专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4617252A Antireflective coatings for use in the manufacture of semi-conductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes 失效
标题翻译：用于制造半导体器件的抗反射涂层，用于制造这种涂层的方法和解决方案以及使用这种涂层在紫外光刻工艺中吸收光的方法
公开(公告)号：US4617252A
公开(公告)日：1986-10-14
申请号：US619737
申请日：1984-06-12
申请人： William F. Cordes, III , Alfred T. Jeffries, III
发明人： William F. Cordes, III , Alfred T. Jeffries, III
IPC分类号： G03C5/00 , G03C1/00 , G03F7/09 , G03F7/11 , G03F7/26 , H01L21/027 , G03C1/84
CPC分类号： H01L21/0276 , G03F7/091
摘要： Disclosed are antireflective layers for use in the manufacture of semi-conductor devices, methods and solutions for making such antireflective layers, and the use of such antireflective layers to absorb light in ultraviolet photolithography. The antireflective layers that are utilized comprise a polyphenylquinoxaline.
摘要翻译：公开了用于制造半导体器件的抗反射层，用于制造这种抗反射层的方法和解决方案，以及使用这种抗反射层来吸收紫外光刻中的光。所用的抗反射层包括聚苯基喹喔啉。

2. 发明授权

US4377631A Positive novolak photoresist compositions 失效
标题翻译：正型酚醛清漆光刻胶组合物
公开(公告)号：US4377631A
公开(公告)日：1983-03-22
申请号：US275883
申请日：1981-06-22
申请人： Medhat A. Toukhy , Leo Klawansky
发明人： Medhat A. Toukhy , Leo Klawansky
IPC分类号： C08G8/24 , C08K5/41 , G03F7/023 , G03C1/54 , G03C1/60
CPC分类号： G03F7/0236 , C08G8/24 , C08K5/41
摘要： Fast positive photoresist compositions employing cresol-formaldehyde novolak resins made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a given range and one or more of a selected group of naphthoquinone diazide sensitizing compounds. When dissolved in a mixture of organic solvents, the photoresist compositions are suitable for application as a thin coating to a substrate. After the coating has been dried, the coated substrate can be exposed to image-wise modulated actinic radiation even in the deep ultra-violet range and developed in alkaline solution, yielding a high-resolution relief pattern of resist on substrate useful for a number of applications.
摘要翻译：使用甲酚 - 甲醛酚醛清漆树脂的快速正性光致抗蚀剂组合物，其由含有选自特定范围的一个或多个选自萘醌二叠氮化物敏化化合物的比例的含有间 - 和对甲酚或邻 - ，间 - 和对 - 间甲酚的混合物制成。当溶解在有机溶剂的混合物中时，光致抗蚀剂组合物适合作为薄涂层施用于基底。涂层已经干燥后，即使在深紫外范围内，涂覆的基底也可以暴露于成像调制的光化辐射，并在碱性溶液中显影，产生高分辨率的底物上的抗蚀剂图案，可用于多个应用程序。

3. 发明授权

US4060447A Process for etching of metal 失效
标题翻译：金属蚀刻工艺
公开(公告)号：US4060447A
公开(公告)日：1977-11-29
申请号：US671310
申请日：1976-03-29
申请人： Warren A. Nelson
发明人： Warren A. Nelson
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： C23F1/00 , C23F1/08
摘要： An improvement in an etching process in which the etched product, the surface of which is covered with a film of aqueous etching liquid containing ions of the material etched, is rinsed with an aqueous liquid and the resulting liquid, now containing said ions in dilute concentration, is passed through an ion exchanger to selectively remove the ions from the rinse liquid which thereupon can be reused or discharged, without ecological damage, from the ion exchanger. The ion exchanger when laden with such ions is regenerated by passage therethrough of at least a portion of an etcher make-up aqueous replenishing solution which contains a zero or low concentration of said ions. The resulting replenishing solution portion, now containing a small concentration of these ions, is passed to the etcher, e.g., to the etcher sump.
摘要翻译：蚀刻工艺的改进，其中蚀刻产品（其表面被含有蚀刻的材料的离子的水性蚀刻液膜）覆盖，用水性液体冲洗，并且所得液体现在含有稀释浓度的所述离子通过离子交换器以选择性地从漂洗液中除去离子，从而可以从离子交换器再次使用或排放，而不会生态破坏。当这种离子负载时的离子交换剂通过其中含有零或低浓度的所述离子的蚀刻剂补充水补充溶液的至少一部分通过而再生。所产生的补充溶液部分（现在含有这些离子的浓度很小）被传送到蚀刻器，例如通到蚀刻槽。

