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    • 6. 发明授权
    • Reactor for the preparation of a formulation
    • US11344859B2
    • 2022-05-31
    • US16697454
    • 2019-11-27
    • SmartDyeLivery GmbH
    • Christoph EnglertMarc Lehmann
    • B01J19/18B01J19/00
    • The invention discloses a reactor for preparing a formulation. The reactor comprises at least two apertures, a base and at least one sidewall extending flush therefrom, wherein the base and the sidewall together define a mixing chamber with a height hM and at least one axis of symmetry arranged substantially perpendicular to the base and at least one distance r from the sidewall. A first aperture is arranged within the base or adjacent to the base in the sidewall of the mixing chamber at a height hA ranging from 0.6 to 0.0 hM in order to introduce free-flowing materials and/or mixtures to the mixing chamber. The first aperture is configured with a non-return valve disposed therein or adjacent thereto, the non-return valve permitting the introduction of free-flowing materials to the mixing chamber through the aperture, but preventing outflow of free-flowing materials from the mixing chamber through the aperture. The first aperture is formed with an aperture area extending in a range between a minimum and a maximum, the minimum area being 0.05 mm2 and the maximum area being determined by a value resulting from Volumemixing chamber [cm3]/Areafirst aperture [cm2]≈5500.
    • 8. 发明申请
    • Reactor for the preparation of a formulation
    • US20210154639A1
    • 2021-05-27
    • US16697454
    • 2019-11-27
    • SmartDyeLivery GmbH
    • Christoph EnglertMarc Lehmann
    • B01J19/18B01J19/00
    • The invention discloses a reactor for preparing a formulation. The reactor comprises at least two apertures, a base and at least one sidewall extending flush therefrom, wherein the base and the sidewall together define a mixing chamber with a height hM and at least one axis of symmetry arranged substantially perpendicular to the base and at least one distance r from the sidewall. A first aperture is arranged within the base or adjacent to the base in the sidewall of the mixing chamber at a height hA ranging from 0.6 to 0.0 hM in order to introduce free-flowing materials and/or mixtures to the mixing chamber. The first aperture is configured with a non-return valve disposed therein or adjacent thereto, the non-return valve permitting the introduction of free-flowing materials to the mixing chamber through the aperture, but preventing outflow of free-flowing materials from the mixing chamber through the aperture. The first aperture is formed with an aperture area extending in a range between a minimum and a maximum, the minimum area being 0.05 mm2 and the maximum area being determined by a value resulting from Volumemixing chamber [cm3]/Areafirst aperture [cm2]≈5500.