会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明申请
    • WRITABLE SCREEN
    • 可写屏幕
    • US20150293435A1
    • 2015-10-15
    • US14383025
    • 2013-03-07
    • KIMOTO CO., LTD.
    • Syuuji KOHTAHironori SATO
    • G03B21/60
    • G03B21/60B43L1/00B43L1/10
    • Provided is a writable screen that has a reduced occurrence of glare while satisfying writing/erasing properties. The writable screen results from providing a resin layer that can be written/erased by a whiteboard pen on one surface of a base material, the resin layer having a surface arithmetic mean roughness based on JIS B0601:2001 of 0.1-3.0 μm at a cutoff value of 0.8 mm and a stylus tip radius of 2.5 μm, and a surface arithmetic mean roughness based on JIS B0601:2001 of 0.05-0.20 μm at a cutoff value of 0.08 mm and a stylus tip radius of 2.5 μm.
    • 提供了一种能够在满足写入/擦除性能的同时减少眩光的发生的可写入屏幕。 可写入屏幕是通过在基材的一个表面上提供可由白板笔写入/擦除的树脂层,该树脂层在截止时具有基于JIS B0601:2001的表面算术平均粗糙度为0.1-3.0μm 值为0.8mm,针尖半径为2.5μm,表面算术平均粗糙度基于JIS B0601:2001为0.05-0.20μm,截止值为0.08mm,针尖半径为2.5μm。
    • 6. 发明申请
    • LIGHT-SHIELDING MATERIAL FOR OPTICAL INSTRUMENT
    • 光学仪器用遮光材料
    • US20140016202A1
    • 2014-01-16
    • US14008624
    • 2012-02-29
    • Yasumaro Toshima
    • Yasumaro Toshima
    • G02B5/02
    • G02B5/021G02B5/003G02B5/02G02B5/0205G02B5/0215G02B5/0221G02B5/0226G02B5/0268G02B5/0273
    • Provided is a light-shielding material for use in optical instrument and having a light-shielding sheet with broad low-gloss region while maintaining the physical properties necessary for a light-shielding sheet. The light-shielding material 1 comprises a light-shielding sheet 4 on a substrate 2, and the surface properties of the light-shielding sheet 4 are adjusted so as to fulfill at least one of A1 and A2, and at least one of B1 and B2. A1 is the condition that the arithmetic average roughness Sa in a three-dimensional surface roughness measurement is 0.4 or larger and 2.0 or smaller, A2 is that the ten-point average roughness Sz in a three-dimensional surface roughness measurement is 1 or larger and 20 or smaller. Defining a central plane of projections and recesses in a three-dimensional surface roughness measurement as a reference plane, Pn (n is any positive integer) as the number of projections which protrude to a plane located at a height of n times Se from the reference plane, Pn+1 as the number of projections which protrude to a plane located at a height of (n+1) times Sa, and Rn as the ratio (Pn+1/Pn) of Pn and Pn+1, B1 is the condition that R1 is 55% or greater and R4 is 7% or greater, and B2 is the condition that at least R1 is 55% or greater, R2 is 15% or greater and R3 is 8% or greater.
    • 本发明提供一种用于光学仪器的遮光材料,并且具有宽的低光泽区域的遮光片,同时保持遮光片所需的物理性能。 遮光材料1包括在基板2上的遮光片4,并且调节遮光片4的表面性能以便满足A1和A2中的至少一个,并且B1和 B2。 A1是三维表面粗糙度测量中的算术平均粗糙度Sa在0.4以上且2.0以下的条件,A2是三维表面粗糙度测定中的十点平均粗糙度Sz为1以上, 20或更小。 将三维表面粗糙度测量中的突起和凹陷的中心平面定义为参考平面,Pn(n是任何正整数)作为从参考点突出到位于高度为n倍Se的平面的突起的数量 平面,Pn + 1作为突出到位于第(n + 1)倍Sa的高度的平面的突出数,Rn作为Pn和Pn + 1的比(Pn + 1 / Pn),B1是 R1为55%以上且R4为7%以上的条件,B2为至少R1为55%以上,R2为15%以上且R3为8%以上的条件。
    • 7. 发明授权
    • Light control film
    • 光控膜
    • US07771091B2
    • 2010-08-10
    • US11892458
    • 2007-08-23
    • Hideki Etori
    • Hideki Etori
    • F21V5/04
    • G02B5/021G02B5/0278G02F1/133606
    • A light control film having a refractive index n and an uneven, irregular surface pattern provides a reasonable level of light diffusion without a glare problem provided, for any cross-section perpendicular to the base plane of the film, the average of absolute values of slope θave of a curve along the edge of the cross-section contoured by the rough surface pattern (profile curve) is at least 78-34 n degrees and no higher than 118-34 n degrees, or the average of absolute values of slope θave of a profile curve to the length L1 of a straight line defined by the intersection of the base plane and the cross-section satisfies the following formula (3) or (4) for substantially all cross-sections. θave÷Lr×n2≧40  (3) 50≦θave×Lr×n2≦135  (4)
    • 具有折射率n和不均匀的不规则表面图案的光控制膜提供合理的光扩散水平,而不产生眩光问题,对于垂直于膜的基底的任何横截面,斜率的绝对值的平均值 沿着由粗糙表面图案(轮廓曲线)成型的横截面边缘的曲线的曲线至少为78-34n度且不高于118-34n度,或者斜率的绝对值的平均值 对于基本上所有的横截面,由基面和横截面的交点限定的直线的长度L1的曲线曲线满足下式(3)或(4)。 (a)÷÷÷÷××≧≧≧≧≧≧;;;;;;;;;;;;)))))))))))))))))))
    • 9. 发明申请
    • Method for Producing Surface Convexes and Concaves
    • 生产表面凹凸的方法
    • US20090261491A1
    • 2009-10-22
    • US11992054
    • 2006-09-28
    • Etori Hideki
    • Etori Hideki
    • B29D11/00G03F7/20
    • G03F7/201B82Y10/00G02B3/0012G02B3/0031G02B5/02G03F1/50G03F7/0005G03F7/7035G03F7/70416
    • A method for producing surface convexes and concaves enabling easy and highly precise formation of desired convex and concave shapes using a photomask is provided.A mask member having light transmitting sections and non-light transmitting sections is disposed over one side of a photosensitive film consisting of a photosensitive resin composition with an interval with respect to the photosensitive film, light is irradiated from a light source disposed on the side of the mask member to subject the photosensitive film to light exposure through the light transmitting sections of the mask member, and exposed portions or unexposed portions of the photosensitive film are removed by development to produce convexes and concaves on the photosensitive film in shapes determined by shapes of the exposed portions or unexposed portions. In the light exposure, light exposure conditions such as distance L between the light source and the mask member, size D of the light source and optical distance T between the mask member and the photosensitive film are controlled so as to control the shapes of the exposed portions or unexposed portions.
    • 提供一种用于制造表面凸起和凹陷的方法,其能够使用光掩模容易且高精度地形成所需的凸形和凹形。 具有透光部和非透光部的荫罩构件配置在由感光性树脂组合物构成的感光性膜组合物相对于感光性膜的间隔的一侧,从设置在感光性膜侧的光源照射光 掩模构件使感光膜通过掩模构件的光透射部分曝光,并且通过显影除去感光膜的曝光部分或未曝光部分,以在感光膜上产生凸起和凹陷,其形状由 暴露部分或未曝光部分。 在曝光中,控制光源和掩模构件之间的距离L,光源的尺寸D和掩模构件和感光膜之间的光学距离T等曝光条件,以控制曝光的形状 部分或未曝光部分。