4. 发明授权

US4650745A Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development 失效
标题翻译：通过包含染料和三羟基二苯甲酮化合物的正性抗蚀剂涂层的辐射暴露形成抗蚀剂图案的方法以及随后的碱性显影
公开(公告)号：US4650745A
公开(公告)日：1987-03-17
申请号：US878736
申请日：1986-06-26
申请人： James N. Eilbeck
发明人： James N. Eilbeck
IPC分类号： G03F7/022 , G03F7/26
CPC分类号： G03F7/0226
摘要： Disclosed is a positive-working resist composition which demonstrates improved photospeed and rate of development. The resist composition contains a solvent and select proportions of a novolak resin, a naphthoquinone diazide sensitizer, a dye which absorbs light at a maximum wavelength of from about 330 to about 460 nm and an effective proportion of a trihydroxybenzophenone compound. Also disclosed is a method of forming a resist pattern on a substrate by employing the positive-working resist composition.
摘要翻译：公开了一种正性抗蚀剂组合物，其显示出改进的感光速度和显影速率。抗蚀剂组合物含有溶剂并选择比例的酚醛清漆树脂，萘醌二叠氮化物增感剂，吸收最大波长约330至约460nm的光和三羟基二苯甲酮化合物的有效比例的染料。还公开了通过使用正性抗蚀剂组合物在基板上形成抗蚀剂图案的方法。

5. 发明授权

US4529682A Positive photoresist composition with cresol-formaldehyde novolak resins 失效
标题翻译：具有甲酚 - 甲醛酚醛清漆树脂的正性光致抗蚀剂组合物
公开(公告)号：US4529682A
公开(公告)日：1985-07-16
申请号：US403935
申请日：1982-08-02
申请人： Medhat A. Toukhy
发明人： Medhat A. Toukhy
IPC分类号： C08G8/24 , C08K5/41 , G03F7/023 , G03C1/54 , G03F7/26
CPC分类号： G03F7/0236 , C08G8/24 , C08K5/41
摘要： Cresol-formaldehyde novolak resins made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a given range for use in fast positive photoresist compositions together with one or more sensitizing compounds. When dissolved in a mixture of organic solvents, the photoresist compositions are suitable for application as a thin coating to a substrate. After the coating has been dried, the coated substrate can be exposed to image-wise modulated actinic radiation and developed in alkaline solution, yielding a relief pattern of resist on substrate useful for a number of applications.
摘要翻译：甲磺醛酚醛清漆树脂由含有间 - 和对甲酚或邻 - 间 - 和对羟基苯甲酸酯的混合物制成，其比例选自用于快速正性光致抗蚀剂组合物与一种或多种增感化合物的给定范围。当溶解在有机溶剂的混合物中时，光致抗蚀剂组合物适合作为薄涂层施用于基底。在涂层干燥后，涂覆的基底可以暴露于成像调制的光化辐射并在碱性溶液中显影，产生可用于多种应用的底物上的抗蚀剂的浮雕图案。

6. 发明授权

US4032379A Nitric acid system for etching magnesium plates 失效
标题翻译：用于蚀刻镁板的硝酸系统
公开(公告)号：US4032379A
公开(公告)日：1977-06-28
申请号：US627765
申请日：1975-10-31
申请人： David L. Czirr , Harry Kroll
发明人： David L. Czirr , Harry Kroll
IPC分类号： C23F1/22 , B41C1/00
CPC分类号： C23F1/22
摘要： A one-step powderless high-speed process for producing photoengraved letter-press printing and pattern plates from magnesium and alloys thereof by etching such plates in a machine that directs against a surface of the plate droplets of an etching liquid comprising an aqueous solution of a strong inorganic acid and adjuvants.

