Yb，Pr中的至少一种元素和何。该组合物含有作为RE成分的具有4〜8个碳原子的酮酸的RE盐，作为Ba成分的三氟乙酸钡，选自由支链饱和脂肪族羧酸的铜盐组成的组中的至少一种铜盐， 6至16个碳原子和具有6至16个碳原子的脂环族羧酸的铜盐作为Cu组分，以及溶解这些金属盐组分的有机溶剂。在该组成中，RE与Ba〜Cu的摩尔比为1：1.3〜2.2：2.4〜3.6，有机溶剂的含量为25〜80重量％

3. 发明申请

US20050087135A1 Fluid feeding apparatus 失效
标题翻译：流体供给装置
公开(公告)号：US20050087135A1
公开(公告)日：2005-04-28
申请号：US10958623
申请日：2004-10-06
申请人： Akira Hioki , Satoshi Nakagawa , Akimasa Yajima
发明人： Akira Hioki , Satoshi Nakagawa , Akimasa Yajima
IPC分类号： B01J4/00 , B08B9/02 , B08B9/08 , C23C16/18 , C23C16/44 , C23C16/455 , H01L21/205 , C23C16/00
CPC分类号： B08B9/0321 , B08B9/08 , C23C16/18 , C23C16/4402 , Y10T137/4259
摘要： A fluid feeding apparatus capable of excluding the outer environmental influences in feeding a fluid susceptible to contamination, decomposition or denaturation on contact with the outer environment. The includes comprises at least one liquid source container, a cleaning and/or diluting liquid container, a waste liquid collection container, an inert gas feed pipe A, an inert gas feed pipe B, an evacuation pipe connecting to a vacuum source, and a fluid feed pipe for introducing the fluid to a process. The source container has two pipes. The first pipe has valves arranged therein at positions nearer to and farther from the source container, respectively. The second pipe has two valves arranged therein at positions nearer to and farther from the container, respectively. The path between the valves 1 and 4 and the path between the valves 2 and 5 are connected via a connecting pipe C having a valve 3.
摘要翻译：一种流体输送装置，其能够排除在与外部环境接触时容易受到污染，分解或变性的流体供给的外部环境影响。包括至少一个液体源容器，清洁和/或稀释液体容器，废液收集容器，惰性气体供给管A，惰性气体供给管B，连接到真空源的抽空管，以及用于将流体引入流程的流体供给管。源容器有两个管道。第一管子分别在靠近和远离源容器的位置处布置有阀。第二管有两个阀分别设置在靠近和远离容器的位置。阀1和4之间的路径以及阀2和5之间的路径经由具有阀3的连接管C连接。

4. 发明授权

US07237565B2 Fluid feeding apparatus 失效
标题翻译：流体供给装置
公开(公告)号：US07237565B2
公开(公告)日：2007-07-03
申请号：US10958623
申请日：2004-10-06
申请人： Akira Hioki , Satoshi Nakagawa , Akimasa Yajima
发明人： Akira Hioki , Satoshi Nakagawa , Akimasa Yajima
IPC分类号： G05D7/00
CPC分类号： B08B9/0321 , B08B9/08 , C23C16/18 , C23C16/4402 , Y10T137/4259
摘要： A fluid feeding apparatus capable of excluding the outer environmental influences in feeding a fluid susceptible to contamination, decomposition or denaturation on contact with the outer environment. The includes comprises at least one liquid source container, a cleaning and/or diluting liquid container, a waste liquid collection container, an inert gas feed pipe A, an inert gas feed pipe B, an evacuation pipe connecting to a vacuum source, and a fluid feed pipe for introducing the fluid to a process. The source container has two pipes. The first pipe has valves arranged therein at positions nearer to and farther from the source container, respectively. The second pipe has two valves arranged therein at positions nearer to and farther from the container, respectively. The path between the valves 1 and 4 and the path between the valves 2 and 5 are connected via a connecting pipe C having a valve 3.
摘要翻译：一种流体输送装置，其能够排除在与外部环境接触时容易受到污染，分解或变性的流体供给的外部环境影响。包括至少一个液体源容器，清洁和/或稀释液体容器，废液收集容器，惰性气体供给管A，惰性气体供给管B，连接到真空源的抽空管，以及用于将流体引入流程的流体供给管。源容器有两个管道。第一管子分别在靠近和远离源容器的位置处布置有阀。第二管有两个阀分别设置在靠近和远离容器的位置。阀1和4之间的路径以及阀2和5之间的路径经由具有阀3的连接管C连接。

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