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    • 2. 发明授权
    • Modular support assembly with fortifying flange
    • 具有强化法兰的模块化支撑组件
    • US08857351B2
    • 2014-10-14
    • US11211510
    • 2005-08-25
    • Ronald A. ZimmerAlan W. Knapper
    • Ronald A. ZimmerAlan W. Knapper
    • A47B13/00A47B87/02A47B47/04
    • A47B87/0215A47B47/04A47B87/0253
    • A modular support assembly generally comprising vertical support members and a horizontal support member, such as a shelf, for supporting objects. The horizontal support member includes a main panel portion and flange portions connected along the sides of the panel for fortifying same. The vertical support members have cavities on their inner surfaces, and the horizontal support members have protrusions at their ends corresponding to the cavities. In some embodiments, the flanges are hingedly connected to the panel such that they pivot between a flat position and a supporting position perpendicular to the panel. In certain embodiments, the protrusions are integrally formed with extend out from the flanges. In some embodiments, the assembly is blow-molded article.
    • 通常包括用于支撑物体的垂直支撑构件和水平支撑构件(例如搁架)的模块化支撑组件。 水平支撑构件包括主面板部分和沿着面板的侧面连接的凸缘部分,用于对其进行加强。 垂直支撑构件在其内表面上具有空腔,并且水平支撑构件在其端部处具有对应于空腔的突起。 在一些实施例中,凸缘铰接地连接到面板,使得它们在平坦位置和垂直于面板的支撑位置之间枢转。 在某些实施例中,突出部一体地形成,从凸缘延伸出来。 在一些实施例中,组件是吹塑制品。
    • 6. 发明授权
    • Method and device for depositing crystalline layers on crystalline substrates
    • 在结晶基底上沉积结晶层的方法和装置
    • US07033921B2
    • 2006-04-25
    • US10872920
    • 2004-06-21
    • Holger Jurgensen
    • Holger Jurgensen
    • H01L21/28H01L21/3205
    • C30B25/02C30B25/14C30B29/40C30B29/403C30B29/406
    • The invention relates to a method and device for depositing several crystalline semiconductor layers on at least one semiconductor crystalline substrate. According to said method, gaseous parent substances are introduced into a process chamber of a reactor by means of a gas inlet organ, said substances accumulating, optionally after a chemical gas phase and/or surface reaction, on the surface of a semiconductor substrate that is placed on a substrate holder in the process chamber, thus forming the semiconductor layer. Said semiconductor layer and the semiconductor substrate form a crystal consisting of either one or several elements from main group V, elements from main groups III and V, or elements from main groups II and VI. In a first process step for depositing a first semiconductor layer, a first process gas consisting of one or several first parent substances is introduced into the process chamber, the decomposition products of said gas forming the crystal of a first semiconductor layer and small quantities of a second parent substance can be introduced into the process chamber in order to dope the first semiconductor layer. The invention is characterized in that in a second process step, prior to or after the first process step, a second process gas, which contains the second parent substance and optionally additional gases, is introduced into said process chamber in order to deposit a second semiconductor layer, the decomposition products of said gas forming a second semiconductor layer, having a crystal that differs from that of the first semiconductor layer, whereby small quantities of a first parent substance can be introduced into the process chamber in order to dope the second semiconductor layer.
    • 本发明涉及一种用于在至少一个半导体晶体衬底上沉积多个晶体半导体层的方法和装置。 根据所述方法,气态母体物质通过气体入口器官引入反应器的处理室中,所述物质任选地在化学气相和/或表面反应之后积聚在半导体衬底的表面上 放置在处理室中的衬底保持器上,从而形成半导体层。 所述半导体层和半导体衬底形成由主族V中的一种或几种元素,主要组III和V的元素或主要基团II和VI的元素组成的晶体。 在用于沉积第一半导体层的第一工艺步骤中,将由一种或几种第一母体物质组成的第一工艺气体引入处理室中,形成第一半导体层的晶体的所述气体的分解产物和少量的 可以将第二母体物质引入处理室以便掺杂第一半导体层。 本发明的特征在于,在第二工艺步骤中,在第一工艺步骤之前或之后,将含有第二母体物质和任选的附加气体的第二工艺气体引入所述处理室中,以沉积第二半导体 层,形成第二半导体层的所述气体的分解产物具有不同于第一半导体层的晶体,由此可以将少量的第一母体物质引入处理室以便掺杂第二半导体层 。