7. 发明授权

US3935118A Nitric acid system for etching magnesium plates 失效
标题翻译：用于蚀刻镁板的硝酸系统
公开(公告)号：US3935118A
公开(公告)日：1976-01-27
申请号：US441342
申请日：1974-02-11
申请人： David L. Czirr , Harry Kroll
发明人： David L. Czirr , Harry Kroll
IPC分类号： G03F7/00 , C23F1/22 , C23F1/42 , C09K13/06
CPC分类号： C23F1/22
摘要： A one-step powderless high-speed process for producing photoengraved letter-press printing and pattern plates from magnesium and alloys thereof by etching such plates in a machine that directs against a surface of the plate droplets of an etching liquid comprising an aqueous solution of a strong inorganic acid and adjuvants.
摘要翻译：一步法无粉高速工艺，用于通过在机器中蚀刻这样的板来制造光刻印刷印刷机和图案板，该机器指向包含水溶液的蚀刻液的板液滴的表面强无机酸和佐剂。

8. 发明授权

US4565776A Photographic developer composition 失效
标题翻译：照相显影剂组成
公开(公告)号：US4565776A
公开(公告)日：1986-01-21
申请号：US728557
申请日：1985-04-29
申请人： Hongzoon Kim , Thomas E. Salamy
发明人： Hongzoon Kim , Thomas E. Salamy
IPC分类号： G03C7/413 , G03C5/30
CPC分类号： G03C7/413
摘要： Oxidation inhibiting amounts of alkylated diphenyl oxide disulfonates are incorporated into photographic color developers containing primary aromatic amino color developing agents to increase clarity and inhibit the formation of tar-like precipitates in these developers. Typical disulfonates include sodium dodecyl diphenyl ether disulfonate, sodium decyl diphenyl ether disulfonate, sodium cetyl diphenyl ether disulfonate, monocetyl diphenyl ether disulfonate, dicetyl diphenyl ether disulfonate and mixtures thereof. The use of disulfonates of this type substantially eliminates the need for cosolvents such as alkanolamines to inhibit the formation of tar-like particles in the developers.
摘要翻译：将氧化抑制量的烷基化二苯醚二磺酸盐引入含有主芳族氨基显色剂的照相彩色显影剂中，以增加透明度并抑制这些显影剂中焦油状析出物的形成。典型的二磺酸盐包括十二烷基二苯基醚二磺酸钠，癸基二苯基醚二磺酸钠，十六烷基二苯基醚二磺酸钠，单甲基二苯醚二磺酸钠，二鲸蜡基二苯醚二磺酸钠及其混合物。使用这种类型的二磺酸基本上不需要助溶剂如烷醇胺来抑制显影剂中焦油状颗粒的形成。

9. 外观设计

USD243842S Spray etcher for work pieces in which the work pieces first move into the etcher in one direction and then leave the etcher in a reverse direction 失效
公开(公告)号：USD243842S
公开(公告)日：1977-03-29
申请号：US623742
申请日：1975-10-20
申请人： Burke Leon , Victor Johansen , Peter Rose , Gary Rolih
设计人： Burke Leon , Victor Johansen , Peter Rose , Gary Rolih

10. 发明授权

US3991226A Method of creating an image using hybrid liquid toners 失效
标题翻译：使用混合液体调色剂制作图像的方法
公开(公告)号：US3991226A
公开(公告)日：1976-11-09
申请号：US433251
申请日：1974-01-14
申请人： George E. Kosel
发明人： George E. Kosel
IPC分类号： C08F8/00 , G03G9/12 , G03G9/125 , G03G9/13 , G03G13/10
CPC分类号： G03G9/12 , C08F8/00 , G03G9/125 , G03G9/133
摘要： A hybrid liquid toner composed of a mixture of two different types of liquid toner. One type is a liquid toner that includes a complex amphipathic molecule of which at least a fixer and a dispersant are polymeric moieties and which additionally includes a charge director and optionally includes a color agent, all of these being carried by a volatile organic solvent of high electrical resistivity. The other type of liquid toner is one that includes a fixer and a dispersant as separate chemical entities and further includes a charge director, a pigment type color agent and a carrier solvent such as mentioned above. The two toners can be mixed in a very wide range of proportions and when so mixed have several advantages which makes the hybrid toner particularly useful in connection with preparation of lithographic masters and microfiche reproductions by electrostatography as well as useful as an all purpose liquid toner.
摘要翻译：由两种不同类型的液体调色剂的混合物组成的混合液体调色剂。一种类型是液体调色剂，其包括复合两亲分子，其至少定影剂和分散剂是聚合物部分，并且另外包含电荷导向剂，并且任选地包含着色剂，所有这些都由高的挥发性有机溶剂携带电阻率。另一种类型的液体调色剂是包括固定剂和分散剂作为单独化学实体的另一种类型，并且还包括电荷导向剂，颜料型着色剂和如上所述的载体溶剂。两种调色剂可以以非常宽的比例混合，并且当混合时具有几个优点，这使得混合调色剂在通过静电摄影制备平版印刷母版和缩微胶片复制物方面特别有用，并且作为全能液体调色剂是有用的。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式